GROWTH OF WIDE-BAND GAP IMMISCIBLE II-VI ALLOYS BY METALORGANIC VAPOR-PHASE EPITAXY

Although metalorganic vapor phase epitaxy (MOVPE) is generally regarded as a non-equillibrium process, it can be assumed that a chemical equilibrium is established at the vapor-solid interface in the diffusion limited region of growth rate. In this paper, an equilibrium model was proposed to calculate the relation between vapor and solid compositions for II-VI ternary alloys. Metastable alloys in the miscibility gap may not be obtained when the growth temperature is lower than the critical temperature of the system. The influence of growth temperature, reactor pressure, input VI/II ratio, and input composition of group VI reactants has been calculated for ZnSSe, ZnSeTe and ZnSTe. The results are compared with experimental data for the ZnSSe and ZnSTe systems.

Electronic properties of zinc-blende GaN, AlN, and their alloys Ga1-xAlxN

The electronic properties of wide-energy gap zinc-blende structure GaN, A1N, and their alloys Ga(1-x)A1(x)N are investigated using the empirical pseudopotential method. Electron and hole effective mass parameters, hydrostatic and shear deformation potential constants of the valence band at Gamma and those of the conduction band at Gamma and X are obtained for GaN and AIN, respectively. The energies of Gamma, X, L conduction valleys of Ga(1-x)A1(x)N alloy versus Al fraction x are also calculated. The information will be useful for the design of lattice mismatched heterostructure optoelectronic devices based on these materials in the blue light range application. (C) 1995 American Institute of Physics.

Band structure parameters of zinc-blende GaN, AlN and their alloys Ga1-xAlxN

The electronic properties of wide energy gap zinc-blende structure GaN, AlN and their alloys Ga1-xAlxN are investigated using the empirical pseudopotential method. Electron and hole Effective mass parameters, hydrostatic and shear deformation potential constants of the valence band at Gamma and those of the conduction band at Gamma and X are obtained. The energies of Gamma, X, L conduction valleys of Ga1-xAlxN alloy versus Al fraction x are also calculated. The information will be useful for the design of lattice mismatched heterostructure optoelectronic devices in the blue light range.

Ta/NiFe/Cu/NiFe/FeMn/Ta自旋阀多层膜中Cu的层间偏聚及其对磁性的影响

实验结果表明Ta/NiFe/FeMn/Ta多层膜的交换耦合场Hex要大于Ta/NiFe/Cu /NiFe/FeMn/Ta自旋阀多层膜中的Hex. 为了寻找其原因, 用X射线光电子能谱(XPS)研究了Ta(12 nm)/NiFe(7 nm), Ta(12 nm)/NiFe(7 nm)/Cu(4 nm)和Ta(12 nm)/NiFe(7 nm)/ Cu(3 nm)/NiFe(5 nm) 3种样品, 研究结果表明前两种样品表面无任何来自下层的元素偏聚, 但在第3种样品最上层的NiFe表面上, 探测到从下层偏聚上来的Cu原子. 认为: Cu在NiFe/FeMn层间的存在是Ta/NiFe/Cu/NiFe/FeMn/Ta自旋阀多层膜的Hex低于Ta/NiFe/FeMn/Ta多层膜Hex的一个重要原因.

磁性多层膜中SiO_2/Ta界面反应及其对缓冲层的影响

磁性多层膜常以金属Ta作为缓冲层。利用磁控溅射方法在表面有300nm厚SiO_2氧化膜的单晶硅(100)基片上沉积了Ta/NiFe/Ta薄膜。采用X射线光电子能谱（XPS）对该薄膜进行了深度剖析，并且对获得的Ta 4f和Si 2p的高分辨XPS谱进行计算机谱图拟合分析。结果表明在SiO_2/Ta界面处发生了化学反应

Ta/NiO/NiFe/Ta的磁性及界面的结构

利用磁控反应溅射方法以Ta作为缓冲层制备了Ta/NiO/NiFe/Ta薄膜，磁性分析表明，该结构薄膜的交换耦合场为9.6×10~3A/m，但量所需NiO的实际厚度增加了。采用X射线光电子能谱研究了Ta/NiO/Ta界面，并进行计算机谱图拟合分析。结果表明界面反应是影响层间耦合的一个重要因素。在Ta/NiO界面处发生了反应

