Photoluminescence studies of GaAs/AlGaAs single quantum well intermixed by Ga+ ion implantation

Ga(+)ion implantation followed by rapid thermal annealing (RTA) was used to enhance the interdiffusion in GaAs/AlGaAs single Quantum Wells(SQWs). The extent of intermixing was found to be dependent on the well depth, number of implanted ions and annealing time. A very fast interdiffusion process occurs at the initial annealing stage. After that, the enhanced diffusion coefficient goes back to the umimplanted value. We propose a two-step model to explain the diffusion process as a function of the annealing time : a fast diffusion process and a saturated diffusion process. The interdiffusion coefficient of the fast diffusion was found to be of well depth dependence and estimated to be in the range of 5.4x10(-16) similar to 1.5x10(-15)cm(2)s(-1). Copyright (C) 1996 Published by Elsevier Science Ltd

Optical study of heterointerface configuration in narrow GaAs/AlGaAs single quantum wells prepared with growth interruption

Photoluminescence and time-resolved photoluminescence were used to study the heterointerface configuration in GaAs/AlGaAs quantum wells grown by molecular-beam epitaxy with growth interruption. Photoluminescence spectra of the growth-interrupted sample are characterized by multiplet structures, with energy separation corresponding to a 0.8 monolayer difference in well width, rather than 1 monolayer as expected from the ''atomically smooth island'' picture. By analyzing the thermal transfer process of the photogenerated carriers and luminescence decay process, we further exploit the exciton localization at the interface microroughness superimposed on the extended growth islands. The lateral size of the microroughness in our sample was estimated to be 5 nm, less than the exciton diameter of 15 nm. Our results strongly support the bimodal roughness model proposed by Warwick et al. [Appl. Phys. Lett. 56, 2666 (1990)]. (C) 1996 American Institute of Physics.

Quantum interference effect in GaAs/AlGaAs double quantum wells

Quantum interference properties of GaAs/AlGaAs symmetric double quantum wells were investigated in a magnetic field parallel to heterointerfaces at 1.9 K. For two types of samples used in our experiments, two GaAs quantum wells with the same width of 60 Angstrom are separated by an AlGaAs barrier layer of 120 Angstrom and 20 degrees thick, respectively. The channels with the length of 2 mu m are defined by alloyed ohmic contacts. The conductance oscillation as a function of the magnetic flux Phi(= B/s) was observed and oscillation period is approximately equal to h/e. The results are in agreement with the theoretical expectation of the Aharonov-Bohm effect. Conductance oscillations are apparent slightly in the samples with a thinner AlGaAs barrier.

128×160元GaAs／AlGaAs多量子阱长波红外焦平面阵列

研制了128×160元GaAs／AlGaAs多量子阱红外焦平面阵列，它是目前国内报道的最大像元数的量子阱红外焦平面阵列，77K时，器件的平均黑体响应率Rv=2．81×10^7V／W，平均峰值探测率Dλ^＊=1．28×10^10cm·W^-1·Hz^1/2，峰值波长λp=8．1μm，器件的盲元率为1．22％．

GaAs/AlGaAs量子级联激光器

利用分子束外延方法生长了激射波长约为9μm的GaAs/Al0.45Ga0.55As量子级联激光器.条宽35μm,腔长2mm的器件准连续激射温度最高达120K,81K下未经收集效率修正的峰值功率超过70mW.

室温和350℃下注Mn的GaAs/AlGaAs超晶格的磁学性质

通过室温和350℃注Mn后热退火,在GaAs/AlGaAs超晶格中引入了不同的亚微米磁性颗粒.利用原子力显微镜、能量散射X射线谱、X射线衍射和交变梯度磁强计研究了该颗粒膜材料的结构和磁学性质.通过比较这些颗粒的饱和磁化强度、剩余磁化强度、矫顽力和剩磁比,发现350℃注Mn的样品含有MnGa和MnAs两种磁性颗粒,而室温注Mn的样品主要含有MnAs颗粒.

准连续17 kW 808 nm GaAs/AlGaAs叠层激光二极管列阵

高功率激光二极管列阵广泛应用于抽运固体激光器.报道了17 kW GaAs/AlGaAs叠层激光二极管列阵的设计、制作过程和测试结果.为了提高器件的输出功率,一方面采用宽波导量子阱外延结构,降低腔面光功率密度,提高单个激光条的输出功率,通过金属有机物化学气相沉积(MOCVD)方法进行材料生长,经过光刻、金属化、镀膜等工艺制备1 cm激光条,填充密度为80%,单个激光条输出功率达100 W以上;另一方面器件采用高密度叠层封装结构,提高器件的总输出功率,实现了160个激光条叠层封装,条间距0.5 mm.经测试,器件输出功率达17kW,峰值波长为807.6 nm,谱线宽度为4.9 nm.

A Single Mode 980nm InGaAs/GaAs/AlGaAs Large Optical Cavity Quantum Well Laser with Low Vertical Divergence Angle

To achieve high optical power as well as low vertical divergence angle, a new kind of optimized large optical cavity (LOC) structure is applied to a ridge waveguide 980nm InGaAs/GaAs/AlGaAs multi-quantum well laser. The optical power density in the waveguide is successfully reduced. The maximum output power is more than 400mW with a slope efficiency of 0.89W/A and the far-field vertical divergence angle is lowered to 23°.

InGaAs/GaAs/AlGaAs应变量子阱激光器

优化设计了既能实现较小垂直方向远场发散角，又能降低腔面光功率密度的InGaAs/GaAs/AlGaAs应变层量子阱激光器，并计算了该结构激光器实现基横模工作的脊形波导结构参数。利用分子束外延生长了InGaAs/GaAs/AlGaAs应变量子阱激光器材料并研制出基横模输出功率大于140mW，激射波长为980nm的脊形波导应变量子阱激光器，其微分量子效率为0.8W/A，垂直和平行结平面方向远场发散角分别为28°和6.8°。