飞秒脉冲激光器中色散补偿膜的设计

阐述了用光学薄膜进行色散补偿的基本原理，介绍了设计的基本过程．根据Ti：Sapphire飞秒激光器中腔内色散补偿的要求，设定了色散补偿目标，通过计算机优化，得到了一种40层的Ta2O5／SiO2介质膜系．该膜系能在720～870am范围获得大于99．5％的反射率，在510～550nm获得大于90％的透射率，在740～850nm提供较平滑的-40fs^2的群延迟色散．这样的结果经过7次反射后，可以补偿5-mm Ti：sapphire晶体产生的绝大部分群延迟色散。

Influence of Cr interlayer on the structure and optical properties of Ag films on glass substrate by magnetron sputtering

Optical properties and microstructure of Ag film on glass substrate with Cr intermediate layer were studied by using spectrophotometer and XRD. The spectra results showed that introducing Cr intermediate layer reduced the surface roughness and promoted the reflectivity of Ag film. The XRD analysis showed that the crystalline grains increased and the stress decreased. The adhesion was also improved by using the tape test method. (c) 2006 Published by Elsevier B.V.

Far-field intensity distribution of a beam generated by a resonator with a phase-unifying mirror

The far-field intensity distribution (FFID) of a beam generated by a phase-unifying mirror resonator was investigated based on scalar diffraction theory. Attention was paid to the parameters, such as obscuration ratio and reflectivity of the phase-unifying mirror, that determine the FFID. All analyses were limited to the TEM00 fundamental mode. (c) 2005 Optical Society of America.

Antireflective characteristics of triangular shaped gratings

The antireflection properties of triangular shaped gratings are studied by a combination of the effective medium theory and the anisotropic thin-film theory. The triangular shaped structures are analyzed as a function of grating period, filling factor, and groove depth, and the antireflective characteristics are also studied when visible-infrared light is incident upon them. Numerical examples are given for gratings on glass substrate with refractive index of 1.5. The results show that this kind of grating is capable of reducing reflections, and could achieve very low reflectivity over a wide field of view and a wide waveband by choosing appropriate parameters.

Propagation properties of a hard-edged diffracted beam generated by a Gaussian mirror resonator

Based on the scalar diffraction theory, the propagation and focusing properties of a hard-edged diffracted beam generated by a Gaussian mirror resonator were investigated. Explicit expressions for the field distribution of the truncated beam that propagates through a paraxial optical ABCD system were derived in detail. Numerical examples are given to illustrate our analytical results. (c) 2006 Optical Society of America.

周期性梯度折射率多层膜的软X射线反射率

由于界面互扩散的存在，实际的超薄多层膜很难具有清晰的界面结构，假设超薄多层膜为具有周期性梯度折射率的多层膜结构，用直线模型和余弦模型模拟了周期性梯度折射率多层膜的软X射线反射率，结果证明，折射率余弦渐变的多层膜虽然不具有清晰的界面，但它同样具有很高的反射率。

Negative dispersion mirrors in Ta2O5/: SiO2 for femtosecond Ti : Sapphire lasers by using gires-tournois interferometers

We design and experimentally demonstrate some negative dispersion mirrors with optimized Gires-Tournois interferometers. The mirror structure is composed of 38 alternating Ta2O5 and SiO2 layers and could be regarded as two sections: high-reflectivity section consisting of a series of quarter-wavelength optical thickness stacks and negative-dispersion section consisting of only 13 layers. The designed mirrors exhibit the expected performance. These mirrors were fabricated by using ion beam sputtering. By adopting such mirrors, dispersion of a mode-locked femtosecond Ti:sapphire laser has been compensated for mostly. With two series of the mirrors, 32 fs and 15 fs pulses have been obtained respectively.

光学薄膜中界面层和表面吸附层对相位延迟的影响

多层介质反射镜在非正入射的时候，两个不同的偏振态之间会产生不同的相移．根据空气与膜层、膜层之间的实际情况，建立了界面层和表面吸附层模型，并运用它分析相位延迟产生误差的原因．通过优化设计，入射角为54°，在1285～1345nm之间p，s波获得了270±1°的相移，同时也使反射率在99．5％以上．用离子束溅射技术制备相位延迟膜，用分光光度计测试了光谱特性和用椭偏仪测试了相位特性，在相应波段获得了262．4±1．8°的相移，同时也使反射率在99．6％以上．误差的主要来源是离子源工作特性会产生不均匀的过渡层和最

Investigation on the properties of high reflective mirror prepared by ion-beam sputtering

The single-sided and dual-sided high reflective mirrors were deposited with ion-beam sputtering (IBS). When the incident light entered with 45 degrees, the reflectance of p-polarized light at 1064 nm exceeded 99.5%. Spectrum was gained by spectrometer and weak absorption of coatings was measured by surface thermal lensing (STL) technique. Laser-induced damage threshold (LIDT) was determined and the damage morphology was observed with Lecia-DMRXE microscope simultaneously. The profile of coatings was measured with Mark III-GPI digital interferometer. It was found that the reflectivity of mirror exceeded 99.9% and its absorption was as low as 14 ppm. The reflective bandwidth of the dual-sided sample was about 43 nm wider than that of single-sided sample, and its LIDT was as high as 28 J/cm2, which was 5 J/cm2 higher than that of single-sided sample. Moreover, the profile of dual-sided sample was better than that of substrate without coatings.

