Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry


Autoria(s): Brieva, Abel; Jenkins, Tudor; Jones, Daniel Garfield; Str?ssner, F.; Evans, D. A.; Clark, G. F.
Contribuinte(s)

Mathematics and Physics

Institute of Mathematics & Physics (ADT)

Institute of Mathematics & Physics (ADT)

Data(s)

09/12/2008

09/12/2008

01/04/2006

Resumo

Jenkins, Tudor; Brieva, A.C.; Jones, D.G.; Evans, D.A., (2006) 'Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry', Journal of Applied Physics 99 pp.73504 RAE2008

The internal structure of copper(II)-phthalocyanine (CuPc) thin films grown on SiO2/Si by organic molecular beam deposition has been studied by grazing incidence x-ray reflectometry (GIXR) and atomic force microscopy. The electronic density profile is consistent with a structure formed by successive monolayers of molecules in the form with the b axis lying in the substrate surface plane. The authors present an electronic density profile model of CuPc films grown on SiO2/Si. The excellent agreement between the model and experimental data allows postdeposition monitoring of the internal structure of the CuPc films with the nondestructive GIXR technique, providing a tool for accurate control of CuPc growth on silicon-based substrates. In addition, since the experiments have been carried out ex situ, they show that these structures can endure ambient conditions.

Peer reviewed

Formato

73504

Identificador

Brieva , A , Jenkins , T , Jones , D G , Str?ssner , F , Evans , D A & Clark , G F 2006 , ' Internal structure of copper(II)-phthalocyanine thin films on SiO2/Si substrates investigated by grazing incidence x-ray reflectometry ' Journal of Applied Physics , vol 99 , no. 7 , pp. 73504 . DOI: 10.1063/1.2180399

0021-8979

PURE: 89298

PURE UUID: 27ec2501-42e1-4711-ae4f-5260e84e0ddf

dspace: 2160/1462

http://hdl.handle.net/2160/1462

http://dx.doi.org/10.1063/1.2180399

Idioma(s)

eng

Relação

Journal of Applied Physics

Tipo

/dk/atira/pure/researchoutput/researchoutputtypes/contributiontojournal/article

Direitos