Heavy metal pollution in China: Origin, pattern and control

Goal, Scope and Background. Heavy metal is among one of the pollutants, which cause severe threats to humans and the environment in China. The aim of the present review is to make information on the source of heavy metal pollution, distribution of heavy metals in the environment, and measures of pollution control accessible internationally, which are mostly published in Chinese. Methods. Information from scientific journals, university journals and governmental releases are compiled focusing mainly on Cd, Cu, Pb and Zn. Partly Al, As, Cr, Fe, Hg, Mn and Ni are included also in part as well. Results and Discussion. In soil, the average contents of Cd, Cu, Pb and Zn are 0.097, 22.6, 26.0 and 74.2 mg/kg, respectively. In the water of. the Yangtze River Basin, the concentrations of Cd, Cu, Pb and Zn are 0.080, 7.91, 15.7 and 18.7 pg/L, respectively. In reference to human activities, the heavy metal pollution comes from three sources: industrial emission, wastewater and solid waste. The environment such as soil, water and air were polluted by heavy metals in some cases. The contents of Cd, Cu, Pb and Zn even reach 3.16, 99.3, 84.1 and 147 mg/kg, respectively, in the soils of a wastewater irrigation zone. These contaminants pollute drinking water and food, and threaten human health. Some diseases resulting from pollution of geological and environmental origin, were observed with long-term and non-reversible effects. Conclusions. In China, the geological background level of heavy metal is low, but with the activity of humans, soil, water, air, and plants are polluted by heavy metals in some cases and even affect human health through the food chain. Recommendations and Outlook. To remediate and improve environmental quality is a long strategy for the polluted area to keep humans and animals healthy. Phytoremediation would be an effective technique to remediate the heavy metal pollutions.

Multiple valley couplings in nanometer Si metal-oxide-semiconductor field-effect transistors

We investigate the couplings between different energy band valleys in a metal-oxide-semiconductor field-effect transistor (MOSFET) device using self-consistent calculations of million-atom Schrodinger-Poisson equations. Atomistic empirical pseudopotentials are used to describe the device Hamiltonian and the underlying bulk band structure. The MOSFET device is under nonequilibrium condition with a source-drain bias up to 2 V and a gate potential close to the threshold potential. We find that all the intervalley couplings are small, with the coupling constants less than 3 meV. As a result, the system eigenstates derived from different bulk valleys can be calculated separately. This will significantly reduce the simulation time because the diagonalization of the Hamiltonian matrix scales as the third power of the total number of basis functions. (C) 2008 American Institute of Physics.

Quantum mechanical simulation of nanosized metal-oxide-semiconductor field-effect transistor using empirical pseudopotentials: A comparison for charge density occupation methods

The atomistic pseudopotential quantum mechanical calculations are used to study the transport in million atom nanosized metal-oxide-semiconductor field-effect transistors. In the charge self-consistent calculation, the quantum mechanical eigenstates of closed systems instead of scattering states of open systems are calculated. The question of how to use these eigenstates to simulate a nonequilibrium system, and how to calculate the electric currents, is addressed. Two methods to occupy the electron eigenstates to yield the charge density in a nonequilibrium condition are tested and compared. One is a partition method and another is a quasi-Fermi level method. Two methods are also used to evaluate the current: one uses the ballistic and tunneling current approximation, another uses the drift-diffusion method. (C) 2009 American Institute of Physics. [doi:10.1063/1.3248262]

Single-electron multiple-valued memory using ultra-small floating gate metal-oxide-semiconductor field effect transistor

This paper proposes a novel single-electron multiple-valued memory. It is a metal-oxide-semiconductor field effect transistor (MOS)-type memory with multiple separate control gates and floating gate layer, which consists of nano-crystal grains. The electron can tunnel among the grains (floating gates) and between the floating gate layer and the MOS channel. The memory can realize operations of 'write', 'store' and 'erase' of multiple-valued signals exceeding three values by controlling the single electron tunneling behavior. We use Monte Carlo method to simulate the operation of single-electron four-valued memory. The simulation results show that it can operate well at room temperature.

Transfer and detection of single electrons using metal-oxide-semiconductor field-effect transistors

A single-electron turnstile and electrometer circuit was fabricated on a silicon-on-insulator substrate. The turnstile, which is operated by opening and closing two metal-oxide-semiconductor field-effect transistors (MOSFETs) alternately, allows current quantization at 20 K due to single-electron transfer. Another MOSFET is placed at the drain side of the turnstile to form an electron storage island. Therefore, one-by-one electron entrance into the storage island from the turnstile can be detected as an abrupt change in the current of the electrometer, which is placed near the storage island and electrically coupled to it. The correspondence between the quantized current and the single-electron counting was confirmed.

Origin of flat-band voltage sharp roll-off in metal gate/high-k/ultrathin- SiO2/Si p-channel metal-oxide-semiconductor stacks

The origin of the flat band voltage roll-off (V-FB roll-off) in metal gate/high-k/ultrathin-SiO2/Si metal-oxide-semiconductor stacks is analyzed and a model describing the role of the dipoles at the SiO2/Si interface on the V-FB sharp roll-off is proposed. The V-FB sharp roll-off appears when the thickness of the SiO2 interlayer diminishes to below the oxygen diffusion depth. The results derived using our model agree well with experimental data and provide insights to the mechanism of the V-FB sharp roll-off.