Coma measurement using a PSM and transmission image sensor

As feature size decreases, especially with the use of resolution enhancement technique, requirements for the coma aberrations in the projection lenses of the lithographic tools have become extremely severe. So, fast and accurate in situ measurement of coma is necessary. In the present paper, we present a new method for characterizing the coma aberrations in the projection lens using a phase-shifting mask and a transmission image sensor. By measuring the image positions at multiple NA and partial coherence settings, we are able to extract the coma aberration. The simulation results show that the accuracy of coma measurement increases approximately 20% compared to the previous straightforward measurement technique. (c) 2005 Elsevier GmbH. All rights reserved.

Geometric Distortion Insensitive Image Watermarking in Affine Covariant Regions

Feature-based image watermarking schemes, which aim to survive various geometric distortions, have attracted great attention in recent years. Existing schemes have shown robustness against rotation, scaling, and translation, but few are resistant to cropping, nonisotropic scaling, random bending attacks (RBAs), and affine transformations. Seo and Yoo present a geometrically invariant image watermarking based on affine covariant regions (ACRs) that provide a certain degree of robustness. To further enhance the robustness, we propose a new image watermarking scheme on the basis of Seo's work, which is insensitive to geometric distortions as well as common image processing operations. Our scheme is mainly composed of three components: 1) feature selection procedure based on graph theoretical clustering algorithm is applied to obtain a set of stable and nonoverlapped ACRs; 2) for each chosen ACR, local normalization, and orientation alignment are performed to generate a geometrically invariant region, which can obviously improve the robustness of the proposed watermarking scheme; and 3) in order to prevent the degradation in image quality caused by the normalization and inverse normalization, indirect inverse normalization is adopted to achieve a good compromise between the imperceptibility and robustness. Experiments are carried out on an image set of 100 images collected from Internet, and the preliminary results demonstrate that the developed method improves the performance over some representative image watermarking approaches in terms of robustness.

Resolution and noise in ghost imaging with classical thermal light

The resolution and classical noise in ghost imaging with a classical thermal light are investigated theoretically. For ghost imaging with a Gaussian Schell model source, the dependences of the resolution and noise on the spatial coherence of the source and the aperture in the imaging system are discussed and demonstrated by using numerical simulations. The results show that an incoherent source and a large aperture will lead to a good image quality and small noise.

Aberration measurement of projection optics in lithographic tools based on two-beam interference theory

The degradation of image quality caused by aberrations of projection optics in lithographic tools is a serious problem in optical lithography. We propose what we believe to be a novel technique for measuring aberrations of projection optics based on two-beam interference theory. By utilizing the partial coherent imaging theory, a novel model that accurately characterizes the relative image displacement of a fine grating pattern to a large pattern induced by aberrations is derived. Both even and odd aberrations are extracted independently from the relative image displacements of the printed patterns by two-beam interference imaging of the zeroth and positive first orders. The simulation results show that by using this technique we can measure the aberrations present in the lithographic tool with higher accuracy. (c) 2006 Optical Society of America.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask

As a critical dimension shrinks, the degradation in image quality caused by wavefront aberrations of projection optics in lithographic tools becomes a serious problem. It is necessary to establish a technique for a fast and accurate in situ aberration measurement. We introduce what we believe to be a novel technique for characterizing the aberrations of projection optics by using an alternating phase-shifting mask. The even aberrations, such as spherical aberration and astigmatism, and the odd aberrations, such as coma, are extracted from focus shifts and image displacements of the phase-shifted pattern, respectively. The focus shifts and the image displacements are measured by a transmission image sensor. The simulation results show that, compared with the accuracy of the previous straightforward measurement technique, the accuracy of the coma measurement increases by more than 30% and the accuracy of the spherical-aberration measurement increases by approximately 20%. (c) 2006 Optical Society of America.

Measurement technique for in situ characterizing aberrations of projection optics in lithographic tools

As the feature size decreases, degradation of image quality caused by wavefront aberrations of projection optics in lithographic tools has become a serious problem in the low-k1 process. We propose a novel measurement technique for in situ characterizing aberrations of projection optics in lithographic tools. Considering the impact of the partial coherence illumination, we introduce a novel algorithm that accurately describes the pattern displacement and focus shift induced by aberrations. Employing the algorithm, the measurement condition is extended from three-beam interference to two-, three-, and hybrid-beam interferences. The experiments are performed to measure the aberrations of projection optics in an ArF scanner. (C) 2006 Optical Society of America.

A novel FOCAL technique based on BP-ANN

In this paper, the feed-forward back-propagation artificial neural network (BP-ANN) algorithm is introduced in the traditional Focus Calibration using Alignment procedure (FOCAL) technique, and a novel FOCAL technique based on BP-ANN is proposed. The effects of the parameters, such as the number of neurons on the hidden-layer and the number of training epochs, on the measurement accuracy are analyzed in detail. It is proved that the novel FOCAL technique based on BP-ANN is more reliable and it is a better choice for measurement of the image quality parameters. (c) 2005 Elsevier GmbH. All rights reserved.

