Effects of Hydrogen Plasma Treatment on the Electrical and Optical Properties of ZnO Films: Identification of Hydrogen Donors in ZnO

Wurtzite ZnO has many potential applications in optoelectronic devices, and the hydrogenated ZnO exhibits excellent photoelectronic properties compared to undoped ZnO; however, the structure of H-related defects is still unclear. In this article, the effects of hydrogen-plasma treatment and subsequent annealing on the electrical and optical properties of ZnO films were investigated by a combination of Hall measurement, Raman scattering, and photoluminescence. It is found that two types of hydrogen-related defects, namely, the interstitial hydrogen located at the bond-centered (H-BC) and the hydrogen trapped at a O vacancy (H-O), are responsible for the n-type background conductivity of ZnO films. Besides introducing two hydrogen-related donor states, the incorporated hydrogen passivates defects at grain boundaries. With increasing annealing temperatures, the unstable H-BC atoms gradually diffuse out of the ZnO films and part of them are converted into H-O, which gives rise to two anomalous Raman peaks at 275 and 510 cm(-1). These results help to clarify the relationship between the hydrogen-related defects in ZnO described in various studies and the free carriers that are produced by the introduction of hydrogen.

instability of standing wave, global existence and blowup for the klein-gordon-zakharov system with different-degree nonlinearities

This paper discusses the Klein–Gordon–Zakharov system with different-degree nonlinearities in two and three space dimensions. Firstly, we prove the existence of standing wave with ground state by applying an intricate variational argument. Next, by introducing an auxiliary functional and an equivalent minimization problem, we obtain two invariant manifolds under the solution flow generated by the Cauchy problem to the aforementioned Klein–Gordon–Zakharov system. Furthermore, by constructing a type of constrained variational problem, utilizing the above two invariant manifolds as well as applying potential well argument and concavity method, we derive a sharp threshold for global existence and blowup. Then, combining the above results, we obtain two conclusions of how small the initial data are for the solution to exist globally by using dilation transformation. Finally, we prove a modified instability of standing wave to the system under study.

Characteristics of InAs epilayers for Hall effect devices grown on GaAs substrates by MBE

InAs thin films with good characteristics were grown on GaAs (0 0 1) substrates by molecular beam epitaxy. Cross-sectional transmission electron microscopy indicated that most of the threading dislocations formed by the interaction of misfit dislocations are annihilated above a small thickness. The high electron mobility and small temperature dependence of InAs epilayers are useful for magnetic sensors which is demonstrated by the properties of Hall effect devices.

Cyclotron resonance and quantum Hall effect studies of the two-dimensional electron gas confined at the GaN/AlGaN interface

We report on high magnetic fields (up to 40 T) cyclotron resonance, quantum Hall effect and Shubnikov-de-Hass measurements in high frequency transistors based on Si-doped GaN-AlGaN heterojunctions. A simple way of precise modelling of the cyclotron absorption in these heterojunctions is presented, We clearly establish two-dimensional electrons to be the dominant conducting carriers and determine precisely their in-plane effective mass to be 0.230 +/- 0.005 of the free electron effective mass. The increase of the effective mass with an increase of two-dimensional carrier density is observed and explained by the nonparabolicity effect. (C) 1997 American Institute of Physics.

高线性度外延及注入GaAs Hall器件

讨论了外延及注入制作的薄层GaAs Hall器件如何获得高的磁线性度。GaAs Hall器件的磁线性度在高磁场下会有偏离，但可以通过外延及注入的过渡层对有源区进行补偿，在合适的有源区和过渡区的浓度和厚度分布中，可以得到在2.5T的强磁场下，±0.04%的高磁线性度。

半绝缘砷化镓Hall测量中的若干问题

建立了绝缘电阻大于10~(13)Ω和温度起伏小于0.1℃的半绝缘砷化镓Hall测量装置。研究了环境温度、湿度、漏电流、数据读取时间、测量电压、样品尺寸等因素对电阻率与迁移率的影响，并讨论了各种因素所引起的测量误差。

MBE生长的InAs薄膜Hall器件

利用GaAs衬底上的InAa薄膜制备的Hall器件，具有灵敏度高(在相同的电子浓度、室温附近灵敏度是GaAs Hall器件的1.5倍)，不等位电压温漂小等优点。可用于电流传感器、无刷电机等磁敏传感器中，具有广阔的应用前景。

InAs薄膜Hall器件

于2010-11-23批量导入

InAs薄膜Hall器件的材料生长与特性研究

报道了利用InAs外延薄膜制作霍尔器件，通过分子束外延技术在GaAs衬底上生长的InAs薄膜具有较高的迁移率和较好的温度特性。用这种材料制作的霍尔器件在每千欧姆内阻条件下灵敏度与GaAs平面Hall器件相比提高了50%。

ON HALL AND KIERS TOPOLOGICAL STATE AND TOTAL TOPOLOGICAL INDEX

The topological state and the total topological index, tau, have been tested systematically. Counterexamples are provided proving that the topological state method cannot determine classes of symmetrically equivalent atoms in a molecule fully correct. The