GSMBE growth and characterization of InxGa1-xAs/InP strained-layer MQWs in a P-i-N configuration
Data(s) |
1997
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Resumo |
InxGa1-xAs/InP (0.39 less than or equal to x less than or equal to 0.68) strained-layer quantum wells having 20 wells with thickness of 50 Angstrom in a P-i-N configuration were grown by gas source molecular beam epitaxy (GSMBE). High-resolution X-ray diffraction rocking curves show the presence of up to seven orders of sharp and intense satellite reflection, indicative of the structural perfection of the samples. Low-temperature photoluminescence and low-temperature absorption spectra were used to determine the exciton transition energies as a function of strain. Good agreement is achieved between exciton transition energies obtained experimentally at low temperature with those calculated using the deformation potential theory. |
Identificador | |
Idioma(s) |
英语 |
Fonte |
Wang XL; Sun DZ; Kong MY; Hou X; Zeng YP .GSMBE growth and characterization of InxGa1-xAs/InP strained-layer MQWs in a P-i-N configuration ,JOURNAL OF CRYSTAL GROWTH,1997,175(0):1254-1258 |
Palavras-Chave | #半导体材料 #quantum wells #molecular beam epitaxy #InGaAs/InP #optical properties #QUANTUM-WELL STRUCTURES #MOLECULAR-BEAM EPITAXY #ROOM-TEMPERATURE #MODULATION #EXCITONS #LASERS #SHIFT |
Tipo |
期刊论文 |