AlxGa（1-x）As/GaAs异质结界面上二维电子气量了霍耳效应的测量

于2010-11-23批量导入

InxGa（1-x）As/GaAs应变单量子阱结构的静压光致发光研究

国家自然科学基金

预注入对Si_(1-x)C_x合金形成的影响

室温下在单晶Si中注入 (0 6— 1 5 )at%的C原子 ,部分样品在C离子注入之前在其中注入2 9Si+ 离子产生损伤 ,然后在相同条件下利用高温退火固相外延了Si1 -xCx 合金 ,研究了预注入对Si1 -xCx 合金形成的影响 .如果注入C离子的剂量小于引起Si非晶化的剂量 ,在 95 0℃退火过程中注入产生的损伤缺陷容易与C原子结合形成缺陷团簇 ,难于形成Si1 -xCx 合金 ,预注入形成的损伤有利于合金的形成 .随着C离子剂量的增大 ,注入产生的损伤增强 ,预注入反而不利于Si1 -xCx 合金的形成 ,但当注入C原子的浓度超过固相外延的溶解度时 ,预注入的影响可以忽略 .退火温度升高到 10 5 0℃ ,无论预注入还是未预注入样品 ,C含量低的合金相仍然保留 ,而C含量高的合金相大部分消失 .

不同剂量C离子注入Si单晶中Si_(1-x)C_x合金的形成及其特征

室温下在单晶Si中注入 (0 6— 1 5 ) %的C原子 ,利用高温退火固相外延了Si1-xCx 合金 ,研究了不同注入剂量下Si1-xCx 合金的形成及其特征 .如果注入C原子的浓度小于 0 6 % ,在 85 0— 95 0℃退火过程中 ,C原子容易与注入产生的损伤缺陷结合 ,难于形成Si1-xCx 合金相 .随注入C原子含量的增加 ,C原子几乎全部进入晶格位置形成Si1-xCx 合金 ,但如果注入C原子的浓度达到 1 5 % ,只有部分C原子参与形成Si1-xCx 合金 .升高退火温度 ,Si1-xCx 合金相基本消失 .

C离子注入Si中Si_(1-x)C_x合金的形成及其稳定性

利用离子注入和高温退火的方法在Si中生长了C含量为0.6%~1.0%的Si1?xCx合金, 研究了不同注入剂量下Si1?xCx合金的形成及其在退火过程中的稳定性. 如果注入剂量小于引起Si非晶化的剂量, 850℃退火后, 注入产生的损伤缺陷容易与C原子结合形成缺陷团簇, 难于形成Si1?xCx合金. 随着注入C离子剂量的增大, 注入产生的损伤增强, 容易形成Si1?xCx合金, 但注入的剂量增大到一定程度, Si1?xCx合金的应变将趋于饱和, 即只有部分C原子进入晶格位置形成合金相. Si1?xCx合金一旦形成, 在950℃仍比较稳定, 而温度高于1 000℃, 合金的应力将部分释放. 随着合金中C原子浓度的升高, 合金的稳定性变差.

Mo掺杂对高纯Ce_(1-x)Nd_xO_(2-x/2)(x=0.10,0.15)体系烧结温度及晶界电性能的影响

用柠檬酸硝酸盐法制备高纯Ce1-xNdxO2-x/2(x=0.10,0.15)固溶体,加入摩尔分数为5%的Mo,研究了Mo掺杂对烧结温度、结构及电性能的影响.通过X射线衍射、电感偶合等离子体和场发射扫描电镜等手段对氧化物进行了结构表征,采用交流阻抗谱测试其电性能.柠檬酸硝酸盐法制备的前驱体经1450℃烧结24 h得到致密度大于96%的陶瓷材料;加入5%Mo,在1250℃下烧结8 h即可达到理想的致密度(>95%).加入Mo在烧结过程中可加快晶界迁移,促进晶粒生长,显著提高了晶界电导率.在600℃时Ce0.85Nd0.15O1.925的晶界电导率为2.56 S/m,加入Mo后材料的电导率增加到5.62 S/m.

