977 resultados para 11.5BC46-2


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We have successfully grown self-assembled InxGa1-xAs (x = 0.44, 0.47, 0.50) quantum dots (QDs) with high density (> 10(11)/cm(2)) by MBE. The effect of In content on the high-density QD is investigated by atomic force microscopy (AFM) and photoluminescence (PL) spectra. It is found that sample with In-mole-fraction of 0.5 shows small size fluctuation and high PL intensity. The influence of growth temperature on high-density QD is also investigated in our experiment. (c) 2005 Elsevier B.V. All rights reserved.

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Unintentionally doped high-Al-content Al0.45Ga0.55N/GaN high electron mobility transistor (HEMT) structures with and without AlN interfacial layer were grown by metal-organic chemical vapor deposition (MOCVD) on two-inch sapphire substrates. The effects of AlN interfacial layer on the electrical properties were investigated. At 300 K, high two-dimensional electron gas (2DEG) density of 1.66 x 10(11) cm(-2) and high electron mobility of 1346 cm(2) V-1 s(-1) were obtained for the high Al content HEMT structure with a 1 nm AlN interfacial layer, consistent with the low average sheet resistance of 287 Omega/sq. The comparison of HEMT wafers with and without AlN interfacial layer shows that high Al content AlGaN/AlN/GaN heterostructures are potential in improving the electrical properties of HEMT structures and the device performances. (c) 2006 Elsevier B.V. All rights reserved.

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This paper presents a direct digital frequency synthesizer (DDFS) with a 16-bit accumulator, a fourth-order phase domain single-stage Delta Sigma interpolator, and a 300-MS/s 12-bit current-steering DAC based on the Q(2) Random Walk switching scheme. The Delta Sigma interpolator is used to reduce the phase truncation error and the ROM size. The implemented fourth-order single-stage Delta Sigma noise shaper reduces the effective phase bits by four and reduces the ROM size by 16 times. The DDFS prototype is fabricated in a 0.35-mu m CMOS technology with active area of 1.11 mm(2) including a 12-bit DAC. The measured DDFS spurious-free dynamic range (SFDR) is greater than 78 dB using a reduced ROM with 8-bit phase, 12-bit amplitude resolution and a size of 0.09 mm(2). The total power consumption of the DDFS is 200)mW with a 3.3-V power supply.

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Low-indium-content self-assembled InGaAs/GaAs quantum dots (SAQD) were grown using solid-source molecular beam epitaxy (MBE) and investigated by atomic force microscopy and photoluminescence (PL) spectroscopy. Silicon, which was doped at different quantum dot (QD) growth stages, markedly increased the density of QD. We obtained high density In0.35Ga0.65As/GaAs(001) quantum dots of 10(11)/cm(2) at a growth temperature of 520degreesC. PL spectra and distribution statistics show the high quality and uniformity of our silicon-doped samples. The density increment can be explained using the lattice-hardening mechanism due to silicon doping.

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InAs quantum dots have been grown by solid source molecular beam epitaxy on different matrix to investigate the effect on the structure and optical properties. High density of 1.02 x 10(11) cm(-2) of InAs islands on In0.15Ga0.85As and In0.15Al0.85As underlying layer has been achieved. Atomic force microscopy and photoluminescence spectra show the size evolution of InAs islands on In0.15Ga0.85As underlying layer. A strong 1.3 mum photoluminescence from InAs islands on In0.15Ga0.85As underlying layer and with InGaAs strain-reduced layer has been obtained. Single-mirror light emitting diode structures with InAs quantum dots capped by InGaAs grown on InGaAs layer as active layer were fabricated and the corresponding radiative efficiency was deduced to be as high as 20.5%. Our results provide important information for optimizing the epitaxial structures of 1.3 mum wavelength quantum dots devices. (C) 2003 Elsevier B.V. All rights reserved.

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A high density of 1.02 x 10(11) cm(-2) of InAs islands with In(0.15)Gao(0.85)As underlying layer has been achieved on GaAs (10 0) substrate by solid source molecular beam epitaxy. Atomic force microscopy and PL spectra show the size evolution of InAs islands. A 1.3 mum photoluminescence (PL) from InAs islands with In(0.15)Gao(0.85)As underlying layer and InGaAs strain-reduced layer has been obtained. Our results provide important information for optimizing the epitaxial structures of 1.3 mum wavelength quantum dots devices. (C) 2002 Elsevier Science B.V. All rights reserved.

