GaN外延膜厚度的x射线双晶衍射测量

提出了一种利用x射线双晶衍射测量GaN厚度的新方法．该方法采用GaN积分强度和衬底积分强度的比值与样品厚度的关系来测量GaN外延膜厚度，此比值与GaN样品厚度在t＜2μm为线性关系．该方法消除了因GaN吸收造成的影响，比单纯用GaN积分强度与样品厚度的关系推算GaN外延膜厚度精度更高，更方便可靠．

低速高电荷态重离子辐照的GaN晶体表面X射线光电子能谱研究；X-ray photoelectron spectroscopy study on GaN crystal irradiated by slow highly charged ions

利用低速高电荷态Xeq+和Pbq+离子对在蓝宝石衬底上生长的GaN晶体膜样品进行辐照,并利用X射线光电子能谱(XPS)对样品表面化学组成和元素化合态进行了分析.结果表明,高电荷态离子对样品表面有显著的刻蚀作用;经高电荷态离子辐照的GaN样品表面氮元素贫乏而镓元素富集;随着入射离子剂量和所携带电荷数的增大,Ga—Ga键相对含量增大;辐照后,GaN样品中Ga—Ga键对应的Ga3d5/2电子的束缚能偏小,晶格损伤使内层轨道电子束缚能向低端方向偏移.

Thickness measurement of GaN epilayer using high resolution X-ray diffraction technique

In this paper we propose a new method for measuring the thickness of the GaN epilayer, by using the ratio of the integrated intensity of the GaN epilayer X-ray diffraction peaks to that of the sapphire substrate ones. This ratio shows a linear dependence on the GaN epilayer thickness up to 2 mum. The new method is more accurate and convenient than those of using the relationship between the integrated intensity of GaN epilayer diffraction peaks and the GaN thickness. Besides, it can eliminate the absorption effect of the GaN epilayer.

Semipolar and nonpolar GaN epi-films grown on m-sapphire by plasma assisted molecular beam epitaxy

We hereby report the development of non-polar epi-GaN films of usable quality, on an m-plane sapphire. Generally, it is difficult to obtain high-quality nonpolar material due to the planar anisotropic nature of the growth mode. However, we could achieve good quality epi-GaN films by involving controlled steps of nitridation. GaN epilayers were grown on m-plane (10-10) sapphire substrates using plasma assisted molecular beam epitaxy. The films grown on the nitridated surface resulted in a nonpolar (10-10) orientation while without nitridation caused a semipolar (11-22) orientation. Room temperature photoluminescence study showed that nonpolar GaN films have higher value of compressive strain as compared to semipolar GaN films, which was further confirmed by room temperature Raman spectroscopy. The room temperature UV photodetection of both films was investigated by measuring the I-V characteristics under UV light illumination. UV photodetectors fabricated on nonpolar GaN showed better characteristics, including higher external quantum efficiency, compared to photodetectors fabricated on semipolar GaN. X-ray rocking curves confirmed better crystallinity of semipolar as compared to nonpolar GaN which resulted in faster transit response of the device. (C) 2014 AIP Publishing LLC.

The structural, morphological and magnetic characteristics of Mn-implanted nonpolar a-plane GaN films

Dilute magnetic nonpolar GaN films have been fabricated by implanting Mn into unintentionally doped nonpolar a-plane GaN films at room temperature, and a subsequent rapid thermal annealing. The X-ray diffraction analysis shows that after rapid thermal annealing the peak of the GaN X-ray diffraction curve shifts to a lower angle, indicating a slight expansion of the GaN crystal lattice. Atomic force microscopy analysis shows that the annealing process does not change the morphology of the sample greatly. Magnetic property analysis indicates that the as-annealed sample shows obvious ferromagnetic properties. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Mutual passivation of donors and isovalent nitrogen in GaAs

We study the mutual passivation of shallow donor and isovalent N in GaAs. We find that all the donor impurities, Si-Ga, Ge-Ga, S-As, and Se-As, bind to N in GaAsN, which has a large N-induced band-gap reduction relative to GaAs. For a group-IV impurity such as Si, the formation of the nearest-neighbor Si-Ga-N-As defect complex creates a deep donor level below the conduction band minimum (CBM). The coupling between this defect level with the CBM pushes the CBM upwards, thus restoring the GaAs band gap; the lowering of the defect level relative to the isolated Si-Ga shallow donor level is responsible for the increased electrical resistivity. Therefore, Si and N mutually passivate each other's electrical and optical activities in GaAs. For a group-VI shallow donor such as S, the binding between S-As and N-As does not form a direct bond; therefore, no mutual passivation exists in the GaAs(S+N) system.

