Structural and optical changes in GaAs/InAs/GaAs structure induced by thermal annealing


Autoria(s): Mo QW; Fan TW; Gong Q; Wu J; Wang ZG; Bai YQ; Zhang W
Data(s)

1998

Resumo

Self-organized InAs quantum; dots sheets are grown on GaAs(100) substrate and tapped by 80nm GaAs layer with molecular beam epitaxy. Samples were annealed and characterized with Raman spectra, transmission electron microscopy (TEM) and photolumincscence (PL). The Raman spectra indicates arsenic clusters in the GaAs capping layer. The TEM analysis revealed the relaxation of strain in some InAs islands with the introduction of the network of 90 dislocations. In addition, the structural changes also lead to the changes of the PL spectra from me InAs islands. Their correlation was discussed, Our results suggest:est that annealing may be used to intentionally modify me properties of self-organized InAs islands on GaAs.

Self-organized InAs quantum; dots sheets are grown on GaAs(100) substrate and tapped by 80nm GaAs layer with molecular beam epitaxy. Samples were annealed and characterized with Raman spectra, transmission electron microscopy (TEM) and photolumincscence (PL). The Raman spectra indicates arsenic clusters in the GaAs capping layer. The TEM analysis revealed the relaxation of strain in some InAs islands with the introduction of the network of 90 dislocations. In addition, the structural changes also lead to the changes of the PL spectra from me InAs islands. Their correlation was discussed, Our results suggest:est that annealing may be used to intentionally modify me properties of self-organized InAs islands on GaAs.

于2010-10-29批量导入

Made available in DSpace on 2010-10-29T06:37:10Z (GMT). No. of bitstreams: 1 2993.pdf: 206728 bytes, checksum: 98aff314c21a04a85789d4e709b7dc6e (MD5) Previous issue date: 1998

Chinese Inst Electr.; IEEE Electron Devices Soc.; IEEE Solid State Circuits Soc.; Japan Soc Appl Phys.; URSI Commiss D.; IEE, Electr Div, UK.; Korea Inst Telemat & Electr.; IEEE Beijing Sect.; Mat Res Soc.; Natl Nat Sci Fdn China.

Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China

Chinese Inst Electr.; IEEE Electron Devices Soc.; IEEE Solid State Circuits Soc.; Japan Soc Appl Phys.; URSI Commiss D.; IEE, Electr Div, UK.; Korea Inst Telemat & Electr.; IEEE Beijing Sect.; Mat Res Soc.; Natl Nat Sci Fdn China.

Identificador

http://ir.semi.ac.cn/handle/172111/13831

http://www.irgrid.ac.cn/handle/1471x/105097

Idioma(s)

英语

Publicador

IEEE

345 E 47TH ST, NEW YORK, NY 10017 USA

Fonte

Mo QW; Fan TW; Gong Q; Wu J; Wang ZG; Bai YQ; Zhang W .Structural and optical changes in GaAs/InAs/GaAs structure induced by thermal annealing .见:IEEE .1998 5TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY PROCEEDINGS,345 E 47TH ST, NEW YORK, NY 10017 USA ,1998,641-644

Palavras-Chave #半导体材料 #MOLECULAR-BEAM EPITAXY #COHERENT ISLANDS #GAAS #GROWTH #DOTS #DISLOCATIONS #TEMPERATURE #MECHANISMS #SI(001) #INGAAS
Tipo

会议论文