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A systematic study of electron cyclotron resonance (CR) in two sets of GaAs/Al0.3Ga0.7As modulation-doped quantum-well samples (well widths between 12 and 24 nm) has been carried out in magnetic fields up to 30 T. Polaron CR is the dominant transition in the region of GaAs optical phonons for the set of lightly doped samples, and the results are in good agreement with calculations that include the interaction with interface optical phonons. The results from the heavily doped set are markedly different. At low magnetic fields (below the GaAs reststrahlen region), all three samples exhibit almost identical CR which shows little effect of the polaron interaction due to screening and Pauli-principle effects. Above the GaAs LO-phonon region (B > similar to 23 T), the three samples behave very differently. For the most lightly doped sample (3 x 10(11) cm(-2)) only one transition minimum is observed, which can be explained as screened polaron CR. A sample of intermediate density (6 x 10(11) cm(-2)) shows two lines above 23 T; the higher frequency branch is indistinguishable from the positions of the single line of the low density sample. For the most heavily, doped sample (1.2 x 10(12) cm(-2)) there is no evidence of high frequency resonance, and the strong, single line observed is indistinguishable from the lower branch observed from sample with intermediate doping density. We suggest that the low frequency branch in our experiment is a magnetoplasmon resonance red-shifted by disorder, and the upper branch is single-particle-like screened polaron CR. (C) 1998 Elsevier Science B.V. All rights reserved.

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Molecular beam epitaxy has been used for growing InGaAs self-assembled quantum dots (QDs) in InAlAs on an InP(001) substrate. Nominal deposition of 9.6 monolayers of In0.9Ga0.1As results in QDs of similar to 6.5 nm high with an areal density of 3.3 X 10(11) cm(-2). Conspicuous bimodal size distribution is identified, and is responsible for the observed QDs photoluminescence (PL) emission with two peaks at 0.627 and 0.657 eV. Good agreement is achieved between the observed PL peak energies and calculated results. (C) 1999 American Institute of Physics. [S00218979(99)00101-2].

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本书是“高新技术科普丛书”之一。作为信息领域的核心技术,半导体光电子技术在光通信、光盘存储、光纤传感、激光加工以及医疗、军事等方面有着重要的应用,它的发展将直接影响世界经济的进展和人类生活水平的提高。全书共11章,第1章介绍半导体光电子技术的由来和发展趋势;第2、3章重点介绍半导体光电子材料和器件工作原理;第4章到第9章介绍半导体激光器、探测器、光波导器件、光电子集成的结构和特性以及外延生长、微细加工等制造技术,同时介绍了CCD、太阳能电池等器件;最后两章介绍半导体光电子技术的应用。

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本书是《中国材料工程大典》中的卷目之一。 信息功能材料是信息科学技术和信息产业发展的基础和先导。21世纪将是以信息产业为核心的知识经济时代,对信息技术和信息资源的竞争将更加激烈。我国电子信息行业2004年完成产品销售收入达26500亿元,多年来已居外贸出口首位,并继续以高出工业发展速度10%的速度发展,已成为世界信息产业大国。加快由信息产业大国向信息产业强国迈进的步伐,是我们广大从事信息技术,特别是信息功能材料工作者义不容辞的责任。希望《中国材料工程大典》中《信息功能材料工程》卷的出版,将有力推动我国信息技术和信息产业的健康发展。 《信息功能材料工程》分上、中、下卷,共设20篇,约600万字。它涉及到信息的获取、传输、存储、显示和处理等主要技术用的材料与器件,是目前我国该领域比较完整的专业工具书。参加这部书编写的有中科院、高校和部分企业的专家教授近200名。参加编写的主要单位有中科院半导体研究所、中科院物理研究所、中科院微电子研究所、中科院上海精密光学机械研究所、中科院上海红外技术物理研究所、中科院长春应用化学研究所、中科院合肥固体物理所、南京大学、清华大学、西安理工大学、北京有色金属研究总院、武汉邮电科学研究院等。历时近3年完稿。由王占国、陈立泉、屠海令任主编并统稿。 本卷各篇不仅全面系统地反映了国外信息功能材料研究领域的现状、最新进展和发展趋势,而且也特别注重我国在该领域的研发和产业化方面取得的成果,力图使其具有实用性、先进性和权威性。本书适合于从事信息功能材料的科研工作者和工程技术人员查阅使用,也可供有关师生参考。

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This paper presents a direct digital frequency synthesizer (DDFS) with a 16-bit accumulator, a fourth-order phase domain single-stage Delta Sigma interpolator, and a 300-MS/s 12-bit current-steering DAC based on the Q(2) Random Walk switching scheme. The Delta Sigma interpolator is used to reduce the phase truncation error and the ROM size. The implemented fourth-order single-stage Delta Sigma noise shaper reduces the effective phase bits by four and reduces the ROM size by 16 times. The DDFS prototype is fabricated in a 0.35-mu m CMOS technology with active area of 1.11 mm(2) including a 12-bit DAC. The measured DDFS spurious-free dynamic range (SFDR) is greater than 78 dB using a reduced ROM with 8-bit phase, 12-bit amplitude resolution and a size of 0.09 mm(2). The total power consumption of the DDFS is 200)mW with a 3.3-V power supply.