(Ce_(0.9)Nd_(0.1))_(1-x)Mo_xO_(2-δ)(0.00≤x≤0.10)的合成、表征与电性能

采用溶胶-凝胶法合成(Ce0.9Nd0.1)1-xMoxO2-δ(x=0.00、0.02、0.05、0.10)氧化物,通过X射线衍射(XRD)、场发射扫描电镜(FESEM)等手段对氧化物进行结构表征,交流阻抗谱测试电性能.结果表明:所有样品均为单一萤石立方结构;少量MoO3的加入提高了材料的致密性,降低了材料的总电阻、晶界电阻和晶界电阻在总电阻中所占比例,提高了材料的电导率.1200℃烧结样品24h,测试温度700℃时,(Ce0.9Nd0.1)1-xMoxO2-δ(x=0.00)总电导率和晶界电导率分别为0.05和0.19S·m-1,掺Mo材料(Ce0.9Nd0.1)1-xMoxO2-δ(x=0.02)的总电导率和晶界电导率分别为2.42和3.96S·m-1.

Sol-ogel deposition and luminescence properties of lanthanide ion-doped Y2(1-x)Gd2xSiWO8 (0 <= x <= 1) phosphor films

Y2(1-x) Gd2xSiWO8 : A ( 0 <= x <= 1; A= Eu3+, Dy3+, Sm3+, Er3+) phosphor films have been prepared on silica glass substrates through the sol - gel dip-coating process. X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FT-IR), thermogravimetric and differential thermal analysis (TG-DTA), atomic force microscope (AFM), scanning electron microscopy (SEM) and photoluminescence spectra as well as lifetimes were used to characterize the resulting films. The results of the XRD indicated that the films began to crystallize at 800 degrees C and crystallized completely at 1000 degrees C. The AFM and SEM study revealed that the phosphor films, which mainly consisted of closely packed grains with an average size of 90 - 120 nm with a thickness of 660 nm, were uniform and crack free. Owing to an efficient energy transfer from the WO42- groups to the activators, the doped lanthanide ion ( A) showed its characteristic f - f transition emissions in crystalline Y2(1-x) Gd2xSiWO8 (0 <= x <= 1) films. The optimum concentrations for Eu3+, Dy3+, Sm3+, Er3+ were determined to be 21, 5, 3 and 7 mol% of Y3+ in Y2SiWO8 films, respectively.

The structure and electrochemical characteristics of La0.67Mg0.33 (Ni0.8Co0.1Mn0.1)(x) (x=2.5-5.0) multiphase alloys for nickel-metal hydride batteries

This paper presents results concerning structure and electrochemical characteristics of the La0.67Mg0.33 (Ni0.8Co0.1Mn0.1) (x) (x=2.5-5.0) alloy. It can be found from the result of the Rietveld analyses that the structures of the alloys change obviously with increasing x from 2.5 to 5.0. The main phase of the alloys with x=2.5-3.5 is LaMg2Ni9 phase with a PuNi3-type rhombohedral structure, but the main phase of the alloys with x=4.0-5.0 is LaNi(5)phase with a CaCu5-type hexagonal structure. Furthermore, the phase ratio, lattice parameter and cell volume of the LaMg2Ni9 phase and the LaNi5 phase change with increasing x. The electrochemical studies show that the maximum discharge capacity increases from 214.7 mAh/g (x=2.5) to 391.1 mAh/g (x=3.5) and then decreases to 238.5 mAh/g (x=5.0). As the discharge current density is 1,200 mA/g, the high rate dischargeability (HRD) increases from 51.1% (x=2.5) to 83.7% (x=3.5) and then decreases to 71.6% (x=5.0). Moreover, the exchange current density (I-0) of the alloy electrodes first increases and then decrease with increasing x from 2.5 to 5.0, which is consistent with the variation of the HRD. The cell volume reduces with increasing x in the alloys, which is detrimental to hydrogen diffusion and accordingly decreases the low-temperature dischargeability of the alloy electrodes.

高功率镍氢电池La_(1-x)Mg_x(NiCoAl)_(3.6)金属氢化物电极的电化学性能研究

MH-Ni电池具有电化学比能量高、耐过充/放电性能好、无记忆效应和环境友好等优点而得到广泛应用.金属氢化物电极是MH-Ni电池的核心材料,其研究工作主要集中在稀土AB_5系、钛系、锆系和镁基等合金作为MH-Ni电池金属氢化物电极方面.但这些体系合金的电化学容量低,活化