976 resultados para CMOS transistor


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研究了CMOS/SOI 4Kb静态随机存储器的抗总剂量辐照性能。CMOS/SOI 4Kb静态随机存储器采用1K * 4的并行结构体纱,其地址取数时间为30ns,芯片尺寸为3.6mm * 3.84mm;在工作电压为3V时,CMOS/SOI 4Kb静态随机存储器抗总剂量高达5 * 10~5R(Si),能较好地满足军用和航天领域的要求。

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用器件模拟的方法,设计了一种与常规CMOS工艺兼容的硅高速光电探测器,该探测器可与CMOS接收机电路单片集成,对该探测器进行了器件模拟研究,给出了该探测器的电路模型。通过MOSIS(MOS implementation support project)0.35 μm COMS工艺制做了该探测器,实际测试了该器件的频率响应和波长响应,探测器频率响应在1GH以上,峰值波长响应在0.69 μm。

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报道了Φ150mm CMOS硅外延材料的研究开发及集成电路应用成果,对Φ200mmP/P~-硅外延材料进行了初步探索研究。Φ150mm P/P~+硅外延片实现了批量生产,并成功应用于集成电路生产线,芯片成品率大于80%。硅外延片的参数指标能满足集成电路制造要求。

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对部分耗尽CMOS/SOI工艺进行了研究,成功地开发出成套部分耗尽CMOS/SOI抗辐照工艺。其关键工艺技术包括

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于2010-11-23批量导入

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提出并设计了一种基于CMOS工艺实现的高速高精度的单向隔离模拟开关,该开关用在高速两步法A/D转换器中使电路结构大为简化。通过对开关特性的理论分析与电路模拟,证明了这种模拟开关具有高速可控性,传输信号的精度优于先前研究的双极单向隔离模拟开关。

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随着大规模和超大规模集成电路特征尺寸向亚微米、深亚微米发展,下一代集成电路对硅片的表面晶体完整性和电学性能提出了更高的要求。与含有高密度晶体原生缺陷的硅抛光片相比,硅外延片一般能满足这些要求。该文报道了应用于先进集成电路的150mmP/P~+ CMOS硅外延片研究进展。在PE2061硅外延炉上进行了P/P~+硅外延生长。外延片特征参数,如外延层厚度、电阻率均匀性,过渡区宽度及少子产生寿命进行了详细表征。研究表明:150mm P/P~+CMOS硅外延片能够满足先进集成电路对材料更高要求。

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CMOS/SOS器件同体硅CMOS器件相比,载流子迁移率较低,沟道漏电电流放大,它们主要是由异质外延硅膜缺陷,特别是靠近硅蓝宝石界面的硅膜缺陷造成的。该文描述一种改进的固相外延技术提高外延硅膜质量进而改善CMOS/SOS器件特性的实验结果。

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介绍前置电路对光电探测器的影响和给出一种适用于硅基光电探测器前置放大电路的输入级CMOS实现的方法。

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We report some investigations on vertical cavity surface emitting laser (VCSEL) arrays and VCSEL based optoelectronic smart photonic multiple chip modules (MCM), consisting of 1 x 16 vertical cavity surface emitting laser array and 16-channel lasers driver 0.35 mum CMOS circuit. The hybrid integrated multiple chip modules based on VCSEL operate at more than 2GHz in -3dB frequency bandwidth.

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We report some investigations on vertical cavity surface emitting laser (VCSEL) arrays and VCSEL based optoelectronic smart photonic multiple chip modules (MCM), consisting of 1x16 vertical cavity surface emitting laser array and 16-channel lasers driver 0.35 Pin CMOS circuit. The hybrid integrated multiple chip modules based on VCSEL operate at more than 2GHz in -3dB frequency bandwidth.

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CMOS/SOS devices have lower carriers mobility and higher channel leakage current than bulk silicon CMOS devices. These mainly results from the defects of heteroepitaxial silicon film, especially from the defects near Si-Sapphire interface. This paper describes the experiment results of CMOS/SOS devices characteristics improved by a better epitaxial silicon quality which is obtained by a modified solid phase epitaxy.