990 resultados para GAAS(100)


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采用传输矩阵理论和结合悬臂梁的电学一机械模型对GaAs基1.55 μm微光电机械系统(MOEMS)波长可调谐滤波器的光学和电学特性进行了深入的对比分析和研究.结果表明,采用800 nm厚的空气腔可以实现滤波器波长的调谐范围为100 nm,所需最大反向偏压为4 V,波长的调谐速率可以达到1.83 MHZ.

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ZnO thin films were grown on GaAs (001) substrates by metal-organic chemical vapor deposition (MOCVD) at low temperatures ranging from 100 to 400℃. DEZn and 1-12 O were used as the zinc precursor and oxygen precursor, respectively. The effects of the growth temperatures on the growth characteristics and optical properties of ZnO films were investigated. The X-ray diffraction measurement (XRD) results indicated that all the thin films were grown with highly c- axis orientation. The surface morphologies and crystal properties of the films were critically dependent on the growth temperatures. Although there was no evidence of epitaxial growth, the scanning electron microscopy (SEM) image of ZnO film grown at 400℃ revealed the presence of ZnO microcrystallines with closed packed hexagon structure. The photoluminescence spectrum at room temperature showed only bright band-edge (3. 33eV) emissions with little or no deep-level e- mission related to defects.

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利用多信息量测试系统分别测试了反射式GaAs光电阴极激活后在0(无光照),33和100 lx白光照射情况下阴极的光电流衰减变化曲线,计算得到其寿命分别为320,160和75 min,阴极稳定性随光照强度的增加而降低,测试了只有光照(100 lx)而无光电流流过阴极时阴极的寿命为100 min.通过比较发现光照比光电流对阴极稳定性的影响更大.还测试了阴极在33 lx光照下量子效率曲线随时间的衰减,发现阴极低能光子的量子效率下降速度更快,导致量子效率曲线形状不断发生变化.基于修正后的反射式阴极量子效率公式对这种变化进行了理论分析,发现与光电子的谷间散射和阴极衰减过程中表面势垒形状的变化有关.

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根据八带k·p理论,在三维InGaAs/GaAs量子点阵列中求解kx=ky=kz=0 处的有效质量哈密顿H0的本征值,得到InGaAs量子点中导带中电子基态EC1,第一激发态EC2和重空穴态EHH1的能级.随着In组分从30%增加100%,InGaAs量子点中EC2到EC1的带内跃迁波长从18.50 μm 蓝移到11.87 μm,而EC1到EHH1的跃迁波长则从1.04 μm红移到1.73 μm;随着量子点高度从1.0 nm增加到 5.0 nm,In0.5Ga0.5As和InAs量子点中EC1到EC2的带内跃迁都从束缚态-连续态型转换到束缚态-束缚态型,对应于两种量子点的带内跃迁波长分别从8.12 μm (5.90 μm)红移到 53.47 μm(31.87 μm),两种量子点中EC1到EHH1的跃迁波长分别从1.13 μm(1.60 μm)红移到1.27 μm(2.01 μm).

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用熔体外延(ME)法在半绝缘(100)GaAs衬底上成功生长出了截止波长为12 μm的InAs0.04Sb0.96外延层.傅立叶变换红外(FTIR)透射光谱揭示,InAsSb合金的禁带宽度被强烈变窄.通过分析InAs0.04Sb0.96外延层载流子浓度的温度依存性表明,其室温禁带宽度为0.105 5 eV,与透射光谱测得的数值很好地一致.通过测量12~300 K的吸收光谱,研究了InAs0.04Sb0.96/GaAs的禁带宽度的温度依存性.霍尔测量得出300 K下样品的电子迁移率为4.47×104 cm2/Vs,载流子浓度为8.77×1015 cm-3;77 K下电子迁移率为2.15×104 cm2/Vs,载流子浓度为1.57×1015 cm-3;245 K下的峰值迁移率为4.80×104 cm2/Vs.

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高功率激光二极管列阵广泛应用于抽运固体激光器.报道了17 kW GaAs/AlGaAs叠层激光二极管列阵的设计、制作过程和测试结果.为了提高器件的输出功率,一方面采用宽波导量子阱外延结构,降低腔面光功率密度,提高单个激光条的输出功率,通过金属有机物化学气相沉积(MOCVD)方法进行材料生长,经过光刻、金属化、镀膜等工艺制备1 cm激光条,填充密度为80%,单个激光条输出功率达100 W以上;另一方面器件采用高密度叠层封装结构,提高器件的总输出功率,实现了160个激光条叠层封装,条间距0.5 mm.经测试,器件输出功率达17kW,峰值波长为807.6 nm,谱线宽度为4.9 nm.

