新型结构的1.3μm GexSi（1-x）/Si MQW 波导探测器的优化设计

首次提出了一种新型的环形1.3μm Ge_xSi_(1-x)/Si波导探测器结构.器件的主体由3μm宽环形波导构成.器件的输入端是8μm宽的波导.这两部分通过劈形波导过渡连接.各部分经过优化设计,可以同时实现高的耦合效率和高内量子效率.对于器件的材料结构、电学和光学特性进行了仔细的分析与设计.结果表明,优化设计的器件其外量子效率可达28%,比已经报道的直波导探测器的外量子效率提高2～3倍.而上升下降时间仍然保持在110ps左右.

p型Si（1-x）Gex应变层中重掺杂禁带窄变的计算

于2010-11-23批量导入

GexSi（1-x）/Si（100）应变超晶格高分辨电镜研究

国家教委基金

Au/a-Si:H界面X射线光电子能谱和俄歇电子能谱研究

于2010-11-23批量导入

不同剂量C离子注入Si单晶中Si_(1-x)C_x合金的形成及其特征

室温下在单晶Si中注入 (0 6— 1 5 ) %的C原子 ,利用高温退火固相外延了Si1-xCx 合金 ,研究了不同注入剂量下Si1-xCx 合金的形成及其特征 .如果注入C原子的浓度小于 0 6 % ,在 85 0— 95 0℃退火过程中 ,C原子容易与注入产生的损伤缺陷结合 ,难于形成Si1-xCx 合金相 .随注入C原子含量的增加 ,C原子几乎全部进入晶格位置形成Si1-xCx 合金 ,但如果注入C原子的浓度达到 1 5 % ,只有部分C原子参与形成Si1-xCx 合金 .升高退火温度 ,Si1-xCx 合金相基本消失 .

C离子注入Si中Si_(1-x)C_x合金的形成及其稳定性

利用离子注入和高温退火的方法在Si中生长了C含量为0.6%~1.0%的Si1?xCx合金, 研究了不同注入剂量下Si1?xCx合金的形成及其在退火过程中的稳定性. 如果注入剂量小于引起Si非晶化的剂量, 850℃退火后, 注入产生的损伤缺陷容易与C原子结合形成缺陷团簇, 难于形成Si1?xCx合金. 随着注入C离子剂量的增大, 注入产生的损伤增强, 容易形成Si1?xCx合金, 但注入的剂量增大到一定程度, Si1?xCx合金的应变将趋于饱和, 即只有部分C原子进入晶格位置形成合金相. Si1?xCx合金一旦形成, 在950℃仍比较稳定, 而温度高于1 000℃, 合金的应力将部分释放. 随着合金中C原子浓度的升高, 合金的稳定性变差.

电制冷Si-PIN X射线谱仪的研制

X射线谱仪以其多用途、无损、操作简单、快速、价格低廉和运行费用很低等优点，己经成为应用最为广泛的多元素分析仪器。采用液氮冷却的X射线谱仪在荧光分析技术领域得到广泛的应用和普遍认可。液氮制冷的一个主要缺点是必须有一个液氮存储罐作为完整谱仪的一部分。从而，在实际应用中受到液氮价格贵和液氮供应厂少的限制，大大地制约了该种谱仪的进一步推广使用。如果能采用另外的技术得到足够低的温度，在此温度下探测器具有极低的漏电流，也可使X射线谱仪有极低的噪声和相当好的能量分辨率；因此克服上述限制就成为一个有重要意义的课题方向。本文在国内首次实现采用半导体电制冷技术对平面离子注入（Si一PIN）探测器制冷，降低探测器漏电流至10~(-13)以下，配合低噪声脉冲光反馈前放，成功地使得整个x射线谱仪能量分辨率达到262eV（对~(55)Fe的Mn Kα K射线）。虽然电制冷X射线谱仪的分辨率没有采用液氮冷却的好，但是它的性能已足够在包括利用X射线能量分离进行荧光分析等多种应用所需。考虑到元素周期表中钾元素以上的毗邻两元素的Ka特征X射线的能量差在380eV以上；例如，K和Ca的峰线宽分别是243eV和245 eV，由此得到电制冷X射线谱仪己可完成对K, C a和更高Z的元素进行能散荧光分析工作。并且，液氮罐的取消可方便的设计在野外使用的便携式X射线荧光分析设备。 文中全面介绍了X射线谱仪的各个组成部分和其背景知识。并详细描述了探测器系统、电制冷系统和低噪声电子学系统，充分展示了研制X射线谱仪的关键所在。最后给出了电制冷X射线谱仪的测试结果和应用设计。