氧碘激光器相位延迟片的制备与性能研究

多层介质反射镜在非正入射的时候，两个不同的偏振态之间会产生不同的相移。利用矩阵法，根据菲涅耳公式和电磁场边界条件，推导出p，s波的相移。通过优化设计．入射角为54°，在1285～1345nm之间p，s波获得了270°±1°的相移，同时也使反射率在99．5％以上。用离子束溅射技术制备相位延迟膜，用分光光度计测试了光谱特性和用椭偏仪测试了相位特性，在相应波段获得了262．4°±1．8°的相移，同时也使反射率在99．6％以上。误差的主要来源是离子源工作特性会产生不均匀的过渡层和最外层会吸收一些水气、灰尘等也产生

高反射率193nm Al2O3／MgF2反射膜的实验研究

用电子束热蒸发方法在熔融石英基底上沉积了Al2O3和MgF2两种材料的单层膜，研究了两种材料的光学特性，采用光度法计算并给出了薄膜材料在180～230nm的折射率n／和消光系数k的色散曲线。以两种材料作为高低折射率材料组合，采用1／4波长规整膜系设计并镀制了193nm的高反射膜，反射膜在退火后的反射率在193nm达到96％以上。结果表明在一定工艺条件下Al2O3和MgF2两种材料能够在193nm获得较好的光学性能，适用于高反射膜的制备。

反射式相位延迟器的性能研究

多层介质反射镜在非正入射的时候，两个不同的偏振态之间会产生不同的相移。通过优化设计，入射角为45°，在1285～1345nm之间p，s波获得了270°±0．15°的相移和99．5％以上的反射率。对使用的膜系进行了每层光学厚度的误差分析。用离子柬溅射技术制备相位延迟膜，在大气中对样品进行不同温度的退火，用分光光度计测试了光谱特性和用椭偏仪测试了相位特性。结果表明，未退火的样品在相应波段获得了267．5°±0．5°的相移和99．6％以上的反射率；根据拟合分析，最外层的误差和折射率与设计值的偏差是发生相移偏小的

不同膜层数的Mo/Si多层膜的表界面粗糙度和软X射线反射率

用磁控溅射法制备了顶层分别是Mo膜层和Si膜层的两个系列的Mo/Si多层膜，它们的周期厚度相同但是膜层数各不相同。Mo/Si多层膜的周期厚度和界面粗糙度由小角X射线衍射（SAXRD）曲线拟和得到。用原子力显微镜测量了Mo/Si多层膜的表面粗糙度。在国家同步辐射实验室测量了Mo/Si多层膜的软X射线反射率。通过理论和试验研究，发现Mo/Si多层膜的软X射线反射率主要由周期数和界面粗糙度决定，表面粗糙度对Mo/Si多层膜的软X射线反射率影响较小。

三硼酸锂晶体上1064 nm, 532 nm, 355 nm三倍频增透膜的设计

采用矢量法设计了三硼酸锂晶体上1064 nm、532 nm和355 nm三倍频增透膜,结果表明1064 nm、532 nm和355 nm波长的剩余反射率分别为0.0017％、0.0002％和0.0013％。根据误差分析,薄膜制备时沉积速率精度控制在＋5.5％时,1064 nm、532 nm和355 nm波长的剩余反射率分别增加至0.20％、0.84％和1.89％。当材料折射率的变化控制在＋3％时,1064 nm处的剩余反射率增大为0.20％,532 nm和355 nm处分别达0.88％和0.24％。与薄膜

研究扩散屏障层对Mo/Si多层膜软X射线反射率影响的模拟

在特定波长下,用四层结构模型模拟了Mo/Si多层膜的软X射线反射率.研究了扩散屏障层dMo-on-Si和dSi-on-Mo对Mo/Si多层膜软X射线反射率的影响.研究发现,扩散屏障层并不总是损害Mo/Si多层膜的光学性能,通过合理设计dMo-on-Si和dSi-on-Mo厚度,增加dMo-on-Si与dSi-on-Mo的比值,也能提高多层膜的软X射线反射率.