Highly conductive nb-doped BaTiO3 epitaxial thin films grown by laser molecular beam epitaxy

于2010-11-23批量导入

Optical properties of AIInGaN quaternary alloys

Carrier recombination dynamics in AlInGaN alloy has been studied by photoluminescence (PL) and time-resolved photoluminescence (TRPL). The fast redshift of PL peak energy is observed and well fitted by a physical model considering the thermal activation and transfer processes. This result provides evidence for the exciton localization in the quantum dot (QD)-like potentials in our AlInGaN alloy. The TRPL signals are found to be described by a stretched exponential function of exp[(-t/tau)(beta)], indicating the presence of a significant disorder in the material. The disorder is attributed to a randomly distributed quantum dots or clusters caused by indium fluctuations. By studying the dependence of the dispersive exponent 8 on the temperature and emission energy, we suggest that the exciton hopping dominate the diffusion of carriers localized in the disordered quantum dots. Furthermore, the localized states are found to have OD density of states up to 250 K, since the radiative lifetime remains almost unchanged with increasing temperature.

The SPER and characteristics of Si1-yCy alloys

\Si1-yCy alloys with carbon composition of 0.5 at.% were successfully grown on n-Si(100) substrate by solid phase epitaxy recraystallization. The result was presented in this paper. With the help of the SiO2 capping layer, rather uniform carbon profile in amorphous Si layer was obtained by dual-energy implantation. Since ion-flow was small and implantation time was long enough, the emergency of beta-SiC was avoided and the dynamic annealing effect was depressed. The pre-amorphization of the Si substrate increased the fraction of the substitutions carbon and the two-step annealing reduced point defects. As a result, Si1-yCy alloys with high quality was recrystallized on Si substrate.

Determination of the interdiffusion coefficients of liquid Zn and Sn using Ta/Zn-Sn/Si trilayers

In this paper we present a new method for measuring diffusion coefficients in liquid metals under convection-less conditions with solid/liquid-liquid/solid trilayer. The advantage of this kind of trilayer is that effects from gravity-induced convection and Marangoni-convection can be omitted, so that the diffusion coefficient is determined more accurately. The Ta/Zn-Sn/Si trilayer were prepared with a multi-target ion-beam sputtering deposition technique and annealed in an electric furnace under an argon atmosphere. The interdiffusion of liquid zinc and tin at 500 degrees degree C was investigated. The diffusion concentration profiles were determined by energy dispersive spectroscopy. The interdiffusion coefficients range from 1.0x10(-6)cm(2)/s to 2.8x10(-6)cm(2)/s, which is less than previous values measured by capillary reservoir technique under 1g-environment where various convection exist. The precise interdiffusion coefficients of liquid zinc and tin result from the removing of disturbances of various kinds of convection.

Pressure behavior of deep centers in ZnSxTe1-x alloys

We have measured photoluminescence of ZnSxTe1-x alloys (x > 0.7) at 300 K and under hydrostatic pressure up to 7 GPa. The spectra contain only a broad emission band under excitation of the 406.7 nm line. Its pressure coefficients are 47, 62 and 45 meV/GPa for x = 0.98, 0.92 and 0.79 samples, which are about 26%, 7% and 38% smaller than that of the band gap in the corresponding alloys. The Stokes shifts between emission and absorption of the bands were calculated by fitting the pressure dependence of the emission intensity, being 0.29, 0.48 and 0.13 eV for the three samples, respectively. The small pressure coefficient and large Stokes shift indicate that the emission band observed in our samples may correspond to the Te isoelectronic center in the ZnSxTe1-x alloy.

高电荷态离子Arq+与Nb作用产生的X射线谱

利用光谱技术在超导离子源SECRAL上研究了10~20keV·q的Arq+(q=16,17)离子入射在金属Nb表面产生的X射线谱.实验结果表明,高电荷态Ar16+离子在金属表面中性化过程中存在着多电子激发,Ar16+的K壳层电子被激发产生空穴,级联退激发射Ar的Kα特征X射线.Ar空心原子的K层发射X射线的强度随入射离子的动能减弱,靶原子Nb的L层发射X射线强度随入射离子动能的增加而增强.Ar17+单离子的Kα-X射线产额比Ar16+单离子的Kα-X射线产额大3个数量级.