338 resultados para Pt-Sn
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Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z
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Submitted by 阎军 (yanj@red.semi.ac.cn) on 2010-07-21T01:27:16Z No. of bitstreams: 1 出站报告唐黎明.pdf: 6269250 bytes, checksum: 868d0cf22419850e8dcb1acba888aeb9 (MD5)
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The Pt nanoparticles (NPs), which posses the wider tunable localized-surface-plasmon (LSP) energy varying from deep ultraviolet to visible region depending on their morphology, were prepared by annealing Pt thin films with different initial mass-thicknesses. A sixfold enhancement of the 357 nm forward emission of ZnMgO was observed after capping with Pt NPs, which is due to the resonance coupling between the LSP of Pt NPs and the band-gap emission of ZnMgO. The other factors affecting the ultraviolet emission of ZnMgO, such as emission from Pt itself and light multi-scattering at the interface, were also discussed. These results indicate that Pt NPs can be used to enhance the ultraviolet emission through the LSP coupling for various wide band-gap semiconductors.
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The structural evolution and temperature dependence of the Schottky barrier heights of Pt contacts on n-GaN epilayer at various annealing temperatures were investigated extensively by Rutherford backscattering spectrometry, x-ray diffraction measurements, Auger electron spectroscopy, scanning electron microscopy and current-voltage measurements. The temperature dependence of the Schottky barrier heights may be attributed to changes of surface morphology of Pt films on the surface and variation of nonstoichiometric defects at the interface vicinity. Experimental results indicated the degradation of Pt contacts on n-GaN above 600 degreesC.
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Gallium nitride (GaN)-based Schottky junctions were fabricated by RF-plasma-assisted molecular beam epitaxy (MBE). The GaN epitaxial layers were deposited on novel double buffer layers that consist of a conventional low-temperature buffer layer (LTBL) grown at 500 degreesC and an intermediate-temperature buffer layer (ITBL) deposited at 690 degreesC. Low-frequency excess noise and deep level transient Fourier spectroscopy (DLTFS) were measured from the devices. The results demonstrate a significant reduction in the density of deep levels in the devices fabricated with the GaN films grown with an ITBL. Compared to the control sample, which was grown with just a conventional LTBL, a three-order-of-magnitude reduction in the deep levels 0.4 eV below the conduction band minimum (Ec) is observed in the bulk of the thin films using DLTFS measurements.
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In this paper we present a new method for measuring diffusion coefficients in liquid metals under convection-less conditions with solid/liquid-liquid/solid trilayer. The advantage of this kind of trilayer is that effects from gravity-induced convection and Marangoni-convection can be omitted, so that the diffusion coefficient is determined more accurately. The Ta/Zn-Sn/Si trilayer were prepared with a multi-target ion-beam sputtering deposition technique and annealed in an electric furnace under an argon atmosphere. The interdiffusion of liquid zinc and tin at 500 degrees degree C was investigated. The diffusion concentration profiles were determined by energy dispersive spectroscopy. The interdiffusion coefficients range from 1.0x10(-6)cm(2)/s to 2.8x10(-6)cm(2)/s, which is less than previous values measured by capillary reservoir technique under 1g-environment where various convection exist. The precise interdiffusion coefficients of liquid zinc and tin result from the removing of disturbances of various kinds of convection.
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In this paper, platinum (Pt) with a thickness of 45 nm was sputtered on the surface of AlGaN/GaN heterostructure to form the Schottky contact and the back-to-back Schottky diodes were characterized for H-2 sensing at room temperature. Both the forward and reverse current of the devices increased with exposure to H-2 gas, which was attributed to Schottky barrier height reduction caused by hydrogen absorption in the catalytic metals. A shift of 0.7 V at 297 K was obtained at a fixed forward current of 0.1 mA after switching from N-2 to 40% H-2 in N-2. The sensor's responses under different concentrations from 2500 ppm H-2 to 40% H-2 in N-2 at 297 K were investigated. Time response of the sensor at a fixed bias of 1 V was given. Finally, the decrease of the Schottky barrier height and the sensitivity of the sensor were calculated. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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Pt/AlGaN/AlN/GaN Schottky diodes have been fabricated and characterized for H-2 sensing. Platinum (Pt) with a thickness of 20nm was evaporated on the sample to form the Schottky contact. The ohmic contact, formed by evaporated Ti/Al/Ni/Au metals, was subsequently annealed by a rapid thermal treatment at 860 degrees C for 30 s in N-2 ambience. Both the forward and reverse current of the device increased greatly when exposed to H-2 gas. The sensor's responses under different hydrogen concentrations from 500ppm to 10% H-2 in N-2 at 300K were investigated. A shift of 0.45V at 297K is obtained at a fixed forward current for switching from N-2 to 10% H-2 in N-2. Time response of the sensor at a fixed bias of 0.5 V was also measured. The turn-on response of the device was rapid, while the recovery of the sensor at N-2 atmosphere was rather slow. But it recovered quickly when the device was exposed to the air. The decrease in the barrier height of the diode was calculated to be about 160meV upon introduction of 10% H-2 into the ambient. The sensitivity of the sensor is also calculated. Some thermodynamics analyses have been done according to the Langmuir isotherm equation.
