Measurement technique for characterizing odd aberration of lithographic projection optics based on dipole illumination
| Data(s) |
2010
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|---|---|
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
Peng B(彭勃),Wang XZ(王向朝),Qiu ZC(邱自成),Yuan QY(袁琼雁).Measurement technique for characterizing odd aberration of lithographic projection optics based on dipole illumination.Optics Communications,2010,283(11):2309-2317 |
| Palavras-Chave | #光学 |
| Tipo |
期刊论文 |