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We have systematically studied the temperature dependent photoluminescence of a self-assembled In(Ga)As/GaAs quantum dot (QD) system with different areal densities from similar to 10(9) to similar to 10(11) cm(-2). Different carrier channels are revealed experimentally and confirmed theoretically via a modified carrier equation model considering a new carrier transfer channel, i.e. continuum states ( CS). The wetting layer is demonstrated to be the carrier quenching channel for the low-density QDs but the carrier transfer channel for the high-density QDs. In particular, for the InGaAs/GaAs QDs with a medium density of similar to 10(10) cm(-2), the CS is verified to be an additional carrier transfer channel in the low temperature regime of 10-60 K, which is studied in detail via our models. The possible carrier channels that act on different temperature regimes are further discussed, and it is demonstrated that density is not a crucial factor in determining the carrier lateral coupling strength.

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We have investigated temperature dependent photoluminescence of both buried and surface self-assembled InAs/GaAs quantum dots with an areal density up to similar to 10(11)/cm(2). Different from the buried quantum dots, the peak energy of surface quantum dots shows a blueshift relative to the bulk material variation from 15 to 130K. Besides the line width and the integrated intensity both first decrease and then increase in this temperature interval. The observed phenomena can be explained by carrier trapping effects by some shallow localized centers near the surface quantum dots.

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作为加密标准,DES(data encryption standard)算法虽然已被AES(advanced encryption standard)算法所取代,但其仍有着不可忽视的重要作用.在一些领域,尤其是金融领域,DES和Triple DES仍被广泛使用着.而近年来又提出了一些新的密码分析方法,其中,Rectangle攻击和Boomerang攻击已被证明是非常强大而有效的.因此,有必要重新评估DES算法抵抗这些新分析方法的能力.研究了DES算法针对Rectangle攻击和Boomerang攻击的安全性.利用DES各轮最优差分路径及其概率,分别得到了对12轮DES的Rectangle攻击和对11轮DES的Boomerang攻击.攻击结果分别为:利用Rectangle攻击可以攻击到12轮DES,数据复杂度为2~(62)。个选择明文,时间复杂度为2~(42)次12轮加密;利用Boomerang攻击可以攻击到11轮DES,数据复杂度为2~(58)个适应性选择明密文,时间复杂度为2~(38)次11轮加密.由于使用的都是DES各轮的最优差分路径,所以可以相信,该结果是Rectangle攻击和Boomerang攻击对DES所能达到的最好结果.

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和共轭聚合物相比,单分散共轭齐聚物具有结构确定、易提纯等优点,不仅是建立共轭体系结构与性能关系的最佳模型,而且是一类高纯度光电子材料,还是构造具有规整结构嵌段共聚物和超分子体系的理想构造单元。鉴于基于芴单元的共轭齐聚物与聚合物具有优异的光电性能,引入不同端基能够有效调节共轭齐聚物的性能,本论文以端基官能化齐聚芴为研究对象,设计与合成了具有不同端基结构的系列单分散齐聚芴,研究了它们基本的物理化学性质,主要成果与创新点如下: 1、利用Horner-Wadsworth-Emmons反应、Wittig反应和Heck偶联反应,交替引入极性、非极性反应端基,成功解决了发散法合成较长单分散共轭齐聚物过程中产物难以提纯的技术问题,合成了系列芴撑乙烯撑共轭齐聚物。其中,最长的齐聚物含11个芴单元,光谱外推得到的有效共轭长度可达19个重复单元。DSC和偏光显微镜研究表明,芴单元数大于5的齐聚物可形成向列型液晶相。含7个芴单元以上的齐聚物可用于制备有机发光二极管,含11个芴单元的齐聚物电致发光效率是相应聚合物的5倍。 2、通过Hagigara-Sonogashira偶联、Diels-Alder环加成等反应合成了一系列端基为刚性的苯乙炔基和五苯基苯的单分散齐聚芴。但典型Scholl反应条件不能实现完全氧化脱氢,获得六苯并晕苯封端的齐聚芴。光谱研究表明苯乙炔基的引入导致吸收光谱和荧光光谱有1-2 nm的红移。五苯基苯结构的引入能显著提高齐聚芴的Tg,从而提高齐聚物的形态稳定性。 3、利用Yamamoto反应,采用端基溴代的齐聚芴大分子单体聚合结合制备色谱分离,成功地制备了分子量超过20000 Da的单分散共轭聚合物,说明大分子单体聚合结合制备色谱分离制备单分散共轭聚合物是可行的。 4、通过Horner-Wadsworth-Emmons反应合成一系列端基为三苯胺乙烯撑的单分散齐聚芴,其中,最长的齐聚物含9个芴单元。光谱研究表明,随芴单元数的增加,两个三苯胺乙烯撑端基间共轭作用显著减弱,最大吸收波长蓝移;当芴的单元数≥3时,最大发射波长均位于450 nm,和聚芴和齐聚芴相比,这类共轭齐聚物的蓝光发光峰位更佳。电化学研究表明三苯胺乙烯撑单元的氧化还原过程不受齐聚芴单元长度的影响,该封端齐聚芴的HOMO能级主要是由三苯胺乙烯撑单元决定。 关键词:端基官能化,齐聚芴,单分散共轭聚合物