Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

Autoria(s): Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan
Data(s)

2009
Identificador

http://ir.siom.ac.cn/handle/181231/6588

http://www.irgrid.ac.cn/handle/1471x/10749
Idioma(s)

中文
Fonte

李中梁.Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations.Applied Optics,2009,48(19):
Palavras-Chave #光学
Tipo

期刊论文
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