Optimized phase pupil masks for extended depths of field

By properly designing a phase pupil mask to modulate or encode the optical images and then digitally restoring them, one can greatly extend the depth of field and improve image quality. The original works done by Dowski and Cathey introduce the use of a cubic phase pupil mask to extend the depth of field. The theoretical and experimental researches all verified its effectiveness. In this paper, we suggest the use of an exponential phase pupil mask to extend the depth of field. This phase mask has two variable parameters for designing to control the shape of the mask so as to modulate the wave-front more flexible. We employ an optimization procedure based on the Fisher information metric to obtain the optimum values of the parameters for the exponential and the cubic masks, respectively. A series of performance comparisons between these two optimized phase masks in extending the depth of field are then done. The results show that the exponential phase mask provide slight advantage to the cubic one in several aspects. (c) 2006 Elsevier B.V. All rights reserved.

Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node

Immersion lithography has been considered as the mainstream technology to extend the feasibility of optical lithography to further technology nodes. Using proper polarized illumination in an immersion lithographic tool is a powerful means to enhance the image quality and process capability for high numerical aperture (NA) imaging. In this paper, the impact of polarized illumination on high NA imaging in ArF immersion lithography for 45 nm dense lines and semi-dense lines is studied by PROLITH simulation. The normalized image log slope (NILS) and exposure defocus (ED) window are simulated under various polarized illumination modes, and the impact of polarized illumination on image quality and process latitude is analyzed. (C) 2007 Elsevier GmbH. All rights reserved.

Elimination of zero-order diffraction in digital holography

A simple method to suppress the zero-order diffraction in the reconstructed image of digital holography is presented. In this method, the Laplacian of a detected hologram is used instead of the hologram itself for numerical reconstruction by computing the discrete Fresnel integral. This method can significantly improve the image quality and give better resolution and higher accuracy of the reconstructed image. The main advantages of this method are its simplicity in experimental requirements and convenience in data processing. (C) 2002 Society of Photo-optical Instrumentation Engineers.

A TOF-PET prototype with position sensitive PMT readout

A prototype of time-of-flight positron emission computed tomography (TOF-PET) has been developed for acquiring the coincident detection of 511 keV gamma-rays produced from positron annihilation. It consists of two 80.5 mmx80.5 mm LYSO scintillator arrays (composed of 35 x35 pixel finger crystals) with the position sensitive photomultiplier tubes R2487 as the readout. Each array is composed of 2 mm x2 mm x 15 mm finger crystals and the average pixel pitch is 2.30 mm. The measured results indicate that the TOF information has the potential to significantly enhance the image quality by improving the noise variance in the image reconstruction. The best spatial resolution (FWHM) of the prototype for the pairs of 511 keV gamma-rays is 1.98 mm and 2.16 mm in the x and y directions, respectively, which are smaller than the average pixel pitch of 2.30 mm.

ARM处理器在AFM纳米操作系统中的应用

文章介绍了在原子力显微镜(AFM)纳米操作系统中ARM处理器的应用及开发,在此基础上搭建了具有3D力反馈的纳米操作系统。结合AFM纳米操作系统的实时性问题,进行了ARM开发板的系统软件架构和PSD(四象限光电检测器)信号的PID控制结果的分析,使纳米操作系统在实时性和成像的质量等方面都得到相应改进。

地球介质非线性与各向异性的地震波响应及其成像效应

The practice of geophysical prospecting shows us the complex interior earth. The studies of the complexity play an important role and practical guide for the subsurface structure. At present, the complexity of the earth mainly means lateral and vertical homogeneity, anisotropy and non-linear quality. And the anisotropy and non-linear media studies become the frontier in seismology and exploration seismology. This paper summarizes the development of complexities and presents the forward and inverse in the non-linear and anisotropic media. Firstly, the paper introduces the theory of seismic wave propagation in the non-linear and anisotropic media, the theoretical basis for simulation and inversion research. Secondly, high quality numerical simulation method with little dispersion has been developed to investigate the influence of complexity including anisotropy and non-linear multi-component seismograms. Because most real data in seismology have a single component, we developed two aspects work on anisotropic multi-component imaging. One is prestack reflection migration. The result show that distorted images are obtained if data from anisotropic media are migrated using isotropic extrapolation. Moreover, image quality will be improved greatly after considering anisotropy in subsurface layers. The other one is the we take advantage of multi-component data to inversion of the anisotropic parameters jointly seimic reflection travel time and polarization information. Based on these research works, we get the following results: 1.Combing numerical simulation, systematical studies indicate that anisotropy and non-linear seismograms characters are significant to detect cracked belts in the earth and to understand deformation field and mechanism. 2.Based on anisotropic media models, we developed an efficient prestack migration method for subsurface structure and different observation methods seismic data, which improving the imaging quality with VSP, seismograms and real data. 3.Jointly seismic inversion combining seismic anisotropic reflection traveltimes and polarizations data show that the complete wrong inversion and the following explanation will be resulted by ignoring anisotropy.