1000 resultados para InAs island


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将DLTS用于对InAs/GaAs QD结构样品的测量,测定了QD能级发射载流子的热激活能;获得了QD能级俘获电子过程伴随有多声子发射(MPE),QD能级存在一定程度的展宽,以及在某些特定的生长条件下,存在亚稳生长构形的实验证据。结果表明:DLTS在QD体系的研究中有其特有的功能。

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报道了关于InAs/GaAs自组织生长多层垂直耦合量子点的研究结果。透射电子显微镜测量显示多层量子点在生长方向上成串排列,有些量子串会发生融和。还有些量子串生长不完全,也就是说包含的量子点个数少于InAs层数,并由此导致多耦合量子点的光致发光谱具有高能带尾。

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当激发光能量小于GaAs热垒带边能量时,在InAs量子点结构中,清楚地观察到与InAs浸润层有关的发光峰。研究表明,此发光峰主要来源于浸润层中局域态激子发光,局域化能量为12meV,发光具有二维特性。在相同的生长条件下,此发光峰位置与InAs层的厚度基本无关。这些结果有助于进一步深入研究浸润层的形貌和光学性质。

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利用光致发光测量了不同厚度GaAs覆盖层对自组织生长InAs量子点退火效应的影响。退火使量子点发光峰蓝移,发光强度减弱。深埋的量子点承受更大的应变,应变使退火引起的互扩散加强。GaAs盖层越厚,量子点的互扩散越明显,发光峰蓝移越显著,并由此导致了发光峰半高宽的不同变化。

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于2010-11-23批量导入

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简要报告气态源分子束外延实验结果。材料是GaAs(100)衬底上外延的晶格匹配的In_y(Ga_(1-x)Al_x)_(1-y)P(x=0~1,y=0.5),InGaP/InAlP多量子阱;在InP(100)衬底上外延的InP,晶格匹配的InGaAs、InAlAs以及InP/InGaAs、InP/InAsP多量子阱,InGaAs/InAlAs HEMT等,外延实验是用国产第一台化学束外延(CBE)系统做的。

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报道了InAs/GaAs自组织生长量子点结构中发光的温度特性.在12~150K温度范围内,实验测得的InAs激子发光能量随温度增加明显红移,其红移速率远大于InAs带隙的温度关系,而光谱宽度则明显减小.这些结果表明InAs量子点结构是一种强耦合系统,局域在InAs量子点中的载流子波函数会相互交迭、相互贯穿,从而增强了载流子的弛豫过程.

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Self-organized InAs quantum; dots sheets are grown on GaAs(100) substrate and tapped by 80nm GaAs layer with molecular beam epitaxy. Samples were annealed and characterized with Raman spectra, transmission electron microscopy (TEM) and photolumincscence (PL). The Raman spectra indicates arsenic clusters in the GaAs capping layer. The TEM analysis revealed the relaxation of strain in some InAs islands with the introduction of the network of 90 dislocations. In addition, the structural changes also lead to the changes of the PL spectra from me InAs islands. Their correlation was discussed, Our results suggest:est that annealing may be used to intentionally modify me properties of self-organized InAs islands on GaAs.

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Quantum dot lasers are predicted to have proved lasing characteristics compared to quantum well and quantum wire lasers. We report on quantum dot lasers with active media of vertically stacked InAs quantum dots layers grown by molecular beam epitaxy. The laser diodes were fabricated and the threshold current density of 220 A/cm(2) was achieved at room temperature with lasing wavelength of 951 nm. The characteristic temperature To was measured to be 333K and 157K for the temperature range of 40-180K and 180-300K, respectively.

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Using Transmission Electron Microscopy, we studied the misfit and threading dislocations in InAs epilayers. All the samples, with thickness around 0.5 mu m, were grown on GaAs(001) substrates by molecular beam epitaxy under As-rich or in-rich conditions. The As-rich growth undergoes 2D-3D mode transition process, which was inhibited under In-rich surface. High step formation energy under As-deficient reconstruction inhibits the formation of 3D islands and leads to 2D growth. The mechanism of misfit dislocations formation was different under different growth condition which caused the variation of threading dislocation density in the epilayers.

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Diagonal self-assembled InAs quantum wire (QWR) arrays with the stacked InAs/In0.52Al0.48As structure are grown on InP substrates, which are (001)-oriented and misoriented by 6degrees towards the [100] direction. Both the molecular beam epitaxy (MBE) and migration enhanced epitaxy (MEE) techniques are employed. Transmission electron microscopy reveals that whether a diagonal InAs QWR array of the stacked InAs/InAlAs is symmetrical about the growth direction or not depends on the growth method as well as substrate orientation. Asymmetry in the diagonal MEE-grown InAs QWR array can be ascribed to the influence of surface reconstruction on upward migration of adatoms during the self-assembly of the InAs quantum wires.