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CFCs问题引来了广泛的研究.本文概述了CFCs问题.对于状态方程,讨论了1982年发表的PT方程。由此进一步比较讨论了RKS 和PR方程,另外总结了立方型方程的通式.这些对CFCs新工质的模拟计算都具有现实价值.
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控制电位电解型即电流型气体传感器由于具有检测气体种类多、浓度范围宽、体积小、价格低、测量精度高、可用于现场直接检测等优点,在环境监测与安全生产等领域中得到了广泛应用。本文论述了纳米级铂、碳纳米管负载铂及铂铁催化剂的合成方法,并对其进行了物理化学表征和电化学研究,主要结果如下: 采用柠檬酸钠还原的方法,合成了纳米级铂催化剂。TEM和XRD测试表明,该球形多晶铂的粒径为2-5nm。用此种铂催化剂制备了离子交换膜电极复合体,并组装了全固态电流型氧传感器;在对低浓度氧气进行测试时,具有高的灵敏度、较短的响应时间、较低的底电流和噪声,且响应信号与氧气的浓度呈良好的线性关系。 1.利用空气氧化和硝酸相结合对多壁碳纳米管进行了纯化,并利用1:1的H2SO4-HNO3混酸使其表面羧基化,TEM和CV测试表明多壁碳纳米管达到了纯化和表面官能团化的目的。 2.利用喷雾冷却法制备了多壁碳纳米管负载的铂及铂铁合金纳米级催化剂复合体,并利用TEM、EDS、XRD、ICP等进行了表征;在循环伏安扫描中,铂铁合金催化剂呈现较高的比表面积。将多壁碳纳米管负载的铂及铂铁合金纳米级催化剂应用于C1有机小分子的电化学氧化研究中发现,铂铁合金催化剂具有较高的催化活性.
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功能化的贵金属纳米材料的设计和可控制备在材料科学研究领域引起了人们广泛的关注。贵金属纳米材料的光学、电学、磁学和催化等物理和化学性质不但与其大小有关,而且还与其形貌息息相关。因此寻求简单而有效的低温溶液合成途径以实现对贵金属纳米材料的尺寸和形貌控制尤为重要。本论文的主要研究内容可以归纳如下: (1)在水溶液中利用种子生长方法分别制备了核壳Au-Pd/Pt三金属复合纳米粒子和三层的核壳AuAg复合纳米粒子。这些纳米粒子的尺寸和组成可以通过改变金种子的加入量来加以调控。 (2)通过种子生长和取代沉积相结合的方法制备了具有金核铂/银双金属壳的铃铛状纳米粒子。通过扫描电子显微镜、透射电子显微镜和X-射线光电子能谱对所得纳米粒子的尺寸、结构和组成进行了表征。 (3)以二肽甘氨酰甘氨酸作为模板合成了具有[111]取向的单晶银纳米片。通过改变实验条件探讨了片状银纳米结构的形成机理。片状银纳米结构的产率可达到80%,反应物之间的摩尔比对产物的尺寸和形貌有至关重要的作用。 (4)将K3[Fe(CN)6]和Na2S2O3的混合溶液进行水热处理,得到了具有立方体形貌的FeIIIFeIII(CN)6(柏林绿)微晶。实验结果显示K3[Fe(CN)6]和Na2S2O3的摩尔比及其浓度对所得产物的尺寸、形貌和组成有决定性的作用。 (5)在室温下通过混合3, 3', 5, 5'-四甲基联苯胺和氯铂酸,成功合成了有机-无机杂化的纳米纤维。纳米纤维的尺寸和形状可以通过改变反应物的比和浓度加以控制。基于不同的实验结果,提出了纳米纤维的可能形成机理。
