Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image

Autoria(s): Peng B(彭勃); Wang XZ(王向朝); Qiu ZC(邱自成); Cao YT(曹宇婷); Duan LF(段立峰)
Data(s)

2010
Identificador

http://ir.siom.ac.cn/handle/181231/7083

http://www.irgrid.ac.cn/handle/1471x/135452
Idioma(s)

中文
Fonte

Peng B(彭勃),Wang XZ(王向朝),Qiu ZC(邱自成),Cao YT(曹宇婷),Duan LF(段立峰).Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image.Applied Optics,2010,49(15):2753-2760
Palavras-Chave #光学
Tipo

期刊论文
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