Preparation and characterization of GaN films by radio frequency magnetron sputtering and carbonized-reaction technique

Radio frequency magnetron sputtering/post-carbonized-reaction technique was adopted to prepare good-quality GaN films on Al2O3(0 0 0 1) substrates. The sputtered Ga2O3 film doped with carbon was used as the precursor for GaN growth. X-ray diffraction (XRD) pattern reveals that the film consists of hexagonal wurtzite GaN. X-ray photoelectron spectroscopy (XPS) shows that no oxygen can be detected. Electrical and room-temperature photoluminescence measurements show that good-quality polycrystalline GaN films were successfully grown on Al2O3(0 0 0 1) substrates. (c) 2005 Elsevier B.V. All rights reserved.

Hydrostatic pressure effect on photoluminescence from a GaN0.015As0.985/GaAs quantum well

Photoluminescence from a GaN0.015As0.985/GaAs quantum well has been measured at 15 K under hydrostatic pressure up to 9 GPa. Both the emissions from the GaNAs well and GaAs barrier are observed. The GaNAs-related peak shows a much weaker pressure dependence compared to that of the GaAs band gap. A group of new peaks appear in the spectra when the pressure is beyond 2.5 GPa, which is attributed to the emissions from the N isoelectronic traps in GaAs. The pressure dependence of the GaNAs-related peaks was calculated using the two-level model with the measured pressure coefficients of the GaAs band gap and N level as fitting parameters. It is found that the calculated results deviate seriously from the experimental data. An increasing of the emission intensity and the linewidth of the GaNAs-related peaks was also observed and briefly discussed. (C) 2001 American Institute of Physics.

Structural characterization of cubic GaN grown on GaAs(001) substrates

Structural characteristics of cubic GaN epilayers grown on GaAs(001) were studied using X-ray double-crystal diffraction technique. The structure factors of cubic GaN(002) and (004) components are approximately identical. However, the integrated intensities of the rocking curve for cubic (002) components are over five times as those of (004) components. The discrepancy has been interpreted in detail considering other factors. In the conventional double crystal rocking curve, the peak broadening includes such information caused by the orientation distribution (mosaicity) and the distribution of lattice spacing. These two kinds of distributions can be distinguished by the triple-axis diffraction in which an analyser crystal is placed in front of the detector. Moreover, the peak broadening was analysed by reciprocal lattice construction and Eward sphere. By using triple-axis diffraction of cubic (002) and (113) components, domain size and dislocation density were estimated. The fully relaxed lattice parameter of cubic GaN was determined to be about 0.451 +/- 0.001nm.

带有A1N插入层的GaN薄膜的结构及应变研究

利用金属有机化学汽相沉积(MOCVD)法在硅衬底上生长具有AIN插入层的GaN外延膜，采用高分辨X射线衍射(HRXRD)和卢瑟福背散射/沟道(RBS/Channeling)技术研究分析其结构和应变性质。从RBS＜0001＞沟道谱可知，该外延膜具有良好的结晶品质，χ_(min)＝2.5％。利用不同方位角上XRD摇摆曲线测量，可得出GaN(0001)面与Si(111)面之间的夹角β＝1.379°。通过对GaN(0002)和GaN(10(1-bar)5)衍射面的θ-2θ扫描，可以得出GaN外延膜在垂直方向和水平方向的平均弹性应变分别为-0.10%±0.02％和0.69％±0.09％。通过对{10(1-bar)0}面内非对称<1(2-bar)13>轴RBS角扫描可得出由弹性应变引起的四方畸变e_T在近表面处为0.35％±0.02％。外延膜弹性性质表明GaN膜在水平方向具有张应力(e~〃＞0)、在垂直方向具有压应力(e~⊥＜0)，印证了XRD的结果。四方畸变是深度敏感的，通过对不同深度的四方畸变计算可知，A1N插入层下面的GaN外延膜弹性应变释放速度比A1N层上面的GaN层弹性应变释放快，说明A1N层的插入缓解了应变释放速度。

