GSMBE growth and characterization of InxGa1-xAs/InP strained-layer MQWs in a P-i-N configuration


Autoria(s): Wang XL; Sun DZ; Kong MY; Hou X; Zeng YP
Data(s)

1997

Resumo

InxGa1-xAs/InP (0.39 less than or equal to x less than or equal to 0.68) strained-layer quantum wells having 20 wells with thickness of 50 Angstrom in a P-i-N configuration were grown by gas source molecular beam epitaxy (GSMBE). High-resolution X-ray diffraction rocking curves show the presence of up to seven orders of sharp and intense satellite reflection, indicative of the structural perfection of the samples. Low-temperature photoluminescence and low-temperature absorption spectra were used to determine the exciton transition energies as a function of strain. Good agreement is achieved between exciton transition energies obtained experimentally at low temperature with those calculated using the deformation potential theory.

Identificador

http://ir.semi.ac.cn/handle/172111/15151

http://www.irgrid.ac.cn/handle/1471x/101470

Idioma(s)

英语

Fonte

Wang XL; Sun DZ; Kong MY; Hou X; Zeng YP .GSMBE growth and characterization of InxGa1-xAs/InP strained-layer MQWs in a P-i-N configuration ,JOURNAL OF CRYSTAL GROWTH,1997,175(0):1254-1258

Palavras-Chave #半导体材料 #quantum wells #molecular beam epitaxy #InGaAs/InP #optical properties #QUANTUM-WELL STRUCTURES #MOLECULAR-BEAM EPITAXY #ROOM-TEMPERATURE #MODULATION #EXCITONS #LASERS #SHIFT
Tipo

期刊论文