Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

A novel method for measuring the imaging quality of a projection system with mirror-symmetric FOCAL marks is proposed, and the principle of the method is described. Through experiments, it is demonstrated that not only the axial aberrations but also the lateral aberrations can be measured with high accuracy by the method. The advantages of the method include obtaining more aberrations than the FOCAL technique and making it much simpler to perform a full-scale measurement of the imaging quality of a lithographic projection system. (C) 2006 Society of Photo-Optical Instrumentation Engineers.

Method for measuring the lateral aberrations of a lithographic projection system with mirror-symmetric FOCAL marks

A novel method for measuring the imaging quality of a projection system with mirror-symmetric FOCAL marks is proposed, and the principle of the method is described. Through experiments, it is demonstrated that not only the axial aberrations but also the lateral aberrations can be measured with high accuracy by the method. The advantages of the method include obtaining more aberrations than the FOCAL technique and making it much simpler to perform a full-scale measurement of the imaging quality of a lithographic projection system. (C) 2006 Society of Photo-Optical Instrumentation Engineers.

A novel method for measuring the coma of a lithographic projection system by use of mirror-symmetry marks

A novel method for measuring the coma of a lithographic projection system is proposed and the principle of the method is described. By utilizing mirror-symmetry marks, the adverse effects of axial aberrations on the coma measurement are avoided. Experimental results demonstrated that the method has high accuracy. Compared with TAMIS, the conventional technique used for coma measurement, the method is more reliable because the influences of the process factors on the lateral displacements have been considered. (c) 2006 Elsevier Ltd. All rights reserved.

Even aberration measurement of lithographic projection system based on optimized phase-shifting marks

In the present paper, we propose a novel method for measuring the even aberrations of lithographic projection optics by use of optimized phase-shifting marks on the test mask. The line/space ratio of the phase-shifting marks is optimized to obtain the maximum sensitivities of Zernike coefficients corresponding to even aberrations. Spherical aberration and astigmatism can be calculated from the focus shifts of phase-shifting gratings oriented at 0 degrees, 45 degrees, 90 degrees and 135 degrees at multiple illumination settings. The PROLITH simulation results show that, the measurement accuracy of spherical aberration and astigmatism obviously increase, after the optimization of the measurement mark. (C) 2008 Elsevier B.V. All rights reserved.

A novel method to measure coma aberration of projection system

A novel method to measure coma aberration by pattern displacements at different defocus positions is proposed in this paper. The effect of defocus on coma-induced pattern displacement is analyzed. The measuring principle of the method is described in detail. Using the simulation program PROLITH, the proportionality factors between pattern displacement and coma aberration at different defocus positions are calculated. It is proved that the method is simple to perform and the measurement accuracy of coma can increase approximately by 25% by this novel method. (c) 2006 Elsevier GmbH. All rights reserved.

A holographic projection system with an electrically tuning and continuously adjustable optical zoom

A holographic projection system with optical zoom is demonstrated. By using a combination of a LC lens and an encoded Fresnel lens on the LCoS panel, we can control zoom in a holographic projector. The magnification can be electrically adjusted by tuning the focal length of the combination of the two lenses. The zoom ratio of the holographic projection system can reach 3.7:1 with continuous zoom function. The optical zoom function can decrease the complexity of the holographic projection system.

Tunable liquid crystal lens for a holographic projection system

The tunable liquid crystal (LC) lens designed for a holographic projection system is demonstrated. By using a single patterned electrode LC lens, a solid lens and an encoded Fresnel lens on the LCoS panel, we can maintain the image size of the holographic projector with different wavelengths (λ:674nm, 532nm and 445nm) . The zoom ratio of the holographic projection system depends on the lens power of the solid lens and the tunable lens power of the LC lens. The optical zoom function can help to solve the image size mismatching problem of the holographic projection system. © 2013 SPIE.

Dental arches multi-projection system with semantic descriptions

This paper presents the development of an multi-projection stereoscopic dental arches application with semantic descriptions. The first section presents the concepts of the used technologies. Applications and examples are demonstrated. Finally, is presented the physical structure and the developed system, where a 3D dental arch is used as a model and can be viewed in multi-projection, thereby, providing greater user's immersion. ©2010 IEEE.