高电荷态Xe离子与He原子碰撞中的电子转移过程研究

采用位置灵敏探测和飞行时间技术研究了高电荷态Xe离子 (q =1 5 ,1 7,1 9,2 1 ,2 3)与He原子碰撞中双电子转移截面与单电子转移截面比随入射离子电荷态的变化规律 .提出一步过程假定 ,对扩展的经典过垒 (ECB)模型进行了修正 ,利用修正模型计算得到的单、双电子转移绝对截面与Andersson等人和Selberg等人的实验结果很好符合 ,所得截面比与本实验得到的双电子转移截面与单电子俘获截面比较好符合

~(126)Xe~(q+)轰击Al表面产生的原子和离子光谱线

报道了高电荷态离子12 6Xeq + (6≤q≤ 30 )入射到固体Al表面产生的 2 0 0～ 10 0 0nm波段的发射光谱的实验结果。实验表明 ,在弱束流 (nA量级 )高电荷态的情况下 ,通过入射离子与固体靶的相互作用可有效地产生原子和离子的复杂组态间跃迁所形成的可见光波段的特征谱线 ,而且当入射离子的电荷剥离数超过一临界值后 (对Al,q=2 6 ) ,谱线相对强度突然显著增强。根据经典过垒模型COB(Theclassicover barriermodel) ,在入射离子的动能较小 (～ 1keV/u)的条件下 ,高电荷态离子与表面相互作用过程中电子的俘获或转移起着非常重要的作用 ,通过提高入射离子的电荷态可增强入射离子俘获电子的能力 ,显著增强激发粒子的光谱线的强度。

高能~(136)Xe离子辐照聚酰亚胺化学改性的电子能损效应

用1.755GeV136Xe离子在真空室温环境下辐照叠层聚酰亚胺薄膜,通过红外和紫外光谱测量研究了高电子能损离子辐照引起的化学降解及炔基产生效应。红外测量结果表明,典型官能团随辐照注量的增加指数降解,且径迹芯中所有官能团均遭到破坏,对应8.8(最小能损,第一层)和11.5keV/nm(最大能损,第五层)电子能损,136Xe辐照聚酰亚胺的平均降解半径分别为3.6和4.1nm。而相应能损条件下炔基的生成截面分别为5.6和5.9nm大于官能团的降解截面。紫外结果表明辐照引起的吸光度的改变随辐照注量线性增加,发色团的产生效率随电子能损的增大而增加。

高电荷态离子~(126)Xe~(q+)与Ti固体表面作用的激发光谱

报道用 15 0keV的高电荷态离子1 2 6 Xeq + (6≤q≤ 30 )轰击Ti固体表面产生 2 0 0— 10 0 0nm波段发射光谱的实验结果 .结果显示 ,用电荷态足够高的离子作光谱激发源 ,无需很强的束流强度 (nA量级 ) ,便可激发起样品表面的原子和离子在可见光波段的特征谱线 .当入射离子剥离度q >qc≈ 2 0时 ,Ti原子及其离子的特征谱线强度突然显著增强 ;不同金属靶 ,特征谱线突然增强的qc值不同 .理论分析表明 ,这与q大于此临界值后 ,单电子转移释放能量激发靶材料传导电子气体的表面等离激元密切相关 .

15.14 MeV/u ~(136)Xe离子引起的单粒子效应(英文)

研究了 1 5.1 4MeV/u136 　Xe离子在不同批次的 3 2k× 8bits静态存储器中所引起的单粒子效应 .获得了单粒子翻转和单粒子闭锁截面与入射角度的依赖关系 .将单粒子效应截面与灵敏区中沉积的能量相联系 ,而不是线性能量转移(LET)值 .估计了灵敏体积的深度和死层的厚度 .

Photoluminescence character of Xe ion irradiated sapphire

In the present work the photoluminescence (PL) character of sapphire implanted with 180 keV Xe and irradiated with 308 MeV Xe ions was studied. The virgin, implanted and irradiated samples were investigated by PL and Fourier transform infrared (FTIR) spectra measurements. The obtained PL spectra showed the maximum emission bands at 2.75, 3.0 and 3.26 eV for the implanted fluence of 1.0 x 10(15) ions/cm(2) and at 2.4 and 3.47 eV for the irradiated fluence of 1.0 x 10(13) ions/cm(2). The FTIR spectra showed a broaden absorption band between 460 and 630 cm(-1), indicating that strong damaged region formed in Al2O3.

