Design and Fabrication of Ultracompact 3-dB MMI Coupler in Silicon-on-Insulator

An ultracompact 3-dB coupler is designed and fabricated in silicon-on-insulator,based on 12 line tapered multimode interference(MMI) coupler.Comparing with the conventional straigth MMI coupler,the device is-40% shorter in length.The device exhibits uniformity of 1.3dB and excess loss of 2.5dB

2 x 2 electrooptical switch in silicon-on-insulator waveguide

A 2 x 2 Mach-Zehnder interferometer electrooptical switch integrated in silicon-on-insulator using multimode interference 3-dB couplers as splitter and combiner has been proposed and fabricated. Free carriers plasma dispersion effect was utilized to realize light modulation in silicon. Switching operation was achieved at an injection current of 358mA and which can be much reduced by optimizing the PIN structure and improving fabrication process. Extinction ratio of 7.7dB and crosstalk of 4.8dB has been observed.

Biomimetic (topological) pattern recognition - A new model of pattern recognition theory and its application

A new theoretical model of Pattern Recognition principles was proposed, which is based on "matter cognition" instead of "matter classification" in traditional statistical Pattern Recognition. This new model is closer to the function of human being, rather than traditional statistical Pattern Recognition using "optimal separating" as its main principle. So the new model of Pattern Recognition is called the Biomimetic Pattern Recognition (BPR)(1). Its mathematical basis is placed on topological analysis of the sample set in the high dimensional feature space. Therefore, it is also called the Topological Pattern Recognition (TPR). The fundamental idea of this model is based on the fact of the continuity in the feature space of any one of the certain kinds of samples. We experimented with the Biomimetic Pattern Recognition (BPR) by using artificial neural networks, which act through covering the high dimensional geometrical distribution of the sample set in the feature space. Onmidirectionally cognitive tests were done on various kinds of animal and vehicle models of rather similar shapes. For the total 8800 tests, the correct recognition rate is 99.87%. The rejection rate is 0.13% and on the condition of zero error rates, the correct rate of BPR was much better than that of RBF-SVM.

Integrated tapered MMI couplers in the silicon-on-insulator technology

The authors have designed and fabricated 2x2 parabolically tapered MMI coupler with large cross-section and large space between difference ports using Silicon-on-Insulator ( SOI) technology. The devices demonstrate a minimum uniformity of 0.8dB and 30% shorter than the straight MMI coupler.

Integrated MMI optical couplers and optical switches in Silicon-on-insulator technology

Integrated multimode interference coupler based on silicon-on-insulator has been become a kind of more and more attractive device in optical systems. Thin cladding layers (<1.0mum) can be used in SOI waveguide due to the large index step between Si and SiO2, making them compatible with the VLSI technology. Here we demonstrate the design and fabrication of multimode interference (MMI) optical couplers and optical switches in SOI technology.

Integrated multimode interference couplers in silicon-on insulator

Silicon-on insulator (SOI) is an attractive platform for the fabrication of optoelectronic integrated circuit. Thin cladding layers (< 1.0m) can be used in SOI waveguide due to the large index step between Si and SiO2, making them compatible with the VLSI technology. Here we demonstrate the fabrication of 1 x 4 and 2 x 2 multimode interference (MMI) coupler based on SOI technology. Performances of the devices are analyzed. The minimum excess loss of the devices is about 1.8dB. The devices show uniform power distribution.

Nano-layer structure of silicon-on-insulator materials

Silicon-on-insulator (SOI) has been recognized as a promising semiconductor starting material for ICs where high speed and low power consumption are desirable, in addition to its unique applications in radiation-hardened circuits. In the present paper, three novel SOI nano-layer structures have been demonstrated. ULTRA-THIN SOI has been fabricated by separation by implantation of oxygen (SIMOX) technique at low oxygen ion energy of 45 keV and implantation dosage of 1.81017/cm2. The formed SOI layer is uniform with thickness of only 60 nm. This layer is of crystalline quality. and the interface between this layer and the buried oxide layer is very sharp, PATTERNED SOI nanostructure is illustrated by source and drain on insulator (DSOI) MOSFETs. The DSOI structure has been formed by selective oxygen ion implantation in SIMOX process. With the patterned SOI technology, the floating-body effect and self-heating effect, which occur in the conventional SOI devices, are significantly suppressed. In order to improve the total-dose irradiation hardness of SOI devices, SILICON ON INSULATING MULTILAYERS (SOIM) nano-structure is proposed. The buried insulating multilayers, which are composed of SiOx and SiNy layers, have been realized by implantation of nitride and oxygen ions into silicon in turn at different ion energies, followed by two steps of high temperature annealing process, respectively, Electric property investigation shows that the hardness to the total-dose irradiation of SOIM is remarkably superior to those of the conventional SIMOX SOI and the Bond-and-Etch-Back SOI.

