Structural and optical properties of self-assembled InAs/GaAs quantum dots covered by InxGa1-xAs (0 <= x <= 0.3)

Optical and structural investigations of InAs quantum dots (QDs) covered by InxGa1-xAs (0 less than or equal to x less than or equal to 0.3) overgrowth layer have been systematically reported. The decrease of strain in the growth direction of InAs quantum dots covered by InGaAs layer instead of GaAs is demonstrated by transmission electron microscopy experiments. In addition, the atomic force microscopy measurement shows that the surface of InAs islands with 3-nm-thick In0.2Ga0.8As becomes flatter. However, the InGaAs islands nucleate on the top of quantum dots during the process of InAs islands covered with In0.3Ga0.7As. The significant redshift of the photoluminescence peak energy and reduction of photoluminescence linewidth of InAs quantum dots covered by InGaAs are observed. The energy gap change of InAs QDs covered by InGaAs could be explained in terms of reducing strain, suppressing compositional mixing, and increasing island height. (C) 2000 American Institute of Physics. [S0021-8979(00)04018-4].

不同组分In_xGa_(1-x)As(0≤x≤0.3)覆盖层对自组织InAs量子点的影响

研究了不同In组分的In_xGa_(1-x)As(0≤x≤0.3)覆盖层对自组织InAs量子点的结构及发光特性的影响。透射电子显微镜和原子力显微表明，InAs量子点在InGaAs做盖层时所受应力较GaAs盖层时有所减小，并且x=0.3时，InGaAs在InAs量子点上继续成岛。随x值的增大，量子点的光荧光峰红移，但随温度的变化发光峰峰位变化不明显。理论分析表明InAs量子点所受应力及其均匀性的变化分别是导致上述现象的主要原因。

垂直入射Si_(0.7)Ge_(0.3)/Si多量子阱光电探测器

报道了正入射Si_(0.7)Ge_(0.3)/Si多量子阱结构光电探测器的制作和实验结果。测试了它的光电流谱和量子效率。探测器的响应波长扩展到了1.3μm以上波段。在1.3μm处量子效率为0.1%。量子效率峰值在0.95μm处达到20%。

GaAs/Al_(0.3)Ga_(0.7)As多量子阱的平方电光效应和光折变效应的研究

于2010-11-23批量导入

50周期的In（0.3）Ga（0.7）As/GaAs应变超晶格的生长

于2010-11-23批量导入

压应变In（0.63）Ga（0.3）7As/InP单量子阱的变温光致发光研究

于2010-11-23批量导入

（113）B-GaAs/As（0.3）Ga（0.7）As单量子阱结构的光致发光谱研究

于2010-11-23批量导入

InAs/InP（0.7）Sb（0.3）热电子晶体管的fT及f（max）

于2010-11-23批量导入

GaAs/Al（0.3）Ga（0.7）As短周期超晶格中负微分电导效应的观察

于2010-11-23批量导入

High-field nonlinear perpendicular transport in a GaAs/Al_(0.3)Ga_(0.7) As short-period superlattice

于2010-11-23批量导入

1MeVSi＋衬底加温注入Al（0.3）Ca（0.7）As/GaAs超晶格和GaAs的晶格损伤研究

用卢瑟福背散射沟道技术研究了1MeVSi~+在衬底加温和室温下以不同剂量注入Al＿(0．3)Ga＿(0．7)As／GaAs超晶格和GaAs后的晶格损伤。在衬底加温下, 观察到Al＿(0．3)Ga＿(0．7)As／GaAs超晶格和GaAs都存在一个动态退火速率与缺陷产生速率相平衡的剂量范围, 以及两种速率失去平衡的临界剂量。用热尖峰与碰撞模型解释了晶格损伤积累与注入剂量和衬底温度的关系。

高迁移率Si/Si（0.7）Ge（0.3）/Si调帛掺杂异质结构的生长和输运性质

863计划,国家攀登计划

GaAs/Ga（0.7）Al（0.3）超晶格中场致激子峰展宽机制的研究

于2010-11-23批量导入

GaAs/Ga（0.7）Al（0.3）As短周期超晶格中的自电光双稳和多稳态效应

国家自然科学基金