Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip
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2005
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Resumo |
A new fabricating method is demonstrated to realize two different Bragg gratings in an identical chip using traditional holographic exposure. Polyimide is used to protect one Bragg grating during the first period. The technical process of this method is as simple as that of standard holographic exposure A new fabricating method is demonstrated to realize two different Bragg gratings in an identical chip using traditional holographic exposure. Polyimide is used to protect one Bragg grating during the first period. The technical process of this method is as simple as that of standard holographic exposure 于2010-11-23批量导入 zhangdi于2010-11-23 13:04:22导入数据到SEMI-IR的IR Made available in DSpace on 2010-11-23T05:04:23Z (GMT). No. of bitstreams: 1 4456.pdf: 324894 bytes, checksum: 541e9744a39838fc1c9f65f30e340f00 (MD5) Previous issue date: 2005 国家重点基础研究发展计划,国家自然科学基金,国家高技术研究发展计划资助项目 Institute of Semiconductors, Chinese Academy of Sciences 国家重点基础研究发展计划,国家自然科学基金,国家高技术研究发展计划资助项目 |
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英语 |
Fonte |
Xie Hongyun;Zhou Fan;Wang Baojun;Yang Hua;Zhu Hongliang;Zhao Lingjuan;Wang Wei.Modified Holographic Exposure to Fabricate Varied Bragg Grating in an Identical Chip,半导体学报,2005,26(7):1287-1290 |
Palavras-Chave | #半导体材料 |
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期刊论文 |