139 resultados para 520


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针对光纤陀螺的工作环境和结构特点,用有限元方法分析了结构件的固有频率对结构参数的敏感性。根据结构几何尺寸对固有频率的影响,在不降低固有频率的基础上对光纤陀螺的结构进行了小型化和轻型化设计,改进后的体积缩小19.56%,质量减轻37%,一阶谐振频率提高19.1%。优化装配工艺也能提高陀螺在振动环境下的性能。采用绝缘子实现了电子线路走线最短,以及所有光学元器件无活动尾纤,并采用了焊点保护,提高了光纤陀螺的可靠性和一致性,试验验证了改进后光纤陀螺在振动状态下精度接近静止环境下的精度。

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对半干旱区黄土高原草地在封育和放牧条件下土壤种子库种子密度、种子库组成、种子库物种多样性及均匀性进行了比较研究,并得出主要结论:1)封育提高土壤种子库的植物种类和密度,使优良禾草和多年生植物增加。2)种子库的垂直分布规律是随着土层的加深,种子在数量上递减的速度较快。3)坡向和坡位对土壤种子库有较大影响,种子库密度变化趋势是阴坡>阳坡;坡下部>坡中部>坡上部。4)从丰富度、Shannon-Wiener多样性和均匀性3个方面比较分析封育和放牧样地土壤种子库多样性,得出封育样地Margalef丰富度指数和Shannon-Wiener指数都高于放牧地,Pielou均匀性指数低于放牧地。

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分别采用溶胶凝胶方法,固相合成法,燃烧法,均相沉淀法在不同的铝酸盐中研究了稀土离子的发光性质及稀土离子之间的能量传递。并对各种方法合成的稀土铝酸盐的发光性能进行比较。全新方法——均相沉淀法合成的稀土铝酸盐既克服了传统的溶胶凝胶方法中有机碳对还原气氛的影响,又能够在较低温度下,较短的时间内合成铝酸盐,克服铝酸盐合成温度高时间长的弊病。以这种方法在750 ℃,4h即可合成发光性能较好的铝酸盐磷光体。系统的合成铝酸盐MAl_2O_4:Eu~(2+), RE~(3+) (M = Mg, Ca, Sr, Ba; RE = Y, La, Ce, Pr, Nd, Sm, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu)的发光及长余辉性质,发现Pr, Nd, Dy, Ho, Er均能够有效的延长MAl_2O_4:Eu~(2+)的发光寿命,同时增强MAl_2O_4:Eu~(2+)的发光亮度。其中以Dy, Eu共掺的铝酸盐磷光体的寿命最长。对于碱土金属,虽然同属于鳞石英结构,但其晶体结构存在明显差别:Mgl_2O_4:Eu~(2+),RE~(3+)隶属于立方晶系,Ca Al_2O_4:Eu~(2+),RE~(3+)和β-SrAl_2O_4:Eu~(2+),RE~(3+)隶属于单斜晶系,Ba Al_2O_4:Eu~(2+), RE~(3+)隶属于六角晶系。所以在发光性能及长余辉性能上表现出不同的特性:Mg Al_2O_4:Eu~(2+),RE~(3+) 和Ba Al_2O_4:Eu~(2+), RE~(3+)的发光分别为480nm, 500nm, 界于Ca Al_2O_4:Eu~(2+), RE~(3+) (436 nm)和 β-SrAl_2O_4:Eu~(2+),RE~(3+) (520 nm)之间。而 Ca Al_2O_4:Eu~(2+),RE~(3+)和β-SrAl_2O_4:Eu~(2+),RE~(3+)由于同属于单斜晶系,所以其发光满足原子序数的变化规律:当某一原子取代较小的其他原子时,发光波长向短波移动。而且Ca Al_2O_4:Eu~(2+),RE~(3+)和β-SrAl_2O_4:Eu~(2+),RE~(3+)都具有较强的发光及余辉。发现新型长余辉发光物质碱土铝酸盐MA:Eu~(2+),RE~(3+),波长位于489nm,是一种发光和余辉都极强的发光材料。而且碱土铝酸盐MA:Eu~(2+),RE~(3+)能与β-SrAl_2O_4:Eu~(2+),RE~(3+)生成非常有效的混晶化合物,从而使其发光在489nm~520 nm的波长范围内移动而不影响化合物的发光性能。研究了SrGdAlO_4:RE~(3+) (RE = Ce, Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er, Tm, Yb, Lu)的发光现象,观察到SrGdAlO_4:RE~(3+) (RE = Ce, Pr, Nd, Sm, Eu, Tb, Dy, Ho, Er)的特征发光,由于Tm, Yb, Lu 在可见区无吸收,所以观察不到它们的发光。讨论并研究了SrGdAlO_4:RE~(3+) 体系的Gd~(3+) → Gd~(3+),Gd~(3+) → RE~(3+)的能量传递机理,总结了RE~(3+)对Gd~(3+)的激发能的俘获速率次序依次为: Eu > Tb >Er > Dy > Sm > Ho > Nd,能量传递主要是通过偶极-偶极相互作用实现的。观察到SrGdAlO_4:Tb~(3+)长余辉发光。

