Aberration induced intensity imbalance of alternating phase shifting mask in lithographic imaging
| Data(s) |
2010
|
|---|---|
| Identificador | |
| Idioma(s) |
中文 |
| Fonte |
Peng B(彭勃),Wang XZ(王向朝),Qiu ZC(邱自成),Yuan QY(袁琼雁),Cao YT(曹宇婷).Aberration induced intensity imbalance of alternating phase shifting mask in lithographic imaging.Optics Letters,2010,35(9):1404-1406 |
| Palavras-Chave | #光学 |
| Tipo |
期刊论文 |
