III-V���半导体的喇曼散射研究

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

六角III-V���化物量子阱的电子结构和光学性质

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

III-V���半导体低维结构材料的平面光学各向异性

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

III－V���氮化物的生长及其光学性质

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

III-V���半导体低维结构与新型合金材料的光学性质

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

新型EA调制器研究及V���硅基平台设计

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

Ш–V 族半导体光子晶体激光器关键技术研究

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

III-V-N 半导体材料光学性质的研究

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

III-V���低维半导体材料偏振相关的光学性质

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-04-13T11:45:31Z

Optically controlled quantum dot gated transistors with high on/off ratio

We report the design and fabrication of InAs quantum dot gated transistors, which are normally-on, where the channel current can be switched off by laser illumination. Laser light at 650 nm with a power of 850 pW switches the channel current from 5 mu A to 2 pA, resulting in an on/off ratio of more than 60 dB. The switch-off mechanism and carrier dynamics are analyzed with simulated band structure.

半导体激光器V���槽固定光纤同轴器件

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5)

使多个V���光伏器件组件连接的方法

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5)

硅V���槽板及利用硅V���槽板装配微丝电极阵列的方法

Submitted by zhangdi (zhangdi@red.semi.ac.cn) on 2009-06-04T08:36:34Z No. of bitstreams: 1 dspace.cfg: 33388 bytes, checksum: ac9630d3fdb36a155287a049e8b34eb7 (MD5)

掺Yb双包层光纤激光器v���槽侧面粘和泵浦方法

一种掺Yb双包层光纤激光器v���槽侧面粘和泵浦方法，其特征在于，包括如下步骤:步骤1:在双包层光纤的内包层和外包层上用精密光学微加工技术沿双包层光纤的轴向加工一段v���槽，该v���槽的底部高于双包层光纤的纤芯的表面;步骤2:将多模尾纤的一端用化学腐蚀方法去掉涂敷层，得到裸尾纤;步骤3:将多模尾纤一端的裸尾纤放入双包层光纤的v���槽内，该裸尾纤与纤芯相隔一距离;步骤4:使用光学折射率匹配胶填充于v���槽内，使裸尾纤与纤芯平行固定于v���槽内。

采用氢氧化铵腐蚀液制备V���槽砷化镓图形衬底的方法

本发明提供一种采用氢氧化铵腐蚀液制备V���槽砷化镓图形衬底的方法，其特征在于，包括如下步骤:步骤1:配置氢氧化铵腐蚀液;步骤2:在衬底上制作一层光刻胶;步骤3:光刻，使光刻胶形成条形光刻胶图案;步骤4:将光刻好的衬底放入配好的腐蚀液中腐蚀，使衬底形成V���槽，取出，用去离子水反复清洗，然后氮气吹干;步骤5:将吹干后的衬底用丙酮清洗掉残留的光刻胶，氮气吹干，完成V���槽砷化镓图形衬底的制作。