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The 808nm laser diodes with a broad waveguide are designed and fabricated. The thickness of the Al_(0.35)-Ga_(0.65)As waveguide is increased to 0.9μm. In order to suppress the super modes, the thickness of the Al_(0.55)Ga_(0.45)As cladding layers is reduced to only 0.7μm while keeping the transverse radiation losses of the fundamental mode below 0.2cm~(-1). The structures are grown by metal organic chemical vapour deposition. The devices show excellent performances. The maximum output power of 10.2W in the 100μm broad-area laser diodes is obtained.

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利用分子束外延技术和Stranski-Krastanow生长模式,系统研究In(Ga)As/GaAs,InAlAs/AlGaAs/GaAs,In(Ga)As/InAlAs/InP材料体系应变自组装量子点的形成和演化。通过调节实验条件,可以对量子点的空间排列及有序性进行控制,并实现了InP衬底上量子点向量子线的渡越。研制出激射波长λ=960nm,条宽100μm,腔长800μm的InAs/GaAs量子点激光器,室温连续输出功率大于1W,室温阈值电流密度218A/cm~2,0.53W室温连续工作寿命超过3000h。

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利用分子束外延技术和S-K生长模式,系统研究了InAs/GaAs材料体系应变自组装量子点的形成和演化。研制出激射波长λ≈960nm,条宽100μnm,腔长800μm的In(Ga)As/GaAs量子点激光器

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该文研究了MBE通常生长条件和氢原子辅助生长条件下(100)、(331)、(210)、(311)等表面外延形貌的变化。

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首次报道(311)面上生长的GaAs/AlAs波纹超晶格中的激子局域化效应。在这种结构中,波纹异质结界面的缺陷,包括周期微扰和表面不平整将引入较深的激子束缚能级,因此低温下其发光能量相对于(100)样品发生明显的红移。在Ⅱ类超晶格中,局域化能级成为X能谷电子向Γ能谷输运的通道,从而加强了X-Γ电子态混合,使实验观察到的X跃迁表现出Γ跃迁的某些性质。

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Photoluminescence (PL) spectra of GaInNAs/GaAs multiple quantum wells and GaInNAs epilayers grown on GaAs substrate show an apparent "S-shape" temperature-dependence of the of dominant luminescence peak. At low temperature and weak excitation conditions, a PL peak related to nitrogen cluster-induced bound states can be well resolved in the PL spectra. It displays a remarkable red shift of up to 60 meV and is thermally quenched below 100 K with increasing temperature, being attributed to N-cluster induced bound states. The indium incorporation exhibits significant effect on the cluster formation. The rapid thermal annealing treatment at 750 C can essentially remove the bound states-induced peak.

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A GaInNAs/GaAs multiple quantum well (MQW) resonant-cavity enhanced (RCE) photodetector operating at 1.3 mum with the full-width at half-maximum of 5.5 nm was demonstrated. The GaInNAs RCE photodetector was grown by molecular-beam epitaxy using an ion-removed dc-plasma cell as nitrogen source. GaInNAs/GaAs MQW shows a strong exciton peak at room temperature that is very beneficial for applications in long-wavelength absorption devices. For a 100-mum diameter RCE photodetector, the dark current is 20 and 32 pA at biases of 0 and 6 V, respectively, and the breakdown voltage is -18 V. The measured 3-dB bandwidth is 308 MHz. The reasons resulting in the poor high speed property were analyzed. The tunable wavelength of 18 nm with the angle of incident light was observed.

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We show that part of the reflectance difference resonance near the E-0 energy of ZnSe is due to the anisotropic in-plane strain in the ZnSe thin films, as films grown on three distinctly different substrates, GaAs, GaP, and ZnS, all show the resonance at the same energy. Such anisotropic strain induced resonance is predicted and also observed near the E-1/E-1+Delta(1) energies in ZnSe grown on GaAs. The theory also predicts that there should be no resonance due to strain at, the E-0+Delta(0) energy, which is consistent with experiments. The strain anisotropy is rather independent of the ZnSe layer thickness, or whether the film is strain relaxed. For ZnSe films with large lattice mismatch with substrates, the resonance at the E-1/E-1+Delta(1) energies is absent, very likely due to the poor crystalline quality of the 20 nm or so surface layer. (C) 2000 American Vacuum Society. [S0734-211X(00)05604-3].