在双热舟化学气相沉积系统中通过掺In技术生长GaN纳米线和纳米锥

在现有的一台蒸发镀膜机基础上，设计加工了一个双热舟化学气相沉积系统．该系统具有真空度高、升温速度快、源和衬底温度可分别控制等优点，有利于化合物半导体纳米材料的生长．利用该生长系统，通过在生长过程中掺入等电子杂质In作为表面活性剂，分别在野衬底和3C—SiC／Si衬底上生长出高质量的具有纤锌矿结构的单晶GaN纳米线和纳米尖三棱锥．所得产物通过场发射扫描电子显微镜、高分辨透射电子显微镜、能量色散x射线谱仪、x射线衍射仪，和荧光谱仪进行表征．这里所用的生长方法新颖，生长出的GaN纳米尖三棱锥在场发射和激光方面有潜在的应用价值．

缓冲层厚度对MOCVD法生长GaN外延薄膜性能的影响

本文研究了低温GaN(LT-GaN)缓冲层表面形貌,其随厚度的变化规律及对随后生长GaN外延膜各项性能的影响.用场发射扫描电镜(SEM)和原子力显微镜(AFM)研究LT-GaN缓冲层表面形貌,发现随着厚度的增加,其表面由疏松、粗糙变得致密、平整,六角GaN小晶粒的数量减少,且取向较为一致.用X光双晶衍射(XRD)、AFM和Hall测量研究1μm厚本征GaN外延薄膜的结晶质量、表面粗糙度、背底载流子浓度和迁移率等性能,发现随着LT-GaN缓冲层厚度的增加:XRD的半高宽FWHMs增大,表面粗糙度先减小后又略有增大,背底载流子浓度则随之减少,而迁移率的变化则不明显.通过分析进一步确认LT-GaN缓冲层的最优生长时间.

缓冲层生长压力对MOCVD GaN性能的影响

利用自制的在位监测系统, 研究了用金属有机物化学气相外延法(MOCVD)在蓝宝石衬底上生长GaN时, GaN低温缓冲层的生长压力对高温生长GaN外延层性能的影响规律. 在位监测曲线及扫描电子显微镜(SEM)分析结果表明, 缓冲层生长压力越大, GaN缓冲层退火后成核中心体积越小, 表面粗糙度越大, 高温生长GaN岛间合并延迟. X射线衍射(XRD)和光致发光谱(PL)测量结果表明, GaN缓冲层生长压力增大时外延的GaN结晶质量得到改善.

GaN横向外延中晶面倾斜的形成机制

采用双晶X射线衍射（DC－XRD）研究蓝宝石（0001）衬底上横向外延GaN层中晶面倾斜的形成原因。发现横向生长区的GaN在垂直掩模方向上朝SiNx掩模层弯曲。采用选择性腐蚀逐渐去掉SiNx掩模层，发现XRD中G N(002)ω扫描衍射峰两侧存在与晶面倾斜有关的衍射信息。该衍射信息起初为一个很宽的峰，随着选择性腐蚀的进行，会先分裂为两个峰，最后当SiNx掩模层全部腐蚀掉后，其中一个衍射峰会消失，而只剩下一个很窄的峰。作者证实造成横向外延GaN中晶面倾斜的原因有两个

横向外延GaN结晶质量的同步辐射研究

采用同步辐射X光衍射技术研究了α-Al_2O_3(0001)衬底上横向外延GaN的结构特征。发现横向生长区的GaN（0001）晶面与窗口区的GaN(0001)晶面在垂直掩模方向上存在取向差。ω/2θ联动扫描发现横向生长区的GaN的衍射峰半高宽约为窗口区GaN的一半，这表明横向外延生长技术在降低GaN穿透位错密度的同时，还能大幅度提高GaN的晶粒尺寸。