Addition reaction of nitrones on the reconstructed Si(100)-2 x 1 surface

The reaction of nitrone, N-methyl nitrone, and their hydroxylamine tautomers (vinyl-hydroxylamine and N-methyl vinyl-hydroxylamine) on the reconstructed Si(100)-2 x 1 surface has been investigated by means of hybrid density functional theory (B3LYP) and Moller-Plesset second-order perturbation (MP2) methods. The calculations predicted that both of the nitrones should react with the surface dimer via facile concerted 1,3-dipolar cycloaddition leading to 5-member-ring compounds. The reaction of hydroxylamine tautomers on the Si(100) surface follows pi-complex (intermediate) mechanism. For the reaction of N-methyl vinyl-hydroxylamine, the pi-complex intermediate undergoes [2+2] cycloaddition leading to a 4-member-ring compound. But in the reaction of vinyl-hydroxylamine, the intermediate undergoes H-migration reaction ("ene" reaction) resulting in the oxime-terminated Si surface. All the surface reactions result in the hydroxyl-terminated silicon surfaces, which are very useful for the further modification of the semiconductor.

Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry

Jenkins, Tudor; Brieva, A.C.; Jones, D.G.; Evans, D.A., (2006) 'Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry', Journal of Applied Physics 99 pp.73504 RAE2008

X-ray photoelectron spectroscopy analysis of zirconium nitride-like films prepared on Si(100) substrates by ion beam assisted deposition

Thin zirconium nitride films were prepared on Si(l 00) substrates at room temperature by ion beam assisted deposition with a 2 keV nitrogen ion beam. Arrival rate ratios ARR(N/Zr) used were 0.19, 0.39, 0.92, and 1.86. The chemical composition and bonding structure of the films were analyzed with X-ray photoelectron spectroscopy (XPS). Deconvolution results for Zr 3d, Zr 3p(3/2), N 1s, O 1s, and C 1s XPS spectra indicated self-consistently the presence of metal Zr-0, nitride ZrN, oxide ZrO2, oxymnide Zr2N2O, and carbide ZrC phases, and the amounts of these compounds were influenced by ARR(N/Zr). The chemical composition ratio N/Zr in the film increased with increasing ARR(N/Zr) until ARR(N/Zr) reached 0.92, reflecting the high reactivity of nitrogen in the ion beam, and stayed almost constant for ARR(N/Zr) >= 1, the excess nitrogen being rejected from the growing film. A considerable incorporation of contaminant oxygen and carbon into the depositing film was attributed to the getter effect of zirconium. (C) 2007 Elsevier B.V. All rights reserved.

The role of carbon impurities on the Si(001)-c(4 x 4) surface reconstruction: Theoretical calculations

In this work we employ the state-of-the-art pseudopotential method, within a generalized gradient approximation to the density functional theory, combined with a recently developed method for the calculation of HREELS spectra to study a series of different proposed models for carbon incorporation on the silicon (001) surface. A fully discussion on the geometry, energetics and specially the comparison between experimental and theoretical STM images and electron energy loss spectra indicate that the Si(100)-c(4 x 4) is probably induced by Si-C surface dinners, in agreement with recent experimental findings. (C) 2009 Elsevier B.V. All rights reserved.

Furan interaction with the Si(001)-(2 x 2) surface: structural, energetics, and vibrational spectra from first-principles

In this work we employ the state of the art pseudopotential method, within a generalized gradient approximation to the density functional theory, to investigate the adsorption process of furan on the silicon (001) surface. A direct comparison of different adsorption structures with x-ray photoelectron spectroscopy (XPS), ultra-violet photoelectron spectroscopy (UPS), high resolution electron energy loss spectroscopy (HREELS), near edge x-ray absorption fine structure (NEXAFS), and high resolution spectroscopy experimental data allows us to identify the [4 + 2] cycloaddition reaction as the most probable adsorbate. In addition, theoretical scanning tunnelling microscopy (STM) images are presented, with a view to contributing to further experimental investigations.