Numerical analysis and comparison of three metal-oxide-type super-resolution near field structures

Based on the Fresnel-Kirchkoff diffraction theory, we build up a Gaussian diffraction model of metal-oxide-type super-resolution near field structure (super-RENS), which can describe far field optical properties. The spectral contrast induced by refractive index and the structural changes in AgOx, PtOx and PdOx thin films, which are the key functional layers in super-RENS, are studied by using this model. Comparison results indicate that the spectral contrast intensively on laser-induced distribution and change of the refractive index in the metal-oxide films. The readout mechanism of the metal-oxide-type super-RENS optical disc is further clarified. This Gaussian diffraction model can be used as a simple and effective method for choosing proper active materials in super-RENS.

激光辐照引起Ge2Sb2Te5非晶态薄膜的电/光性质变化

研究了激光辐照引起Ge2Sb2Te5非晶态薄膜的电/光性质变化,当激光功率为580mW时薄膜的方块电阻有四个数量级（10^7～10^3Ω/□）的突变;对电阻发生突变前、中、后的三个样品进行了XRD测试,结果表明,随着激光功率的增大,薄膜由非晶态向晶态转变,用椭偏仪测试了结构转变前、中、后三个样品的光学常数,在可见光范围内薄膜的光学常数在波长相同情况下有：n（非晶态）〉n（中间态）〉n（晶态）,k（晶态）〉k（中间态）〉k（非晶态）,α（晶态）〉α（中间态）〉α（非晶态）,结合电阻变化曲线和XRD图谱讨论了激光辐照Ge2Sb2Te5非晶态薄膜的电/光性质变化同激光功率和结构转变之间的关系.

Temperature dependence of thermal properties of Ag8In14Sb55Te23 phase-change memory materials

The dependence of thermal properties of Ag8In14Sb55Te23 phase-change memory materials in crystalline and amorphous states on temperature was measured and analyzed. The results show that in the crystalline state, the thermal properties monotonically decrease with the temperature and present obvious crystalline semiconductor characteristics. The heat capacity, thermal diffusivity, and thermal conductivity decrease from 0.35 J/g K, 1.85 mm(2)/s, and 4.0 W/m K at 300 K to 0.025 J/g K, 1.475 mm(2)/s, and 0.25 W/m K at 600 K, respectively. In the amorphous state, while the dependence of thermal properties on temperature does not present significant changes, the materials retain the glass-like thermal characteristics. Within the temperature range from 320 K to 440 K, the heat capacity fluctuates between 0.27 J/g K and 0.075 J/g K, the thermal diffusivity basically maintains at 0.525 mm(2)/s, and the thermal conductivity decreases from 1.02 W/m K at 320 K to 0.2 W/m K at 440 K. Whether in the crystalline or amorphous state, Ag8In14Sb55Te23 are more thermally active than Ge2Sb2Te5, that is, the Ag8In14Sb55Te23 composites bear stronger thermal conduction and diffusion than the Ge2Sb2Te5 phase-change memory materials.

激光诱导等离子体开关控制脉宽实验研究

利用激光诱导等离子体开关技术，在1064nm的Nd：YAG固体激光器上获得了脉宽4．4～6．4ns的短脉冲激光输出。激光电离空气产生的等离子体开关控制脉冲宽度时，聚焦透镜焦距越短，压缩后的脉宽越窄，但激光能量损耗越大。压缩后的激光脉宽与激光能量近似成双曲线关系。在控制脉宽光路的焦点处放置带孔的Cu薄片可抑制等离子体的扩散，得到了脉宽最短可达4．4ns的激光输出。

355 nm脉冲激光诱导等离子体开关削波

利用激光诱导等离子体开关技术,对355 nm脉冲激光自削波进行了实验和理论研究。分别采用5种不同焦距的透镜,集中讨论了透镜焦距及激光器输出单脉冲能量对脉宽压缩的影响,发现采用焦距为200 mm的透镜能够获得最佳的脉冲压缩效果。在聚焦透镜焦距200 mm,单脉冲能量160 mJ时,获得最短脉宽3.47 ns；在激光电离Cu小孔内壁表面及空气击穿共同作用下,获得了脉宽最短达2.11 ns的脉冲激光输出。此外,根据实验结果得到了355 nm激光空气击穿阈值,并与理论估算值进行比较,两者结果较为一致。

脉冲激光晶化非晶硅薄膜的有限差分模拟

根据热传导原理，建立了脉冲激光晶化非晶硅薄膜的理论模型。运用有限差分方法研究了不同激光波长、能量密度等因素对薄膜温度变化及相变过程的影响。计算了不同波长激光器对厚度500nm非晶硅晶化的阈值能量密度。结果发现，准分子晶化的阈值能量密度最低，但是在同样的能量密度下，熔融深度却不及使用更长波长的激光器。计算并分析了升高衬底温度对结晶速度和晶粒尺寸的影响，模拟结果较好地验证了实验结论和规律。

单束飞秒激光在氧化铝晶体中诱导自组装微米点阵

报道了单束飞秒激光在氧化铝晶体中诱导自组装微米点阵的有关研究进展。当单束飞秒激光被透镜聚焦到氧化铝晶体的内部某固定点， 微米点阵就在聚焦点的下方自动生成。我们发现能否产生自组装点阵和光束的聚焦点距离样品表面的深度有关。通过比较在氧化铝晶体和氟化钙晶体中能够产生点阵的深度，我们发现在氧化铝中较浅的位置即能诱导出点阵，而在氟化钙中则要求深度较深。具体的机理在文中进行了讨论。

