MOCVD growth of cubic GaN: Materials and devices


Autoria(s): Yang H; Zhang SM; Xu DP; Li SF; Zhao DG; Fu Y; Sun YP; Feng ZH; Zheng LX
Data(s)

2000

Resumo

Many impressive progresses have been made recently on the growth of cubic-phase GaN by MBE and MOCVD. In this paper, some of our recent progress will be reviewed, including the growth of high quality cubic InGaN films, InGaN/GaN heterostructure blue and green LEDs. Cubic-phase GaN films were grown on GaAs (100) substrates by MOCVD. Growth conditions were optimized to obtain pure cubic phase GaN films up to a thickness of 4 mum. An anomalous compressive strain was found in the as-grown GaN films in spite of a smaller lattice constant for GaN compared with that of GaAs substrates. The photoluminescence FWHM of high quality InGaN epilayers was less than 100 meV The InGaN/GaN heterostructure blue LED has intense electroluminescence with a FWHM of 20 nm.

Many impressive progresses have been made recently on the growth of cubic-phase GaN by MBE and MOCVD. In this paper, some of our recent progress will be reviewed, including the growth of high quality cubic InGaN films, InGaN/GaN heterostructure blue and green LEDs. Cubic-phase GaN films were grown on GaAs (100) substrates by MOCVD. Growth conditions were optimized to obtain pure cubic phase GaN films up to a thickness of 4 mum. An anomalous compressive strain was found in the as-grown GaN films in spite of a smaller lattice constant for GaN compared with that of GaAs substrates. The photoluminescence FWHM of high quality InGaN epilayers was less than 100 meV The InGaN/GaN heterostructure blue LED has intense electroluminescence with a FWHM of 20 nm.

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Japan Soc Appl Phys, Solid State Phys & Applicat Div.; Japan Soc Promot Sci, Comm Short Wavelength Optoelectr Devices, 162.; Japan Soc Promot Sci, Comm Convers Light & Elect, 125.

Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Natl Res Ctr Optoelect, Beijing 100083, Peoples R China

Japan Soc Appl Phys, Solid State Phys & Applicat Div.; Japan Soc Promot Sci, Comm Short Wavelength Optoelectr Devices, 162.; Japan Soc Promot Sci, Comm Convers Light & Elect, 125.

Identificador

http://ir.semi.ac.cn/handle/172111/13709

http://www.irgrid.ac.cn/handle/1471x/105036

Idioma(s)

英语

Publicador

INST PURE APPLIED PHYSICS

DAINI TOYOKAIJI BLDG 24-8 SHINBASHI 4 CHOME, TOKYO, 105-0004, JAPAN

Fonte

Yang H; Zhang SM; Xu DP; Li SF; Zhao DG; Fu Y; Sun YP; Feng ZH; Zheng LX .MOCVD growth of cubic GaN: Materials and devices .见:INST PURE APPLIED PHYSICS .PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 1,DAINI TOYOKAIJI BLDG 24-8 SHINBASHI 4 CHOME, TOKYO, 105-0004, JAPAN ,2000,64-69

Palavras-Chave #半导体材料 #MOCVD #GaN #InGaN #cubic #LED #CHEMICAL-VAPOR-DEPOSITION #MOLECULAR-BEAM EPITAXY #GALLIUM NITRIDE #PHASE EPITAXY #INGAN FILMS #ELECTROLUMINESCENCE #ZINCBLENDE #WURTZITE #MBE
Tipo

会议论文