Influence of nitrogen implantation into the buried oxide on the radiation hardness of silicon-on-insulator wafers

摘要: In order to improve the total-dose radiation hardness of the buried oxide of separation by implanted oxygen silicon-on-insulator wafers, nitrogen ions were implanted into the buried oxide with a dose of 10(16)cm(-2), and subsequent annealing was performed at 1100 degrees C. The effect of annealing time on the radiation hardness of the nitrogen implanted wafers has been studied by the high frequency capacitance-voltage technique. The results suggest that the improvement of the radiation hardness of the wafers can be achieved through a shorter time annealing after nitrogen implantation. The nitrogen-implanted sample with the shortest annealing time 0.5 h shows the highest tolerance to total-dose radiation. In particular, for the 1.0 and 1.5 h annealing samples, both total dose responses were unusual. After 300-krad(Si) irradiation, both the shifts of capacitance-voltage curve reached a maximum, respectively, and then decreased with increasing total dose. In addition, the wafers were analysed by the Fourier transform infrared spectroscopy technique, and some useful results have been obtained.

Topological objects in the O(3) nonlinear sigma model

We study the topological defects in the nonlinear O(3) sigma model in terms of the decomposition of U(1) gauge potential. Time-dependent baby skyrmions are discussed in the (2 + 1)-dimensional spacetime with the CP1 field. Furthermore, we show that there are three kinds of topological defects-vortex lines, point defects and knot exist in the (3 + 1)-dimensional model, and their topological charges, locations and motions are determined by the phi-mapping topological current theory.

Topological structure of the many vortices solution in Jackiw-Pi model

By using the gauge potential decomposition, we discuss the self-dual equation and its solution in Jackiw-Pi model. We obtain a new concrete self-dual equation and find relationship between Chern-Simons vortices solution and topological number which is determined by Hopf indices and Brouwer degrees of Psi-mapping. To show the meaning of topological number we give several figures with different topological numbers. In order to investigate the topological properties of many vortices, we use five parameters (two positions, one scale, one phase per vortex and one charge of each vortex) to describe each vortex in many vortices solutions in Jackiw-Pi model. For many vortices, we give three figures with different topological numbers to show the effect of the charge on the many vortices solutions. We also study the quantization of flux of those vortices related to the topological numbers in this case.

Topological objects in two-gap superconductor

We discuss the non-Abelian topological objects, in particular the non-Abrikosov vortex and the magnetic knot made of the twisted non-Abrikosov vortex, in two-gap superconductor. We show that there are two types of non-Abrikosov vortex in Ginzburg-Landau theory of two-gap superconductor, the D-type which has no concentration of the condensate at the core and the N-type which has a non-trivial profile of the condensate at the core, under a wide class of realistic interaction potential. We prove that these non-Abrikosov vortices can have either integral or fractional magnetic flux, depending on the interaction potential. We show that they are described by the non-Abelian topology pi(2)(S-2) and pi(1)(S-1), in addition to the well-known Abelian topology pi(1)(S-1). Furthermore, we discuss the possibility to construct a stable magnetic knot in two-gap superconductor by twisting the non-Abrikosov vortex and connecting two periodic ends together, whose knot topology pi(3)(S-2) is described by the Chern-Simon index of the electromagnetic potential. We argue that similar topological objects may exist in multi-gap or multi-layer superconductors and multi-component Bose-Einstein condensates and superfluids, and discuss how these topological objects can be constructed in MgB2, Sr2RuO4, He-3, and liquid metallic hydrogen.

Study of He-induced nano-cavities as sinks of oxygen for forming silicon-on-insulator

In the present work, a Cz-Silicon wafer is implanted with helium ions to produce a buried porous layer, and then thermally annealed in a dry oxygen atmosphere to make oxygen transport into the cavities. The formation of the buried oxide layer in the case of internal oxidation (ITOX) of the buried porous layer of cavities in the silicon sample is studied by positron beam annihilation (PBA). The cavities are formed by 15 keV He implantation at a fluence of 2 x 10(16) cm(-2) and followed by thermal annealing at 673 K for 30 min in vacuum. The internal oxidation is carried out at temperatures ranging from 1073 to 1473 K for 2 h in a dry oxygen atmosphere. The layered structures evolved in the silicon are detected by using the PBA and the thicknesses of their layers and nature are also investigated. It is found that rather high temperatures must be chosen to establish a sufficient flux of oxygen into the cavity layer. On the other hand high temperatures lead to coarsening the cavities and removing the cavity layer finally.

Topological solitons in the CPN model

We investigate the solitons in the CPN supercript stop model in terms of the decomposition of gauge potential. Based on the phi-mapping topological current theory, the charge and position of solitons is determined by the properties of the typical component. Furthermore, the motion and the bifurcation of multi-soliton is discussed. And the knotted solitons in high dimension is explored also.

Topological structure of vortex solution in Jackiw-Pi model

By using phi-mapping method, we discuss the topological structure of the self-duality solution in Jackiw-Pi model in terms of gauge potential decomposition. We set up relationship between Chern-Simons vortex solution and topological number, which is determined by Hopf index and Brouwer degree. We also give the quantization of flux in this case. Then, we study the angular momentum of the vortex, which can be expressed in terms of the flux.