Modification of ZnO films under high energy Xe-ion irradiations

ZnO films were deposited on (100) Si substrate by radio frequency magnetron sputtering. These films were irradiated at room temperature with 308 MeV Xe-ions to a fluence of 1.0 x 10(12), 1.0 x 10(13) or 1.0 x 10(14) Xe/cm(2). Then the samples were investigated using RBS, XRD, FESEM and PL analyses. The obtained experimental results showed that the deposited ZnO films were highly c-axis orientated and of high purity, 308 MeV Xe-ion irradiations could not change the c-axis oriented. The topography and PL properties of the ZnO films varied with increasing the Xe-ion irradiation fluence. For 1.0 x 10(13) or 1.0 x 10(14) Xe/cm(2) irradiated samples, surface cracks were observed. Furthermore, it was found that the 1.0 x 10(14) Xe/cm(2) irradiated sample exhibiting the strongest PL ability. The modification of structure and PL properties induced by 308 MeV Xe-ion irradiations were briefly discussed. (C) 2008 Elsevier B.V. All rights reserved.

X-ray spectra induced by Xe-129(q+) impacting the metal surface

Using the slow highly charged ions Xe-129(q+) (q = 25, 26, 27; initial kinetic T-0 <= 4.65 keV/a.u.) to impact Au surface, the Au atomic M alpha characteristic X-ray spectrum is induced. The result shows that as long as the charge state of projectile is high enough, the heavy atomic characteristic X-ray can be effectively excited even though the incident beam is very weak (nA magnitude), and the X-ray yield per ion is in the order of 10(-8) and increases with the kinetic energy and potential energy of projectile. By measuring the Au M alpha-X-ray spectra, Au atomic N-level lifetime is estimated at about 1.33x10(-18) s based on Heisenberg uncertainty relation.

Defect production in silicon carbide irradiated with Ne and Xe ions with energy of 2.3 MeV/amu

In the present work specimens of mono-crystalline silicon carbide (4H polytype) were irradiated to three successively increasing ion fluences ranging from 7.2 x 10(14) to 6.0 x 10(16) ions/cm(2) (corresponding to the peak displacement damage of 1, 4 and 13 dpa) with Ne and Xe ions respectively with the energy of 2.3 MeV/amu. The irradiated specimens were subsequently annealed at temperatures of 1173 and 1273 K. Defect structure was investigated with transmission electron microscopy (TEM) using a cross-sectional specimen preparation technique. The typical microstructures of the annealed specimens irradiated with Ne or Xe ions to high fluences are characterized by small gas bubbles in high concentration in the peak damage region and black dots and dislocation loops (located in the basal plane) in a shallower and broader depth region. Larger dislocation loops were observed in the Xe-ion irradiated specimen than in the Ne-ion irradiated specimen at the same peak damage level. The enhanced formation of dislocation loops in the case of Xe-ion irradiation is understandable by assuming stronger inclination of heavier inert-gas atoms to occupy substitute site in the peak damage region.

Color center formation in silica glass induced by high energy Fe and Xe ions

Silica glass samples were implanted with 1.157 GeV Fe-56 and 1.755 GeV Xe-136 ions to fluences range from 1 x 10(11) to 3.8 x 10(12) ions/cm(2). Virgin and irradiated samples were investigated by ultraviolet (UV) absorption from 3 to 6.4 eV and photoluminescence (PL) spectroscopy. The UV absorption investigation reveals the presence of various color centers (E' center, non-bridging oxygen hole center (NBOHC) and ODC(II)) appearing in the irradiated samples. It is found that the concentration of all color centers increase with the increase of fluence and tend to saturation at high fluence. Furthermore the concentration of E' center and that of NBOHC is approximately equal and both scale better with the energy deposition through processes of electronic stopping, indicating that E' center and NBOHC are mainly produced simultaneously from the scission of strained Si-O-Si bond by electronic excitation effects in heavy ion irradiated silica glass. The PL measurement shows three emissions peaked at about 4.28 eV (alpha band), 3.2 eV (beta band) and 2.67 eV (gamma band) when excited at 5 eV. The intensities of alpha and gamma bands increase with the increase of fluence and tend to saturation at high fluence. The intensity of beta band is at its maximum in virgin silica glass and it is reduced on increasing the ions fluence. It is further confirmed that nuclear energy loss processes determine the production of alpha and gamma bands and electronic energy loss processes determine the bleaching of beta band in heavy ion irradiated silica glass. (c) 2009 Elsevier B.V. All rights reserved.

