Non-stoichiometry Related Deep Level Defects in Semi-insulating InP

Semi-insulating (SI) InP materials have been prepared under different stoichiometric conditions, including Fe-doping in indium-rich melt and high temperature annealing undoped wafer in phosphorus and iron phosphide ambients. Deep level defects related with non-stoichiometry have been detected in the SI-InP samples. A close relationship between the material quality of electrical property and native deep defects has been revealed by a comprehensive study of defects in as-grown Fe-doped and annealed undoped SI-InP materials. Fe-doped SI-InP material with low carrier mobility and poor thermal stability contains a high concentration of deep defects with energy levels in the range of 0.1-0.4eV. The suppression of the defects by high temperature annealing undoped InP leads to the manufacture of high quality SI-InP with high mobility and good electrical uniformity. A technology for the growth of high quality SI-InP through stoichiometry control has been proposed based on the results.

（111）A InP衬底上MOCVD外延InGaAsP的表面形貌和光学特性

为了研究(111)衬底的特性以及实现等边三角形微腔激光器，利用金属有机化学气相淀积(MOCVD)研究了(111)A InP衬底上InGaAsP外延层的表面形貌和光学特性。考虑到(111)A InP衬底的悬挂键密度比较低，在生长过程中有意提高了V／III比。通过扫描电子显微镜(SEM)和光荧光(PL)谱分别研究了外延层的表面形貌和光学特性。实验发现，表面形貌和光学特性随V／III比和温度的变化非常大。最佳V／IlI比和温度分别为400和625℃。

基于InP／空气隙布拉格反射镜的长波长谐振腔光电探测器

报道了一种长波长的InP基谐振腔(RCE)光电探测器．采用选择性湿法刻蚀，制备出基于InP／空气隙的分布布拉格反射镜，并将该结构的反射镜引人RCE光电探测器．制备的器件在波长1.510μm处获得了约59％的峰值量子效率，以及8GHz的3dB响应带宽，其中器件的台面面积为50μm * 50μm．

InP(001)基衬底上自组织生长InAs量子点（线）的光学性质研究

在InP(001)基衬底上用分子束外延方法生长InAs纳米结构材料,通过衬底的旋转与否及混合生长模式,得到了两种InAs量子点和量子线，并研究了量子点、线的光学性质。结果表明，两种方式都可生长出较强发光的量子点(线)；由量子点排列构成的量子线的光致发光光谱呈现出多峰结构，分析和理论计算表明这是InAs量子线上各量子点在垂直方向上不同高度分布和非连续性而造成的。

10*10nGaAsP/InP阵列波导光栅器件的研制

研制了脊形波导结构的10*10InGaAsP/InP阵列波导光栅器件（AWG），并采用掺饵光纤放大器（EDFA）作宽带光源测量了AWG的近场图以及分光特性。

光电子材料InP玷污的研究

文章给出了光电子材料InP的（100）和（111）晶面质谱分析的结果，对（100）晶面做了光荧光分析。在300和77 K温度下测量了（100）晶面的电子浓度及电子迁移率。研究表明玷污主要来自硅。

窄条宽化学气相沉积选区生长InP系材料波长调制的研究

采用窄条宽选区生长化学气相沉积（NSAG-MOCVD）技术在掩膜宽度0～40 μm范围内，获得波长漂移达177.5 nm的高质量的InGaAsP材料，经推导，获得各个生长区域的组份、应变和In，Ga的气相浓度增加因子的比值随掩膜条宽的变化关系，并且认为该比值在阈值掩膜宽度范围内，与III族分压比相关，大于阈值掩膜宽度范围内，与III族源无关，此外，对材料富In现象作了合理解释。

Influence of Fe Doping Concentration on Some Properties of Semi-Insulating InP

Properties of Fe-doped semi-insulating (SI) InP with different iron concentrations are studied by using Hall effect, current-voltage (I-V), photoluminescence spectroscopy (PL) and photocurrent spectroscopy (PC) measurements. I-V characteristics of SI InP strongly depend on Fe doping concentration. Fe doping concentration also influences optical properties and defective formation in as-grown SI InP. Band-gap narrowing phenomenon and defects in Fe doped SI InP are studied using PI and PC.