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对于稀土与非稀土所组成的二元复合氧化物的研究国外已有较多的报导。但是,对于稀土和锑的复合氧化物只是近年来才开始有些研究工作。含锑与稀土的多元复合氧化物的报导就更少。本文在我们实验室张静筠等人三元复合氧化物研究的基础上,开展Mo—Sb_2O_5—R_2O_3—R'_2O_3—Bi_2O_3多元体系的研究工作,这对于我国丰产元素稀土和锑的应用以及利用Bi~(3+)的激活与敏化将是有益的。本文按Thornton等人的方法合成了Ba_2BiSbO_6,Ba_2GdSbO_6,按EγΦECEHKO等人的方法合成了M_2RSbO_6 (M = Ba、Sr、Ca, R = La Y)。并以M_2RSbO_6为基质,掺Sm~(3+)、Eu~(3+)、Dy~(3+)、Ho~(3+)、Er~(3+)、Tm~(3+)和Bi~(3+),研究它们的化学组成,晶体结构与发光性能的关系及规律,Bi~(3+)的荧光和敏作用。同时研究了它们的磁学和热学性能。化学组成的分析结果表明,计算的含量与实验测得的含量符合较好,说明化学反应是按化学计量比进行的。通过X-射线粉沫物相分析和晶胞参数的理论计算确定M_2RSbO_6(M = Ba、Sr、R = La、Y、Gd、Bi)复合氧化物是属于立方钙钛太型化合物。空间群为Fm3m,点群为Oh。用计算机计算了Ca_2YSbO_6的晶胞参数并结合荧光光谱分析确定它属于畸变的单斜钙钛矿,空间群为P_(21)。用磁天平测量了样品M_2RSbO_6 (M = Ba、Sr、Ca; R = Gd、Y、Bi)的磁化率。除Ba_2GdSbO_6是顺磁性物质外共余的都是反磁性的物质。按所用原料Sb_2O_5计算的磁化率与测量值符合较好,表明在所研究的M_2RSbO_6化合物中锑是正五价的。用热重热差分析仪测量了样品在反应中的热性能,观察到在化合物形成的过程中所用原料Sb_2O_3大约在520 ℃左右氧化变为Sb_2O_5。除所用原料碳酸盐分解外没有挥发性的物质,这就进一步证明化学组成分析和磁化率测量的结果是正确的。光学测量的结果表明,所有的磷光体随着激活离子浓度的不同其光谱都发生规律性的变化。对于不同Eu~(3+)浓度的Ba_2YSbO_6:Eu~(3+)和Br_2YSbO_6:Eu~(3+), Bi~(3+)体系用254nm激发时均能观察到Eu~(3+)于595nm的尖峰发射。