94MeV Xe离子辐照引起的薄膜硅光学带隙变化研究；Modification of Optical Bandgap of Thin Silicon Films Induced by 94 MeV Xe Ion Irradiation

室温下,用94MeV的Xe离子辐照纳米晶和非晶硅薄膜以及单晶硅样品,辐照量分别为1.0×1011,1.0×1012和1.0×1013ions/cm2。所有样品均在室温下用UV/VIS/NIR光谱仪进行检测分析。通过对比研究了纳米晶、非晶、单晶硅样品的光学带隙随Xe离子辐照量的变化。结果表明,不同结构的硅材料中Xe离子辐照引起的光学带隙变化规律差异显著:随着Xe离子辐照量的增加,单晶硅的光学带隙基本不变,非晶硅薄膜的光学带隙由初始的约1.78eV逐渐减小到约1.54eV,而纳米晶硅薄膜的光学带隙则由初始的约1.50eV快速增大至约1.81eV,然后再减小至约1.67eV。对硅材料结构影响辐照效应的机理进行了初步探讨。

X-ray spectrum emitted by the impact of Xe-129(q+) on Mo surface

We studied the characteristic X-ray spectra produced by the interaction of highly charged ions of X-129(q+) (q =25, 26, 27) with surface of metallic Mo. The experimental result shows that highly charged ions can excite the characteristic X-ray spectra of L-shell of Mo when the beam' s intensity is not more than 120 nA. The X-ray yield of single ion reaches a quantitative level of 10(-8) and increases with the increment of the ion' s kinetic energy and ionic charge (potential energy). By measuring the X-ray spectra of Mo-L alpha(1) the M-level lifetime of Mo atom is estimated by using Heisenberg uncertainty relation.

~(129)Xe~(q+)激发Mo表面产生的X射线谱；X-ray spectrum emitted by the impact of ~(129)Xe~(q+) on Mo surface

研究了高电荷态离子129Xeq+(q=25,26,27)入射金属Mo表面产生的特征X射线谱.实验结果表明,在束流强度小于120nA条件下,高电荷态离子129Xeq+可以激发Mo的L壳层特征X射线谱.单离子X射线相对产额可达10-8量级,特征X射线的相对产额随入射离子的动能和电荷态(势能)的增加而增加.通过Mo原子的Lα1特征X射线谱,利用Heisenberg不确定关系对Mo原子的第M能级寿命进行了估算.

交联XE－60和PEG－20M极性固定相非晶硅膜改性弹性玻璃毛细管柱研究

研究了交联ＸＥ－６０和ＰＥＧ－２０Ｍ极性固定相非晶硅膜改性弹性玻璃毛细管柱，在适当的温度下，用过氧化二异丙苯（ＤＣＵＰ）游离基引发交联，成功地制备了ＸＥ－６０和ＰＥＧ－２０Ｍ极性柱，它们均具有柱效高、惰性好、化学稳定性好和耐溶剂、抗腐蚀、耐高温等性能，是一种新型的极性交联柱。

涂渍FFAP、PEG-20M、XE-60硅膜改性弹性玻璃毛细管柱的研制

硅膜改性弹性玻璃毛细管柱做为一种新柱型,它具有类似弹性石英柱的柔性和惰性,也具有玻璃柱制作容易、材质易得的优点。硅膜做为固定相载体的色谱特性研究目前报道还很少,非极性硅酮相在其上的交联我们曾做过报