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关于Cr(III)阳极氧化为Cr(VI)的过程,在工业应用方面已有许多工作,但对机理尚不清楚。本文对Pt电极和PbO_2电极上的这一过程进行了动力学的研究,首次得到了Cr(VI)在这两种电极上阳极形成的真实动力学数据,并提出了与实验基本相符的反应机理。用“分解极化曲线法”和稳态极化曲线的测量,得到了[H_2SO_4]和[SO_4~=]恒定的不同浓度Cr_2(SO_4)_3溶液中Cr(VI)在光滑Pt电极上阳极形成的真实动力学数据,可用如下方程式来表达:在较低电位下φ = a + 0.25 log i_2 - 0.23 log [Cr(III)]在较高电位下φ = a' + 0.48 log i_2 - 0.44 log [Cr(III)]同时得到了氧的阳极发生的动力学数据,Tafel线性区的斜率接近于2.303 RT/ΔF (Δ ≈ 0.5)。动力学方程式的推导与实验的比较表明,在光滑Pt电极上Cr(VI)是由Cr(II)通过“活性氧”的氧化形成的,提出了如下反应机理:H_2O → (OH)_(ad) + H~+ + e~- 2(OH)_(ad) → (O)_(ad) + H_2O 2(O)_(ad) →O_2 (OH)_(ad) + [Cr(H_2O)_6]~(3+) → (CrO_2)_(ad) + 3H~+ + 5H_2O (CrO_2)_(ad) + H_2O → (CrO_3~-)_(ad) + 2H~+ + e~- (CrO_3~-)_(ad) + H_2O → HCrO_4~- + H~+ + e~- 2HCrO_4~- <-> Cr_2O_7~(2-) + H_2O 在[H_2SO_4]和[SO_4~(2-)]恒定的不同浓度Cr_2(SO_4)_3溶液中,测得了Cr(VI)在Δ-PbO_2电极上阳极形成的动力学数据:在较低电位下φ = a + 0.28 log i_2 - 0.30 log [Cr(III)]在较高电位下φ = a' + 0.55 log i_2 - 0.51 log [Cr(III)]氧的极化曲线的Tafel线性区斜率也为2.303RT/ΔF (Δ approx= 0.5)。PbO_2电极和Pt电极上分解极化曲线的比较表明,Cr(VI)在前一电极上阳极形成的过电位远低于在后一电极上,这可能是两电极上电流效率显著差别的原因。测得了PbO_2电极上不同过电位下电极反应的有效活化能,其数值均在10 Kcal mol~(-1)以上,且随着极化的增大而减小,据此在动力学处理中可以忽略扩散的作用,交流阻抗的研究进一步证实了这一点。溶液pH的增大或[H_2SO_4]的减小会降低Cr(VI)阳极形成的过电位,使反应加速。在[H_2SO_4]和[SO_4~(2-)]恒定的不同浓度Cr_2(SO_4)_3溶液中,测得了在不同电位极化下PbO_2电极的阻抗频谱。在较高电位下阻抗谱呈现明显的两个半圆,表明电极过程包括了中间吸附物的形成。求得的吸附电容Cad比双层电容Cd大1-2个数量级;Cd比通常光滑电极表面的Cd大得多,这可能与SO_4~(2-),HCrO_4~-, Cr_2O_7~-以及[_((SO_4))~((H_2O)_2) Cr_((SO_4))~((OH)_2) Cr_((SO_4))~((OH_2)_2)]~(2-)等阳离子的特性吸附有关。从动力学的推导与实验的比较得出,在PbO_2电极上Cr(VI)也按“活性氧”机构形成,可能的机理如下:H_2O → (OH)_(ad) + H~+ + e~- (OH)_(ad) + H_2O → (O)_(ad) + H_3O~+ + e~- 2(O)_(ad) → O_2 [Cr(H_2O)_6]~(3+) + (O)_(ad) → (CrO_3~-)_(ad) + 4H~+ + 4H_2O (CrO_3~-)_(ad) + H_2O → HCrO_4~- + H~+ +e~- 2HCrO_4~- <-> Cr_2O_7~(2-) + H_2O.
