Dislocation movement in nitrogen-doped Czochralski silicon

Dislocation movement in N-doped Czochralski silicon (Cz-Si) was surveyed by four point bend method. Dislocation movement velocities in Cz-Si doped with nitrogen, with both nitrogen and antimony, and with only antimony were investigated. The order of measured dislocation movement velocities, at 700 degrees C less than or equal to T less than or equal to 800 degrees C and under resolved stress sigma=4.1 kg/mm(2), was V-Sb.O > V-n.Sb.O>V-N.O. The experiments showed that nigtrogen doping could retard the movement of dislocations.

A new structure of In-based ohmic contacts to n-type GaAs

Electrical, structural and reaction characteristics of In-based ohmic contacts to n-GaAs were studied. Attempts were made to form a low-band-gap interfacial phase of InGaAs to reduce the barrier height at the metal/semiconductor junction, thus yielding low-resistance, highly reliable contacts. The contacts were fabricated by e-beam sputtering Ni, NiIn and Ge targets on VPE-grown n(+)-GaAs film (approximate to 1 mu m, 2 x 10(18) cm(-3)) in ultrahigh vacuum as the structure of Ni(200 Angstrom)/NiIn(100 Angstrom)/Ge(40 Angstrom)/n(+)-GaAs/SI-GaAs, followed by rapid thermal annealing at various temperatures (500-900 degrees C). In this structure, a very thin layer of Ge was employed to play the role of heavily doping donors and diffusion limiters between In and the GaAs substrate. Indium was deposited by sputtering NiIn alloy instead of pure In in order to ensure In atoms to be distributed uniformly in the substrate; nickel was chosen to consume the excess indium and form a high-temperature alloy of Ni3In. The lowest specific contact resistivity (rho(c)) of (1.5 +/- 0.5)x 10(-6) cm(2) measured by the Transmission Line Method (TLM) was obtained after annealing at 700 degrees C for 10 s. Auger sputtering depth profile and Transmission Electron Microscopy (TEM) were used to analyze the interfacial microstructure. By correlating the interfacial microstructure to the electronical properties, InxGa1-xAs phases with a large fractional area grown epitaxially on GaAs were found to be essential for reduction of the contact resistance.

Photoluminescence studies of single submonolayer InAs structures grown on GaAs (001) matrix

We report a detailed analysis of optical properties of single submonolayer InAs structures grown on GaAs (001) matrix. It is shown that the formation of InAs dots with 1 monolayer (ML) height leads to localization of exciton under certain submonolayer InAs coverage, which play a key role in the highly improved luminescence efficiency of the submonolayer InAs/GaAs structures.

PHOTOEMISSION-STUDIES OF K-PROMOTED NITRIDATION OF INP(100) SURFACE USING SYNCHROTRON-RADIATION

The effect of molecular nitrogen exposure on the surfaces of InP(100) modified by potassium overlayers is investigated by core-level and valence-band photoemission spectroscopy using Synchrotron radiation. In comparison with InP(110) surface, we found the promotion is much stronger for InP(100) surface due to the central role of surface defects in the promotion; furthermore, in contrast with K-promoted oxidation of InP(100) where the bonding is observed between indium and oxygen, indium atoms did not react directly with nitrogen atoms during the K-promoted nitridation of InP(100).

亚波长金属光栅的光耦合增强效应及透射局域化的模拟研究

介质层上的亚波长金属光栅产生的表面等离子体(surface plasmons,SPs)可以极大地增强光栅下介质层内的透射光强.增强作用从500 nm延续到近红外区域.在波长610 nm附近有接近110%的增强,在波长700 nm及740nm处也有180%左右的增强.而这个波长范围与薄膜太阳能电池的吸收谱很相近,因此这种结构有望大幅度提高薄膜太阳能电池及不同波长光探测嚣等光电转换器件的光耦合效率.

用于纳秒级窄脉冲工作的大功率半导体激光器模块

介绍了一种将脉冲半导体激光器发射系统中的脉冲整形电路、驱动电路、激光器保护电路、激光器集成封装成一个激光器模块的方式.当激光器工作于纳秒级窄脉冲状态下时,激光器封装引腿产生的电抗会使得耦合进激光器的脉冲波形劣化,导致能量损失.为得到上升时间短,波形半宽窄,峰值功率大的光输出,改进了激光器管芯的结构并采用混合光电子集成的方式将驱动电路和激光器管芯封装在一个模块内,使得窄脉冲电信号高效地耦合进半导体管芯.分析验证表明.改进后的激光器模块的各项输出参数均得到改善.同等条件下,改进后的模块在光脉冲宽度为4.5 ns时,峰值功率比单独封装激光器提高6倍多.测试了激光器模块U-P曲线,得到了脉冲宽度7 ns左右,峰值光功率176 W的光脉冲输出.

