MOCVD growth of cubic GaN: Materials and devices
Data(s) |
2000
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Resumo |
Many impressive progresses have been made recently on the growth of cubic-phase GaN by MBE and MOCVD. In this paper, some of our recent progress will be reviewed, including the growth of high quality cubic InGaN films, InGaN/GaN heterostructure blue and green LEDs. Cubic-phase GaN films were grown on GaAs (100) substrates by MOCVD. Growth conditions were optimized to obtain pure cubic phase GaN films up to a thickness of 4 mum. An anomalous compressive strain was found in the as-grown GaN films in spite of a smaller lattice constant for GaN compared with that of GaAs substrates. The photoluminescence FWHM of high quality InGaN epilayers was less than 100 meV The InGaN/GaN heterostructure blue LED has intense electroluminescence with a FWHM of 20 nm. Many impressive progresses have been made recently on the growth of cubic-phase GaN by MBE and MOCVD. In this paper, some of our recent progress will be reviewed, including the growth of high quality cubic InGaN films, InGaN/GaN heterostructure blue and green LEDs. Cubic-phase GaN films were grown on GaAs (100) substrates by MOCVD. Growth conditions were optimized to obtain pure cubic phase GaN films up to a thickness of 4 mum. An anomalous compressive strain was found in the as-grown GaN films in spite of a smaller lattice constant for GaN compared with that of GaAs substrates. The photoluminescence FWHM of high quality InGaN epilayers was less than 100 meV The InGaN/GaN heterostructure blue LED has intense electroluminescence with a FWHM of 20 nm. 于2010-10-29批量导入 Made available in DSpace on 2010-10-29T06:36:51Z (GMT). No. of bitstreams: 1 2882.pdf: 389364 bytes, checksum: 18fedc6e44df1c67e27f7649f4536f40 (MD5) Previous issue date: 2000 Japan Soc Appl Phys, Solid State Phys & Applicat Div.; Japan Soc Promot Sci, Comm Short Wavelength Optoelectr Devices, 162.; Japan Soc Promot Sci, Comm Convers Light & Elect, 125. Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Natl Res Ctr Optoelect, Beijing 100083, Peoples R China Japan Soc Appl Phys, Solid State Phys & Applicat Div.; Japan Soc Promot Sci, Comm Short Wavelength Optoelectr Devices, 162.; Japan Soc Promot Sci, Comm Convers Light & Elect, 125. |
Identificador | |
Idioma(s) |
英语 |
Publicador |
INST PURE APPLIED PHYSICS DAINI TOYOKAIJI BLDG 24-8 SHINBASHI 4 CHOME, TOKYO, 105-0004, JAPAN |
Fonte |
Yang H; Zhang SM; Xu DP; Li SF; Zhao DG; Fu Y; Sun YP; Feng ZH; Zheng LX .MOCVD growth of cubic GaN: Materials and devices .见:INST PURE APPLIED PHYSICS .PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 1,DAINI TOYOKAIJI BLDG 24-8 SHINBASHI 4 CHOME, TOKYO, 105-0004, JAPAN ,2000,64-69 |
Palavras-Chave | #半导体材料 #MOCVD #GaN #InGaN #cubic #LED #CHEMICAL-VAPOR-DEPOSITION #MOLECULAR-BEAM EPITAXY #GALLIUM NITRIDE #PHASE EPITAXY #INGAN FILMS #ELECTROLUMINESCENCE #ZINCBLENDE #WURTZITE #MBE |
Tipo |
会议论文 |