GSMBE growth and characterization of InxGa1-xAs/InP strained-layer MQWs in a P-i-N configuration

InxGa1-xAs/InP (0.39 less than or equal to x less than or equal to 0.68) strained-layer quantum wells having 20 wells with thickness of 50 Angstrom in a P-i-N configuration were grown by gas source molecular beam epitaxy (GSMBE). High-resolution X-ray diffraction rocking curves show the presence of up to seven orders of sharp and intense satellite reflection, indicative of the structural perfection of the samples. Low-temperature photoluminescence and low-temperature absorption spectra were used to determine the exciton transition energies as a function of strain. Good agreement is achieved between exciton transition energies obtained experimentally at low temperature with those calculated using the deformation potential theory.

穿透型V形坑对GaN基p-i-n结构紫外探测器反向漏电的影响

研究了GaN基p-i-n(p-AlGaN/i-GaN,n-GaN)结构紫外探测器的漏电机理.实验发现,在位错密度几乎相同的情况下,基于表面有较高密度的V形坑缺陷材料制备的器件表现出较高的反向漏电.进一步的SEM测试发现,这种V形坑穿透到有源区i-GaN、甚至n-GaN层.在制备p-AlGaN电极时,许多金属会落在V形坑中,从而与i-GaN形成了肖特基接触.有些甚至直接和n-GaN形成欧姆接触.正是由于并联的肖特基接触和欧姆接触的存在导致了漏电的增加.

以弱p���为有源区的新型p-n结构GaN紫外探测器

提出了以弱p���(p~--GaN)为有源区的p-n结构GaN紫外探测器.由于弱p���层的载流子浓度较低,很容易增加耗尽区的宽度,从而可以增加器件的量子效率.通过模拟计算,研究了金属与p~--GaN层的肖特基接触势垒高度、p~--GaN层厚度等参数对器件性能的影响.研究结果表明,降低金属与p~--GaN层的接触势垒高度、适当减小p~--GaN层厚度能够实现有源层方向单一的内建电场,从而提高器件的量子效率.要制备出具有良好性能的p-n结构紫外探测器,必须减小p~--GaN层厚度,降低金属与p~--GaN层的接触势垒高度.