Phase-shifting apodizer for next-generation digital versatile disk

The next generation digital versatile disk (DVD) using blue lasers will have a capacity of 13 to 15 Gbytes. Compared with current DVD, the wavelength will be shorter and the numerical aperture (NA) will be higher. But with the increase of NA and decrease of wave length, the depth of focus (DOF) decrease rapidly, which makes it hard for the servo-system to track. We propose an optimized three-portion phase-shifting apodizer to increase the depth of focus and at the same time minimize the spot size, which makes the DOF of next generation DVD comparable to current DVD. The simulation result shows that an optical system with this apodizer also has a good defocus characteristic. (C) 2001 Society of Photo-Optical Instrumentation Engineers.

Tunable three-dimensional intensity distribution by a pure phase-shifting apodizer

The three-dimensional distribution of light intensity that is modulated by a pure phase-shifting apodizer is studied. Results show that the Strehl ratio can be altered by the proposed apodizer and by the waist width of incident Gaussian beams. By changing geometrical parameters of the proposed apodizer, we can increase the focal depth to several times that of the original system. The proposed apodizer can also be used to realize focal splitting and local minimum of intensity, which may be advantageous for constructing an optical trap. Furthermore, the local minimum of intensity number is tunable by changing the parameters of the apodizer. (c) 2005 Optical Society of America

Phase-shifting apodizers for increasing focal depth

We propose the use of a phase-shifting apodizers to increase focal depth, and we study the axial and radial behavior of this kind of apodizer under the condition that the axial intensity distribution is optimized for high focal depth. (C) 2002 Optical Society of America.

A phase-shifting vectorial-shearing interferometer with wedge plate phase-shifter

We present a novel phase-shifting vectorial-shearing interferometer with a wedge plate phase-shifter. The interferometer is based on a modified Mach-Zehnder configuration; the common-path nature makes it capable of testing the wavefront of a short coherence-length light source, such as a laser diode. Vectorial shear (shearing in the x and y directions simultaneously) in an arbitrary direction is introduced by inserting two wedge plates orthogonally in two arms, respectively. One of the wedge plates is split into two parts (parallel part and wedge part); phase shift is produced by moving the wedge part in contact along the parallel part. The moving distance for a 2 pi phase shift is a few millimetres in specific conditions. The wedge plate phase-shifter increases the moving distance for phase shift and makes the control of phase shift relatively easy. We also discuss the lateral shear error and phase shift errors induced by wedge plates. The lateral shear error is small enough to be ignored; the phase shift error is determined mainly by the wedge angle error. Lastly, we give the experimental results of phase-shifting interference fringes in vectorial shear mode.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Methods for removal of spurious reflection effect on phase-shifting interferometry

Spurious reflection is one of the troublesome problems in phase-shifting interferometry. This paper deals with the problem on the basis of a two-run-times-two-frame phase-shift algorithm, in which the phase shifts are shared out between the reference beam and the object beam. The effect of spurious reflection on phase measurement is investigated; two simple methods for removal of the effect are presented and each needs only six interferograms. Two other solutions to the spurious reflection problem are also reviewed. The simulation results obtained using these four solutions are compared. The influence of a mix of phase-shifter miscalibration and spurious reflection on phase measurement is also discussed.

Discussions about FFT-based two-step phase-shifting algorithm

An FFT-based two-step phase-shifting (TPS) algorithm is described in detail and implemented by use of experimental interferograms. This algorithm has been proposed to solve the TPS problem with random phase shift except pi. By comparison with the visibility-function-based TPS algorithm, it proves that the FFT-based algorithm has obvious advantages in phase extracting. Meanwhile, we present a pi-phase-shift supplement to the TPS algorithm, which combines the two interferograms and demodulates the phase map by locating the extrema of the combined fringes after removing the respective backgrounds. So combining this method and FFT-based one, one could really implement the TPS with random phase shift. Whereafter, we systematically compare the TPS with single-interferogram analysis algorithm and conventional three-step phase-shifting one. The results demonstrate that the FFT-based TPS algorithm has a satisfactory accuracy. At last, based on the polarizing interferometry, a schematic setup of two-channel TPS interferometer with random phase shift is suggested to implement the simultaneous collection of interferograms. (c) 2007 Elsevier GrnbH. All rights reserved.

Simultaneous phase-shifting ellipsometry based on grating beamsplitter

Simultaneous phase-shifting ellipsometry based on a grating beamsplitter is presented. In the corresponding setup, an orthogonal grating and analyzer array are used. The latter is composed of four separate analyzers arranged in a 2x2 grid, the polarization axes of which are set to 0, 45, 90, and 135 deg. A mask allows only four diffracted beams of the fist order, having the same optical intensities, to pass. Each beam is incident on one of the analyzers of the array. The intensities of the four beams are simultaneously detected by a quadrant detector. The ellipsometric parameters are obtained using the four intensity signals. The feasibility of simultaneous phase shifting ellipsometry is thus demonstrated. (C) 2008 Society of Photo-Optical Instrumentation Engineers.

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

The correlation between the coma sensitivity of the alternating phase-shifting mask (Alt-PSM) mark and the mark's structure is studied based on the Hopkins theory of partially coherent imaging and positive resist optical lithography (PROLITH) simulation. It is found that an optimized Alt-PSM mark with its phase width being two-thirds its pitch has a higher sensitivity to coma than Alt-PSM marks with the same pitch and the different phase widths. The pitch of the Alt-PSM mark is also optimized by PROLITH simulation, and the structure of p - 1.92 lambda/NA and pw = 2p/3 proves to be with the highest sensitivity. The optimized Alt-PSM mark is used as a measurement mark to retrieve coma aberration from the projection optics in lithographic tools. In comparison with an ordinary Alt-PSM mark with its phase width being a half its pitch, the measurement accuracies of Z(7) and Z(14) apparently increase. (C) 2009 Optical Society of America

Even aberration measurement of lithographic projection system based on optimized phase-shifting marks

In the present paper, we propose a novel method for measuring the even aberrations of lithographic projection optics by use of optimized phase-shifting marks on the test mask. The line/space ratio of the phase-shifting marks is optimized to obtain the maximum sensitivities of Zernike coefficients corresponding to even aberrations. Spherical aberration and astigmatism can be calculated from the focus shifts of phase-shifting gratings oriented at 0 degrees, 45 degrees, 90 degrees and 135 degrees at multiple illumination settings. The PROLITH simulation results show that, the measurement accuracy of spherical aberration and astigmatism obviously increase, after the optimization of the measurement mark. (C) 2008 Elsevier B.V. All rights reserved.