993 resultados para phase pupil mask


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By properly designing a phase pupil mask to modulate or encode the optical images and then digitally restoring them, one can greatly extend the depth of field and improve image quality. The original works done by Dowski and Cathey introduce the use of a cubic phase pupil mask to extend the depth of field. The theoretical and experimental researches all verified its effectiveness. In this paper, we suggest the use of an exponential phase pupil mask to extend the depth of field. This phase mask has two variable parameters for designing to control the shape of the mask so as to modulate the wave-front more flexible. We employ an optimization procedure based on the Fisher information metric to obtain the optimum values of the parameters for the exponential and the cubic masks, respectively. A series of performance comparisons between these two optimized phase masks in extending the depth of field are then done. The results show that the exponential phase mask provide slight advantage to the cubic one in several aspects. (c) 2006 Elsevier B.V. All rights reserved.

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As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

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The correlation between the coma sensitivity of the alternating phase-shifting mask (Alt-PSM) mark and the mark's structure is studied based on the Hopkins theory of partially coherent imaging and positive resist optical lithography (PROLITH) simulation. It is found that an optimized Alt-PSM mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than Alt-PSM marks with the same pitch and the different phase widths. The pitch of the Alt-PSM mark is also optimized by PROLITH simulation, and the structure of p - 1.92 lambda/NA and pw = 2p/3 proves to be with the highest sensitivity. The optimized Alt-PSM mark is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark with its phase width being a half its pitch, the measurement accuracies of Z(7) and Z(14) apparently increase. (C) 2009 Optical Society of America

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A new set of continuous superresolution filters is proposed which exhibits a radial superresolution performance with an extended depth of focus in an optical system by properly choosing the design parameters. Numerical simulation results of the performance parameters of the superresolution gain, the radial central core size, the Strehl ratio, the side-lobe factor and the depth of focus with different design parameters for the optimized patterns are displayed. We also give a design example for this kind of filter characterized by a birefringent element inserted between two parallel polarizers. This kind of filter would be useful in fields such as optical data storage systems.

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星间激光通讯中,精跟踪起着十分重要的作用,而精密偏转镜(FSM)是精跟踪系统中最为关键的部件.基于光学矢量反射定律,推导得到了FSM的精确光学特性,这一特性为精跟踪控制系统提供了精确的理论依据.设计了基于FSM精确光学特性的精跟踪控制系统,对系统整定所用的单纯形法进行了两点重要改进,并对所设计的精跟踪系统进行了数字模拟,由此实现了对FSM的精确控制,提高了精跟踪系统的精确性;将光学衍射超分辨原理应用到星间激光通讯中.利用三区位相光瞳滤波器的超分辨性能,改变光学系统的点扩散函数,从而改变接收端焦平面上的光强

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As feature size decreases, especially with the use of resolution enhancement technique, requirements for the coma aberrations in the projection lenses of the lithographic tools have become extremely severe. So, fast and accurate in situ measurement of coma is necessary. In the present paper, we present a new method for characterizing the coma aberrations in the projection lens using a phase-shifting mask and a transmission image sensor. By measuring the image positions at multiple NA and partial coherence settings, we are able to extract the coma aberration. The simulation results show that the accuracy of coma measurement increases approximately 20% compared to the previous straightforward measurement technique. (c) 2005 Elsevier GmbH. All rights reserved.

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To decouple interocular suppression and binocular summation we varied the relative phase of mask and target in a 2IFC contrast-masking paradigm. In Experiment I, dichoptic mask gratings had the same orientation and spatial frequency as the target. For in-phase masking, suppression was strong (a log-log slope of ∼1) and there was weak facilitation at low mask contrasts. Anti-phase masking was weaker (a log-log slope of ∼0.7) and there was no facilitation. A two-stage model of contrast gain control [Meese, T.S., Georgeson, M.A. and Baker, D.H. (2006). Binocular contrast vision at and above threshold. Journal of Vision, 6: 1224-1243] provided a good fit to the in-phase results and fixed its free parameters. It made successful predictions (with no free parameters) for the anti-phase results when (A) interocular suppression was phase-indifferent but (B) binocular summation was phase sensitive. Experiments II and III showed that interocular suppression comprised two components: (i) a tuned effect with an orientation bandwidth of ∼±33° and a spatial frequency bandwidth of >3 octaves, and (ii) an untuned effect that elevated threshold by a factor of between 2 and 4. Operationally, binocular summation was more tightly tuned, having an orientation bandwidth of ∼±8°, and a spatial frequency bandwidth of ∼0.5 octaves. Our results replicate the unusual shapes of the in-phase dichoptic tuning functions reported by Legge [Legge, G.E. (1979). Spatial frequency masking in human vision: Binocular interactions. Journal of the Optical Society of America, 69: 838-847]. These can now be seen as the envelope of the direct effects from interocular suppression and the indirect effect from binocular summation, which contaminates the signal channel with a mask that has been suppressed by the target. © 2007 Elsevier Ltd. All rights reserved.

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A new set of pure phase filters for realizing transverse superresolution is presented in this paper. The filters, whose significant features are their ability to tune and their simplicity, consist of one half-wave plate between two quarter-wave plates; the half-wave plate is made of two zones that can rotate with respect to each other. By rotating any zone of the half-wave plate, the central lobe width of the irradiance point spread function (PSF) in the transverse direction can be tunably reduced. At the same time, the axial intensity distribution is analysed in detail.