Fully lithography independent fabrication of nanogap electrodes for lateral phase-change random access memory application

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Polarization holographic high-density optical data storage in bacteriorhodopsin film

Optical films containing the genetic variant bacteriorhodopsin BR-D96N were experimentally studied in view of their properties as media for holographic storage. Different polarization recording schemes were tested and compared. The influence of the polarization states of the recording and readout waves on the retrieved diffractive image's intensity and its signal-to-noise ratio were analyzed. The experimental results showed that, compared with the other tested polarization relations during holographic recording, the discrimination between the polarization states of diffracted and scattered light is optimized with orthogonal circular polarization of the recording beams, and thus a high signal-to-noise ratio and a high diffraction efficiency are obtained. Using a He-Ne laser (633 nm, 3 mW) for recording and readout, a spatial light modulator as a data input element, and a 2D-CCD sensor for data capture in a Fourier-transform holographic setup, a storage density of 2 x 10(8) bits/cm(2) was obtained on a 60 x 42 mu m(2) area in the BR-D96N film. The readout of encoded binary data was possible with a zero-error rate at the tested storage density. (c) 2005 Optical Society of America.

Photochromic diarylethene for polarization holographic optical recording

Photochromic diarylethene, 1,2-bis[2-methyl-5-(3-fluorophenyl)-3-thienyl] perfluorocyleopentene (1a), was synthesized. The compound showed good photochromic reactions both in solution and in PMMA matrix by photo-irradiation. Using the diarylethene lb/PMMA film as recording medium and a He-Ne laser for recording and readout, four types of polarization holographic optical recording were accomplished for the first time. The results show that the orthogonal circular polarization recording is the best method for holographic optical recording when the target photochromic diarylethene is used as recording material. (c) 2006 Published by Elsevier B.V.

Photochromic diarylethene for reversible holographic recording

A novel photochromic, diarylethene with 2,5-dihydrothiophene bridging unit la was synthesized, and the photochromic properties of 1 were also investigated. It showed that I exhibited excellent ring-open and ring-closed photochromism with UV/vis light irradiation. Holographic recording was measured by employing the thin film of PMMA-diarylethene 1 as recording media. It showed that six different images were recorded in the same place on the sample with the dimension of 64 mu m x 42 mu m by the intersecting of the object beam and a reference beam with an intensity of 15 mW/cm(2), and the stored information was readout by the attenuated reference beam with an intensity of 0.5 mW/cm(2). In addition, preliminary investigations showed that the material was thermally stable and fatigue resistant. (C) 2007 Elsevier B.V. All rights reserved.

Photochromic fulgide for holographic recording

(N-4'-methoxy-2-methyl-5-phenyl)-3-pyrryl-ethylidene (isopropylidene) succinic anhydride fulgide, doped in PMMA matrix, exhibits photochromic behavior. The fatigue resistance experiment shows no photodegradation is detected after more than 450 writing-erasing cycles. Study of fulgide material for holographic recording media shows the optimal exposure and the diffraction efficiency is 1047 mJ/cm(2) and 2.26%, respectively, with 10 mum thickness polymer film. Holographic grating with 1680 lines/mm at writing angle theta = 30degrees is also obtained. (C) 2004 Elsevier B.V. All rights reserved.

Experimental study on polarization holographic storage in genetic mutant BR-D96N film

Recording with both parallel and orthogonal linearly polarized lights, polarization holographic storage in genetic mutant BR-D96N film is reported with both transmission type geometry and reflection type geometry. Polarization properties of diffraction light and scattering light are discussed for two different cases, parallel polarization recording and orthogonal polarization recording. It shows that, compared with recording with parallel polarization lights, orthogonal polarization holography can separate the diffraction light from the scattering noise, therefore improving the signal-to-noise ratio. It also shows that, compared with reconstruction with reference light, reconstruction with phase conjugated wave of the reference light can improve the signal-to-noise ratio of the reconstructed diffraction image, and also the wave-front aberration of the object light introduced by irregular phase object in the optical pass-way can also be corrected effectively, which ensures that the reconstructed diffraction image has a better fidelity. The preliminary angle-multiplexed volume holographic storage multiplexed by transmission type geometry and reflection type geometry is demonstrated in the BR-D96N film. Experiment shows that there is no cross-talk between the two pages of images except for some scattering noises.

Polarization multiplexing holographic optical recording of a new photochromic diarylethene

A new unsymmetrical photochromic diarylethene 1a is synthesized, and the photochromic properties of it are also investigated. The compound exhibits good photochromism with UV/ visible light irradiation. Compound 1a in polymethyl methacrylate ( PMMA ) film changes color upon 313- nm light irradiation from colorless to blue, in which the absorption maximum is observed at 587 nm. Photon- mode polarization multiplexing holographic optical recording is performed successfully using this compound as a recording medium. In the diarylethene 1b/ PMMA film, polarization multiplexing hologram recording and retrieval, and a combination with the angular multiplexing scheme, are demonstrated systematically. The results indicate that recording capacity can be significantly improved with the combined method of polarization and angular multiplexing holographic recording. (C) 2008 Society of Photo- Optical Instrumentation Engineers.

Lithography-independent and large scale fabrication of a metal electrode nanogap

A lithography-independent and wafer scale method to fabricate a metal nanogap structure is demon-strated. Polysilicon was first dry etched using photoresist (PR) as the etch mask patterned by photolithography.Then, by depositing conformal SiO_2 on the polysilicon pattern, etching back SiO_2 anisotropically in the perpendic-ular direction and removing the polysilicon with KOH, a sacrificial SiO_2 spacer was obtained. Finally, after metal evaporation and lifting-off of the SiO_2 spacer, an 82 nm metal-gap structure was achieved. The size of the nanogap is not determined by the photolithography, but by the thickness of the SiO_2. The method reported in this paper is compatible with modern semiconductor technology and can be used in mass production.

Fabrication of Silicon Crystal-Facet-Dependent Nanostructures by Electron-Beam Lithography

Silicon crystal-facet-dependent nanostructures have been successfully fabricated on a (100)-oriented silicon-on-insulator wafer using electron-beam lithography and the silicon anisotropic wet etching technique. This technique takes ad-vantage of the large difference in etching properties for different crystallographic planes in alkaline solution. The mini-mum size of the trapezoidal top for those Si nanostructures can be reduced to less than 10nm. Scanning electron microscopy(SEM) and atomic force microscopy (AFM) observations indicate that the etched nanostructures have controllable shapes and smooth surfaces.

An All-E-Beam Lithography Process for the Patterning of 2D Photonic Crystal Waveguide Devices

We present an all-e-beam lithography (EBL) process for the patterning of photonic crystal waveguides.The whole device structures are exposed in two steps. Holes constituting the photonic crystal lattice and defects are first exposed with a small exposure step size (less than 10nm). With the introduction of the additional proximity effect to compensate the original proximity effect, the shape, size, and position of the holes can be well controlled.The second step is the exposure of the access waveguides at a larger step size (about 30nm) to improve the scan speed of the EBL. The influence of write-field stitching error can be alleviated by replacing the original waveguides with tapered waveguides at the joint of adjacent write-fields. It is found experimentally that a higher exposure efficiency is achieved with a larger step size;however,a larger step size requires a higher dose.

Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip

A new fabricating method is demonstrated to realize two different Bragg gratings in an identical chip using traditional holographic exposure. Polyimide is used to protect one Bragg grating during the first period. The technical process of this method is as simple as that of standard holographic exposure