A Hybrid Random Number Generator Using Single Electron Tunneling Junctions and MOS Transistors

This paper proposes a novel single electron random number generator (RNG). The generator consists of multiple tunneling junctions (MTJ) and a hybrid single electron transistor (SET)/MOS output circuit. It is an oscillator-based RNG. MTJ is used to implement a high-frequency oscillator,which uses the inherent physical randomness in tunneling events of the MTJ to achieve large frequency drift. The hybrid SET and MOS output circuit is used to amplify and buffer the output signal of the MTJ oscillator. The RNG circuit generates high-quality random digital sequences with a simple structure. The operation speed of this circuit is as high as 1GHz. The circuit also has good driven capability and low power dissipation. This novel random number generator is a promising device for future cryptographic systems and communication applications.

高功率14xx nm锥形增益区脊形波导结构量子阱激光器的研制

初步设计14xx nm锥形增益区脊形波导量子阱激光器材料和器件结构，利用MOCVD生长14xx nm In—GaAsP／InP量子阱激光器外延片，引入腔破坏凹槽（cavity—spoiling grooves）将有源层刻蚀断以隔离从锥形区反向传输回的高阶模，进一步改善远场光束质量．保持总腔长1900μm不变，改变脊形区的长度，其长度分别为450，700和950μm．对比三种情况的最高输出功率和远场特性，发现L_(RW)=700μm时，器件特性参数和远场光柬质量最优，斜率效率为0．32W／A，饱和输出功率为1．21W，其远场为近衍射极限的高斯分布，发散角为29°×9．6°．当固定脊形区长度为700μm，改变锥形区长度，发现当锥形区长度为1000μm时，器件特性参数进一步提高，斜率效率达0．328W／A，饱和输出功率为1．27W，远场仍为近似高斯分布．

用于视网膜修复的光电脉冲频率调制电路

提出了一种用于视网膜修复的脉冲频率调制电路结构．该电路产生频率正比于入射光强度的电脉冲序列．论证分析了该电路的基本特性，并基于0．6μm CMOS工艺进行了流片．仿真结果表明，该电路可以应用于视网膜下植入．

p型GaN的掺杂研究

采用正交实验设计方法设计p型GaN的生长,通过较少的实验,优化了影响p型GaN性质的三个生长参数:Mg流量、生长温度和Ⅴ/Ⅲ比.过量的Mg源流量、过高的生长温度、过大的Ⅴ/Ⅲ比都会降低自由空穴浓度.还研究了退火温度对p型GaN的载流子浓度和光学性质的影响.实验结果表明,700～750℃范围为最佳退火温度.

用于光纤通信的1.55μmDFB激光器的可靠性分析

对用于光纤通信的InP基1.55 μm DFB激光器的可靠性进行了研究.测试并分析了100 ℃时100 mA和150 mA 2种电流应力条件,经过1 700 h老化,测试分析了激光器特性随时间的变化情况,拟合出在100 ℃,150 mA条件下的激光器寿命在1 000 h小时左右.根据实验结果对比,提出了一种新的利用温度、电流两个加速度变量同时进行加速老化,快速估计激光器寿命并分析其可靠性的方法.对新的寿命估算方法进行了详细的讨论.

用氧化多孔硅作牺牲层制备悬空微结构

提出一种新的牺牲层工艺。先将阳极氧化生成的多孔硅在300℃的氮气氛下进行退火以稳定其多孔结构，然后将其在700℃下氧化成为具有多孔结构的二氧化硅。用氧化的多孔硅材料作为牺牲层材料，既可以保留多孔硅牺牲层材料释放迅速的优点，又克服了多孔硅在释放时的局限性。实验运用氧化的多孔硅材料作牺牲层成功制备了悬空振膜和悬臂梁结构。

(111)Si上外延生长六方GaN的TEM观察

利用衍衬、SAED、HRTEM对在（111）Si上外延生长的六方GaN进行了观察分析。GaN外延层与缓冲层和基底的取向关系为(0001)_(GaN)∥(0001)_(AlN)∥(111)_(Si)，[11(2-bar)0]_(GaN)∥[11(2-bar)0]_(AlN)∥[110]_(Si)。GaN外延层中存在倒反畴。GaN中位错以刃型位错为主。In_(0.1) Ga_(0.9) N/GaN的多重量子阱结构（MQW）具有阻挡穿透位错，降低位错密度的作用。

InGaAs/InGaAsP量子阱激光器材料带隙蓝移研究

为了在光开关器件的制作中实现低传输损耗的光波导，对InGaAs/InGaAsP分别限制异质结多量子阱(SCH-MQW)激光器结构进行了一系列带隙蓝移实验。将能量1～2MeV、注量1～5×10~(13)cm~(-2)的P~+注入到实验样品后，在700℃下快速热退火90s。发现光致发光谱的峰值位置发生蓝移9～89nm。蓝移量随着注入能量和注量的增大而增大，并且能量比注量对蓝移的影响更大。

纳米硅薄膜中的量子点特征

从电性和结构上论证了纳米硅薄膜中的细微晶粒(3～6nm)具有量子点(Q.D)特征.在其 电导曲线中呈现出随晶粒尺寸减小而增大的小尺寸效应.使用薄层(～20nm厚)纳米硅膜制成了隧道二极管,已在液氮温区(≈77K)在其I-V及σ-V曲线上呈现出Coulomb台阶.对实验结果做了初步分析讨论.