研究扩散屏障层对Mo/Si多层膜软X射线反射率影响的模拟

在特定波长下,用四层结构模型模拟了Mo/Si多层膜的软X射线反射率.研究了扩散屏障层dMo-on-Si和dSi-on-Mo对Mo/Si多层膜软X射线反射率的影响.研究发现,扩散屏障层并不总是损害Mo/Si多层膜的光学性能,通过合理设计dMo-on-Si和dSi-on-Mo厚度,增加dMo-on-Si与dSi-on-Mo的比值,也能提高多层膜的软X射线反射率.

abstract {A four-layer model was used to simulate soft X-ray reflectivity of Mo/Si multilayers at a given wavelength. By simulation, the influence of interdiffusion barrier d_Mo-on-Si and d_Si-on-Mo on the soft X-ray reflectivity of Mo/Si multilayers has been detailedly studied. The simulation study shows that interdiffusion barrier is not always disadvantageous to optical capability of Mo/Si multilayers, through designing a right thickness of d_Mo-on-Si and d_Si-on-Mo, increasing the thickness ratio of d_Mo-on-Si and d_Si-on-Mo, it can also improve soft X-ray reflectivity of multilayers.}