用基质和Bi~(3+)的激发峰325nm激发时,明显地看到敏化剂Bi~(3+)到Eu~(3+)的能量传递,使Eu~(3+)于595nm的发射大大增强,我们认为Bi~(3+)对Eu~(3+)的敏化作用是由于基质和Bi~(3+)的~1S。→ 3P_1的跃迁吸收了激发的能量,然后无辐射弛豫到Eu~(3+)的激发态~5D_0,产生~5D_0 → 7F_1的磁偶极跃迁。对于不同Eu~(3+)浓度的Sr_2YSbO_6:Eu~(3+)和Sr_2YSbO_6:Eu~(3+), Bi~(3+)体系用245nm激发时均能观察到Eu~(3+)于595nm的尖峰发射。用基质和Bi~(3+)的激发峰335nm激发时,观察到基质和Bi~(3+)对Eu~(3+)具有某种能量传递。敏化作用机理与上述的Ba_2YSbO_6:Eu~(3+)和Ba_2YSbO_6:Eu~(3+), Bi~(3+)体系相同。对于不同Eu~(3+)浓度的Ca_2YSbO_6:Eu~(3+)和Ca_2YSbO_6:Eu~(3+), Bi~(3+)体系用396nm激发时,均能观察到Eu~(3+)于613nm很强的尖峰发射。用基质和Bi~(3+)的激发峰313nm激发时,见到Bi~(3+)和基质对Eu~(3+)具有某种能量传递,这种敏化作用主要是由于基质和Bi~(3+)的3P_1 → ~1S_0的400nm的宽带发射和Eu~(3+)的~7F_0 → ~5L_6的396nm的吸收相匹配产生~5L_6→~5D_0→~7F_2的跃迁。通过对激发光谱和荧光光谱的分析给出了Ca_2Y_(0.96)Eu_(0.04)SbO_6的能级图,从实验上可见,Eu~(3+)的发光强烈地依赖于钙钛矿的结构,当Eu~(3+)在空间群为Fm3m 的Ba_2YSbO_6和Sr_2YSbO_6中处于Oh点对称性时,主要是~5D_0 → ~7F_1的磁偶极跃迁。当Eu~(3+)在空间群为P_(21)的单斜钙钛矿中时,主要是~5D_0 → ~7F_2的电偶极跃迁。对于不同掺杂浓度M_2YSbO_6:R~(13+)(M = Ba、Ca; R' = Sm、Dy、Ho、Er、Tm)体系,通过激发和荧光光谱的研究,合理地确定了谱项。发现基质对Sm~(3+)、Dy~(3+)、Ho~(3+)具有敏化作用。对不同Bi~(3+)浓度的Ca_2YSbO_6:Bi~(3+),由激发和荧光光谱可见Bi~(3+)具有二个激发带,第一激发带位于240nm处相当于~1S_0 → ~1P_1的跃迁,第二激发带位于315nm处相当于~1S_0 → ~3P_1的跃迁。有一个很强的兰紫色发射位于400nm处相当于~3P_1 →~1S_0的跃迁。

