Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

Autoria(s): Zicheng Qiu; Xiangzhao Wang; Qunyu Bi; Qiongyan Yuan; Bo Peng; and Lifeng Duan
Data(s)

01/07/2009
Identificador

http://ir.siom.ac.cn/handle/181231/6345

http://www.irgrid.ac.cn/handle/1471x/10721
Idioma(s)

中文
Fonte

Zicheng Qiu,1,2 Xiangzhao Wang,Qunyu Bi,Qiongyan Yuan,Bo Peng,and Lifeng Duan.Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations.APPLIED OPTICS,2009,48(19):3654-3663
Palavras-Chave #光学::物理光学
Tipo

期刊论文
Acesso ao item digital