Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip


Autoria(s): Xie Hongyun; Zhou Fan; Wang Baojun; Yang Hua; Zhu Hongliang; Zhao Lingjuan; Wang Wei
Data(s)

2005

Resumo

A new fabricating method is demonstrated to realize two different Bragg gratings in an identical chip using traditional holographic exposure. Polyimide is used to protect one Bragg grating during the first period. The technical process of this method is as simple as that of standard holographic exposure

A new fabricating method is demonstrated to realize two different Bragg gratings in an identical chip using traditional holographic exposure. Polyimide is used to protect one Bragg grating during the first period. The technical process of this method is as simple as that of standard holographic exposure

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国家重点基础研究发展计划,国家自然科学基金,国家高技术研究发展计划资助项目

Institute of Semiconductors, Chinese Academy of Sciences

国家重点基础研究发展计划,国家自然科学基金,国家高技术研究发展计划资助项目

Identificador

http://ir.semi.ac.cn/handle/172111/16955

http://www.irgrid.ac.cn/handle/1471x/103115

Idioma(s)

英语

Fonte

Xie Hongyun;Zhou Fan;Wang Baojun;Yang Hua;Zhu Hongliang;Zhao Lingjuan;Wang Wei.Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip,半导体学报,2005,26(7):1287-1290

Palavras-Chave #半导体材料
Tipo

期刊论文