Even aberration measurement of lithographic projection system based on optimized phase-shifting marks

Autoria(s): Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu; Fan Wang; Mingying Ma
Data(s)

2009
Identificador

http://ir.siom.ac.cn/handle/181231/6586

http://www.irgrid.ac.cn/handle/1471x/10747
Idioma(s)

中文
Fonte

Qiongyan Yuan, Xiangzhao Wang, Zicheng Qiu, Fan Wang, Mingying Ma.Even aberration measurement of lithographic projection system based on optimized phase-shifting marks.Microelectronic Engineering,2009,86(1):
Palavras-Chave #光学
Tipo

期刊论文
Acesso ao item digital