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以汕头市六区一县为研究区域,采用1996—2007年土地利用详查变更数据,分析

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We have studied the sequential resonant tunneling of doped weakly coupled GaAs/AlAs superlattices under hydrostatic pressure up to 4.5 kbar. The pressure coefficient obtained from the experiment, 15.3 meV/kbar, provides a strong evidence for the formation of the electric field domain due to Gamma-X sequential resonant tunneling, At the same time, we have observed the transition between two kinds of sequential resonant tunneling processes within the pressure range from 0 to 4.5 kbar, where the transition pressure between Gamma-Gamma and Gamma-X sequential resonant tunneling is P-t similar to 1.6 kbar. For P < P-t, the electric field domain is formed by Gamma-Gamma sequential resonant tunneling, while for P > P-t, the electric field domain is preferably formed by Gamma-X sequential resonant tunneling. (C) 1996 American Institute of Physics.

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The simultaneous control of residual stress and resistivity of polysilicon thin films by adjusting the deposition parameters and annealing conditions is studied. In situ boron doped polysilicon thin films deposited at 520 ℃ by low pressure chemical vapor deposition (LPCVD) are amorphous with relatively large compressive residual stress and high resistivity. Annealing the amorphous films in a temperature range of 600-800 ℃ gives polysilicon films nearly zero-stress and relatively low resistivity. The low residual stress and low resistivity make the polysilicon films attractive for potential applications in micro-electro-mechanical-systems (MEMS) devices, especially in high resonance frequency (high-f) and high quality factor (high-Q MEMS resonators. In addition, polysilicon thin films deposited at 570 ℃ and those without the post annealing process have low resistivities of 2-5 mΩ·cm. These reported approaches avoid the high temperature annealing process (> 1000℃), and the promising properties of these films make them suitable for high-Q and high-f MEMS devices.

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High performance InP/InGaAs heterojunction bipolar transistors(HBTs) have been widely used in high-speed electronic devices and optoelectronic integrated circuits. InP-based HBTs were fabricated by low pressure metal organic chemical vapor deposition(MOCVD) and wet chemical etching. The sub-collector and collector were grown at 655 ℃ and other layers at 550 ℃. To suppress the Zn out-diffusion in HBT, base layer was grown with a 16-minute growth interruption. Fabricated HBTs with emitter size of 2.5×20 μm~2 showed current gain of 70~90, breakdown voltage(BV_(CE0))>2 V, cut-off frequency(f_T) of 60 GHz and the maximum relaxation frequency(f_(MAX)) of 70 GHz.

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The layer structure of GaInP/AlGaInP quantum well laser diodes (LDs) was grown on GaAs substrate using low-pressure metalorganic chemical vapor deposition (LP-MOCVD) technique. In order to improve the catastrophic optical damage (COD) level of devices, a nonabsorbing window (NAW), which was based on Zn diffusion-induced quantum well intermixing, was fabricated near the both ends of the cavities. Zn diffusions were respectively carried out at 480, 500, 520, 540, and 580 Celsius degree for 20 minutes. The largest energy blue shift of 189.1 meV was observed in the window regions at 580 Celsius degree. When the blue shift was 24.7 meV at 480 Celsius degree, the COD power for the window LD was 86.7% higher than the conventional LD.

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报道了利用CVD方法大量制备超纯氮化镓微米晶须及纳米线的最新结果。利用镍、甸及其化合物等做催化剂,将金属镓放置在氨气中1000 ℃左右进行反应,结果在衬底上获得了大量的氮化镓微米晶须,及纳米线。许多晶须还通过自组装形成了非常奇特的梯子状的形貌。研究还发现,大部分氮化镓微米晶须的择优生长方向为<0001>方向(c轴方向)。X射线衍射谱揭示,反应产物为非常纯的氮化镓晶体,而低温光致发光谱分析则发现,氮化镓微米晶须在520 nm处有一个杂质发光峰。这一研究结果有助于了解氮化镓晶体的生长机理,并可望应用于微米、纳米蓝光发光二极管等器件。

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报道用自行研制的LP-MOVPE设备,在蓝宝石(α-Al_2O_3)衬底上生长出以InGaN为有源区的蓝光和绿光InGaN/AlGaN双异质结构以及InGaN/GaN量子阱结构的LED,其发射波长分别为430~450nm和520~540nm。

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用MBE方法制备的PHEMT微结构材料,其2DEG浓度随材料结构的不同在2.0-4.0×10~(12)cm~(-2)之间,室温霍耳迁移率在5000-6500cm~2·V~(-1)·s~(-1)之间。制备的PHEMT器件,栅长为0.7μm的器件的直流特性:I_(dss)~280mA/mm,I_(max)~520-580mA/mm,g_m~320-400mS/mm,BV_(DS)>15V(I_(DS)=1mA/mm),BV_(GS)>10V,微波特性:P_0~600-900mW/mm,G~6-10dB,η_(add)~40-60%;栅长为0.4μm的器件的直流特性:I_(max)~800mA/mm,g_m>400mS/mm。

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报道了用LP-MOVPE技术在蓝宝石(α-Al_2O_3)衬底上生长出以双掺Zn和Si的InGaN为有源区的绿光InGaN/AlGaN双异质结结构,并研制成功发射波长为520-540nm的绿光LED。