Preparation of Semi-Insulating Material by Annealing Undoped InP

Semi-insulating (SI) InP wafers of 50 and 75mm in diameter can be obtained by annealing of undoped liquid encapsulated Czochralski (LEC) InP at 930 ℃ for 80h. The annealing ambient can be pure phosphorus (PP) or iron phosphide (IP). The IP-SI InP wafers have good electrical parameters and uniformity of whole wafer. However, PP-SI InP wafers exhibit poor uniformity and electrical parameters, Photoluminescence which is subtle to deep defect appears in IP-annealed semi-insulating InP. Traps in annealed SI InP are detected by the spectroscopy of photo-induced current transient. The results indicate that there are fewer traps in IP-annealed undoped SI InP than those in as-grown Fe-doped and PP-undoped SI-undoped SI InP. The formation mechanism of deep defects in annealed undoped InP is discussed.

窄条宽MOCVD选区生长InP系材料的速率增强因子

报道了窄条宽选区生长有机金属化学气相沉积（NSAG－MOCVD）成功生长的InP系材料，并提出在NSAG－MOCVD生长研究中，引入填充因子的必要性，给出速率增强因子随填充因子变化的经验公式，计算得出速率增强因子随填充因子的变化关系。与实验结果作了比较，发现InP的速率增强因子主要取决于掩膜宽度，InGaAsP的速率增强因子不仅与掩膜宽度有关，同时也依赖于生长厚度，且这种依赖性随掩膜宽度的增加而增加。

Electrical Transport Properties of Annealed Undoped InP

The electrical properties of annealed undoped n-type InP are studied by temperature dependent Hall effect (TDH) and current-voltage (I-V) measurements for semiconducting and semi-insulating samples, receptively. Defect band conduction in annealed semiconducting InP can be observed from TDH measurement, which is similar to those of as-grown unintentionally doped InP with low carrier concentration and moderate compensation. The I-V curves of annealed undoped SI InP exhibit ohmic property in the applied field region up to the onset of breakdown. Such a result is different from that of as-grown Fe-doped SI InP which has a nonlinear region in I-V curve explained by the theory of space charge limited current.

Investigation of Residual Donor Defects in Undoped and Fe-Doped LEC InP

The free electron concentration of as-grown liquid encapsulated Czochralski (LEC) InP measured by Hall effect is much higher than the concentration of net donor impurity determined by glow discharge mass spectroscopy. Evidence of the existence of a native donor hydrogen-indium vacancy complex in LEC undoped and Fe-doped InP materials can be observed with infrared absorption spectra. The concentration increase of the donor complex correlates with the increase of ionized deep acceptor iron impurity Fe~(2+) concentration in Fe-doped semi-insulating (SI) InP. These results indicate that the hydrogen-indium vacancy complex is an important donor defect in as-grown LEC InP, and that it has significant influence on the compensation in Fe-doped SI InP.

非原生掺杂半绝缘磷化铟（InP）及其应用对比

过去的几年中，由于1.31和1.55μm波长半导体激光器在光纤通信领域得到了广泛的应用，磷化铟（InP）衬底材料的研究和规模化生产因此受到了极大的推动，并已逐步成为继硅（Si）和砷化镓（GaAs）之后又一重要的化合物半导体材料。与GaAs相比，InP晶体具有高的饱和电场漂移速度、良好的导热性和较强的抗辐射能力等优点，因此更适合于制造高频、高速、大功率及外层空间用微波器件和电路。从实际使用的情况看，n和p型InP衬底的性能已基本满足要求，而半绝缘类型衬底则无论从一致性还是均匀性方面都需要较大程度地改善。相应地，这种改善的途径和方法已成为半导体材料的研究热点之一。

气相和溶液多硫化物钝化InP表面的XPS和AFM研究

国家自然科学基金

InGaAs/InP中离子注入和新型HPT

北京市基金,国家自然科学基金