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本文合成了LaBa_2Cu_(3-x)Sn_xO_(6.5) + x (x = 0.2; 0.5; 0.7; 1.0; 1.2; 1.5; 1.7; 2.0; 2.2; 2.5; 2.7; 3.0)系列,2aBaCu_(2-x)Sn_xO_(4.5) + x (x = 0; 0.2; 0.5; 0.7; 1.0; 1.2; 1.5; 1.7; 2.0)系列和La_3Cu_(3-x)Sn_xO_(7.5) + x (x = 0.5; 1.0; 1.5; 2.0; 2.2; 2.5; 2.7)系列等二十八个新复合氧化物。这三个系列二十八个新复合氧化物直至目前为止,文献上未见过报道。我们通过x-ray粉末衍射图分析了它们的结构,肯定了它们是新的单一化合物,计算了它们的晶胞参数并确定它们的所属晶系。元素化学分析表明,所有这些化合物均可用原始计算配比化学式表示。干湿两种合成方法所合成的结构相同。对于这三个系列二十八个瓣复合氧化物,我们选用LaBa_2-Cu_(3-x)Sn_xO_(6.5) = x (x = 0.5;1.0;1.5;2.0;2.5),LaBaCu_(2-x)Sn_xO_(4.5) = x(x = 0.5; 1.0; 1.5;2.0), La_3Cu_(3-x)Sn_xO_(7.5) + x (x = 0.5; 1.0; 1.5; 2.0; 2.5)等十四个化合物,对它们的低温,高温和高湿下的电阻率和导电类型进行了测试,绘得了它们的电阻率和温度的关系曲线。在一定温度下,一个系列内的化合物电阻率随锡的分子含量增加而增大。La_3Cu_(3-x)Sn_xO_(7.5) = x系统人物的电阻率明显大于其它二个系列相应化合物的电阻率。所有化合物在液氮至室温温区内,基本上呈半导体导电类型。在高温以上温区,当温度升至一定温度时之前,化合物呈本导体导电类型达到一定温度之后,当金属导电类型所有新复合氧化物在高温均属P型半导体。本文还研究了这三个系列化合物和将它们掺入二氧化锡中的气敏性能。结果表明:所有这类化合物和将它们掺入二氧化锡中作为添加剂做成的气敏材料,除LaBa_2Cu_(1.5)Sn_(1.5)O_8掺入SnO_2做成的气敏材料外,在本文实验条件下做成的气敏元件对氧化性和还原性气体均无或只有很差的气敏性。LaBa_2Cu_(1.5)Sn_(1.5)O_8作为添加剂掺入SnO_2中(摩尔比0.2:0.8; 0.1:0.9)所制得的气敏文件对高浓度(1%-10%)的一氧化碳,液化气和煤气具有很好的气敏线性响应,当加热电流为300mA时,酒精,汽油和石油醚等还原性气体基本上无干扰。实验表明当摩尔比为0.1:0.9时,材料的气敏性能最佳,但重现性较差,当摩尔比为0.2:0.8时,气敏性稍低,但重现性较好。本文还合成了La_xBa_(1-x)SnO_3(x = 0; 0.05; 0.10; 0.15, 0.20)系列化合物,并确定了它们的结构和所属晶系。从结构上分析我们认该系列化合物相互之间为置换固溶体。其晶胞参数随镧的加入量增加而减小。该系列均属几型半导体材料。我们利用该系列材料进行了过敏性研究。结果表明。由La_(0.1)Ba_(0.9)SnO_3制得的高热式气敏器件对低浓度酒精(<1000 ppm)有很好的气敏线性响应。在加热电流为250 mA时,基本上排除了煤气,一氧化碳,液化气和汽油等可燃性气体的干扰。但香烟烟雾对器件检测酒精有一定的影响。La_(0.1)Ba_(0.9)SnO_3气敏材料多添加1%而制得的器件,机械强度达到很好的效果,器件对酒精的灵敏度有降低,而响应浓度区间宽度增加近一倍,选择性几乎不变。该材料具有较好的实验重现性。该系列的其它化合物在本实验条件下所制得的器件对可燃性气体的敏感性较差。
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Electrical measurements were combined with surface techniques to study the Pt/Si interfaces at various silicide formation temperatures. Effects of deep centers on the Schottky barrier heights were studied. Hydrogen plasma treatment was used to passivate the impurity/defect centers at the interfaces, and the effects of hydrogenation on the Schottky barrier heights were also examined. Combining our previous study on the Pt/Si interfacial reaction, factors influencing the PtSi/Si Schottky barrier diode are discussed.