氧分压对ZrO2薄膜激光损伤阈值的影响

在不同的氧分压下用电子束热蒸发的方法制备了ZrO2薄膜。分别通过X射线衍射、光学光谱、热透镜技术、抗激光辐照等测试，对所制备样品的微结构、折射率、吸收率及激光损伤阈值进行了测量。实验结果表明，薄膜中晶粒主要是四方相为主的多晶结构，并且随着氧分压的增加，结晶度、折射率以及弱吸收均逐渐降低。薄膜的激光损伤阈值开始随着氧分压增加从18．5J／cm^2逐渐增加，氧分压为9×10^-3Pa时达到最大，值为26．7J／cm^2，氧分压再增加时则又降低到17．5J／cm^2。由此可见，氧分压引起的薄膜微结构变化是ZrO

ZrO_2 films were prepared by electron beam evaporation method at different oxygen partial pressures. Through the measurement of XRD, surface thermal lensing technique, optical spectra and laser irradiate resistance testing, the microstructure, refractive index, absorption and laser induced damage threshold were measured. The experiment results indicate that the films are multi-crystal, and the tetragonal is dominant. With the oxygen partial pressure increasing, the crystalline, refractive index and weak absorption are all decreasing. The laser induced damage threshold (LIDT) increase with the oxygen partial pressure increase at first, and the LIDT reaches the maximum value 26.7 J/cm~2 nearby oxygen partial pressure of 9×10~(-3) Pa, but the LIDT decreases when oxygen partial pressure continues increasing. So the oxygen partial pressure induced microstructure changing is the main factor that leads to the LIDT variation.