脉宽压缩光栅用的多层膜设计和性能分析

应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底，利用全息干涉技术和离子束技术刻蚀而成。脉宽压缩光栅的衍射效率和抗激光损伤阈值一方面依赖于光栅结构的设计，另一方面很大程度上取决于作为基底的多层膜的设计。给出了以413．1nm作为写入波长，1053nm作为使用波长的多层介质光栅膜的设计．样品在ZZS-800F、型真空镀膜机上采用电子束蒸发方式沉积而成，并给出了膜系结构对光学性能影响因素的详细分析，结果表明膜系H3L(H2L)^9H0．5L2．03H满足光栅膜的指标。给出了样品光学特性测试，其使用波

Pulse compressed gratings (PCG) used in chirped-pulse amplification system and based on multi-layer thin film stack are etched with ion-beam and holographic techniques. Diffraction efficiency and laser induced damage threshold are determined by the structure of the parameter of gratings, on the other hand, by the design of multi-layer dielectric greatly. A multi-layer dielectric stack design used at 1053 nm and exposed at 413.1 nm is given. The influence of the structure on the optical character is described in detail. The analysis shows that H3L (H2L)9H0.5L2.03H films meet the requirements of PCG. The sample was prepared by ZZX-800 vacuum machine with e-beam gun, and its optical character is given. Transmittance is less than 0.5% at using wavelength and above 90% at exposing wavelength. Results show that the optical property is excellent and there is a good agreement between the measured transmittance and the design.