Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry
Contribuinte(s) |
Mathematics and Physics Institute of Mathematics & Physics (ADT) Institute of Mathematics & Physics (ADT) |
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Data(s) |
09/12/2008
09/12/2008
01/04/2006
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Resumo |
Jenkins, Tudor; Brieva, A.C.; Jones, D.G.; Evans, D.A., (2006) 'Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry', Journal of Applied Physics 99 pp.73504 RAE2008 The internal structure of copper(II)-phthalocyanine (CuPc) thin films grown on SiO2/Si by organic molecular beam deposition has been studied by grazing incidence x-ray reflectometry (GIXR) and atomic force microscopy. The electronic density profile is consistent with a structure formed by successive monolayers of molecules in the form with the b axis lying in the substrate surface plane. The authors present an electronic density profile model of CuPc films grown on SiO2/Si. The excellent agreement between the model and experimental data allows postdeposition monitoring of the internal structure of the CuPc films with the nondestructive GIXR technique, providing a tool for accurate control of CuPc growth on silicon-based substrates. In addition, since the experiments have been carried out ex situ, they show that these structures can endure ambient conditions. Peer reviewed |
Formato |
73504 |
Identificador |
Brieva , A , Jenkins , T , Jones , D G , Str?ssner , F , Evans , D A & Clark , G F 2006 , ' Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry ' Journal of Applied Physics , vol 99 , no. 7 , pp. 73504 . DOI: 10.1063/1.2180399 0021-8979 PURE: 89298 PURE UUID: 27ec2501-42e1-4711-ae4f-5260e84e0ddf dspace: 2160/1462 |
Idioma(s) |
eng |
Relação |
Journal of Applied Physics |
Tipo |
/dk/atira/pure/researchoutput/researchoutputtypes/contributiontojournal/article |
Direitos |