Design and properties analysis of multi-layer dielectric used in pulse compressor gratings


Autoria(s): Kong WJ; Shen ZC; Shen J; 邵建达; 范正修
Data(s)

2005

Resumo

Used in chirped-pulse amplification system and based on multi-layer thin film stack, pulse compressor gratings (PCG) are etched by ion-beam and holographic techniques. Diffraction efficiency and laser-induced damage threshold rely on the structural parameters of gratings. On the other hand, they depend greatly on the design of multi-layer. A theoretic design is given for dielectric multi-layer, which is exposed at 413.1 nm and used at 1053 nm. The influences of coating design on optical characters are described in detail. The analysis shows that a coating stack of H3L (H2L) (boolean AND) 9H0.5L2.01H meets the specifications of PCG well. And there is good agreement of transmission between experimental and the theoretic design. (c) 2005 Elsevier GmbH. All rights reserved.

Identificador

http://ir.siom.ac.cn/handle/181231/4178

http://www.irgrid.ac.cn/handle/1471x/12666

Idioma(s)

英语

Fonte

Kong WJ;Shen ZC;Shen J;邵建达;范正修.,Optik,2005,116(7):325-330

Palavras-Chave #光学薄膜 #pulse compressor gratings #multi-layer dielectric #optic properties analysis #optic film stack design
Tipo

期刊论文