飞秒激光辐照K9玻璃引起的暗化和折射率变化

对不同辐照条件下近红外飞秒激光在K9玻璃内部诱导产生的暗化现象和永久性折射率改变进行了实验研究。通过辐照前后的显微镜图片、吸收光谱、电子自旋共振谱(ESR)以及激光衍射实验，分析了K9玻璃中暗化现象产生的微观过程，发现暗化是由诱导产生的空穴型色心引起的。暗化程度和折射率改变随激光强度、扫描速度、扫描行间距变化而变化。光致色心的形成与非线性电离有关。对折射率永久性改变进行了简单说明，其机理仍在探索中。

飞秒激光相干场诱导材料功能微结构

飞秒激光在整个脉冲宽度内具有极好的相干性，因而当从同一光束分出的两束或两束以上的光束时间与空间上实现相互叠加时将会形成强度周期性调制的电磁场．这种周期调制的电磁场与材料产生相互作用，能诱导出相应的周期微结构．最近通过两束或两束以上飞秒激光干涉诱导功能微结构得到了广泛研究．文章综合了国内外飞秒激光研究小组在干涉诱导微结构方面的一些最新成果以及作者在这方面开展的工作，对飞秒激光干涉技术的原理及其在诱导微结构方面的应用进行了介绍．

A New theory for evaluating the number density of inclusions in films

A new formulation derived from thermal characters of inclusions and host films for estimating laser induced damage threshold has been deduced. This formulation is applicable for dielectric films when they are irradiated by laser beam with pulse width longer than tens picoseconds. This formulation can interpret the relationship between pulse-width and damage threshold energy density of laser pulse obtained experimentally. Using this formulation, we can analyze which kind of inclusion is the most harmful inclusion. Combining it with fractal distribution of inclusions, we have obtained an equation which describes relationship between number density of inclusions and damage probability. Using this equation, according to damage probability and corresponding laser energy density, we can evaluate the number density and distribution in size dimension of the most harmful inclusions. (c) 2005 Elsevier B.V. All rights reserved.

应用离子后处理技术提高薄膜激光损伤阈值

利用电子束热蒸发方法在K9玻璃基底上沉积氧化锆薄膜,并对其中一些样品用低能O2^+进行了后处理.采用表面热透镜技术测量薄膜样品表面弱吸收,采用显微镜观察样品离子后处理前后的显微缺陷密度.测试结果表明:经离子后处理样品表面的缺陷密度从18.6/mm^2降低到6.2/mm^2,且其激光损伤阈值从15.9 J/cm^2提高到23.1 J/cm^2,样品的平均吸收率从处理前的1.147×10^-4降低到处理后的9.56×10^-5.通过对处理前后样品的表面微缺陷密度、吸收率及损伤形貌等的分析发现:离子后处理可以降

Subsurface damage in optical substrates

The origin, character, analysis and treatment of subsurface damage (SSD) were summarized in this paper. SSD, which was introduced to substrates by manufacture processes, may bring about the decrease of laser-induced damage threshold (LIDT) of substrates and thin films. Nondestructive evaluation (NDE) methods for the measurement of SSD were used extensively because of their conveniences and reliabilities. The principle, experimental setup and some other technological details were given for total internal reflection microscopy (TIRM), high-frequency scanning acoustic microscopy (HFSAM) and laser-modulated scattering (LMS). However, the spatial resolution, probing depth and theoretic models of these NDE methods demanded further studies. Furthermore, effective surface treatments for minimizing or eliminating SSD were also presented in this paper. Both advantages and disadvantages of ion beam etching (IBE) and magnetorheological finishing (MRF) were discussed. Finally, the key problems and research directions of SSD were summarized. (c) 2005 Elsevier GmbH. All rights reserved.

氧分压对ZrO2薄膜激光损伤阈值的影响

在不同的氧分压下用电子束热蒸发的方法制备了ZrO2薄膜。分别通过X射线衍射、光学光谱、热透镜技术、抗激光辐照等测试，对所制备样品的微结构、折射率、吸收率及激光损伤阈值进行了测量。实验结果表明，薄膜中晶粒主要是四方相为主的多晶结构，并且随着氧分压的增加，结晶度、折射率以及弱吸收均逐渐降低。薄膜的激光损伤阈值开始随着氧分压增加从18．5J／cm^2逐渐增加，氧分压为9×10^-3Pa时达到最大，值为26．7J／cm^2，氧分压再增加时则又降低到17．5J／cm^2。由此可见，氧分压引起的薄膜微结构变化是ZrO

Design and properties analysis of multi-layer dielectric used in pulse compressor gratings

Used in chirped-pulse amplification system and based on multi-layer thin film stack, pulse compressor gratings (PCG) are etched by ion-beam and holographic techniques. Diffraction efficiency and laser-induced damage threshold rely on the structural parameters of gratings. On the other hand, they depend greatly on the design of multi-layer. A theoretic design is given for dielectric multi-layer, which is exposed at 413.1 nm and used at 1053 nm. The influences of coating design on optical characters are described in detail. The analysis shows that a coating stack of H3L (H2L) (boolean AND) 9H0.5L2.01H meets the specifications of PCG well. And there is good agreement of transmission between experimental and the theoretic design. (c) 2005 Elsevier GmbH. All rights reserved.

脉宽压缩光栅用的多层膜设计和性能分析

应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底，利用全息干涉技术和离子束技术刻蚀而成。脉宽压缩光栅的衍射效率和抗激光损伤阈值一方面依赖于光栅结构的设计，另一方面很大程度上取决于作为基底的多层膜的设计。给出了以413．1nm作为写入波长，1053nm作为使用波长的多层介质光栅膜的设计．样品在ZZS-800F、型真空镀膜机上采用电子束蒸发方式沉积而成，并给出了膜系结构对光学性能影响因素的详细分析，结果表明膜系H3L(H2L)^9H0．5L2．03H满足光栅膜的指标。给出了样品光学特性测试，其使用波