钛宝石激光器中用优化Gires-Tournois镜产生15fs脉冲

根据飞秒脉冲锁模钛宝石激光器脉冲压缩的要求，介绍了负色散镜补偿色散的基本原理及其特点。详细阐述了优化Gires-Tournois(OG-T)镜的设计过程，并通过计算机优化得到理想设计膜系。采用离子束溅射的方法镀制了优化Gires—Tournois镜。测量了优化Gires-Tournois镜(编号为OGT#1)的透射率和群延迟色散，并与设计值进行了比较，分析了实测值产生偏差的原因，从而对镀膜参量进行了相应的调整，制造了第二批优化Gires—Tournois镜(编号为OGT#2)。将优化Gires—Tourn

光学薄膜元件的激光预处理技术

激光预处理技术作为一种提高激光约束核聚变装置中光学元件损伤阈值的有效方法，有重要的使用价值和学术价值。介绍了激光预处理的研究现状，重点介绍了小光斑光栅扫描预处理的方法及其应用，以及应注意的问题。讨论了几种被广泛认可的预处理增强机理，并对激光预处理技术进行了展望。

石英晶体监控膜厚仪的发展与应用

石英晶体振荡监控光学薄膜厚度是直接监控光学薄膜物理厚度的方法，与工作波段无关，设置简单，各种厚度皆可控制．易于实现自动控制，将会越来越广泛地应用在光学薄膜厚度监控中。本文首先介绍了石英晶体监控膜厚仪监控光学薄膜厚度的原理，然后讨论了石英晶体监控仪的发展和晶振片的稳定性。

The laser-assisted cold spray process

Thick metal coatings are currently deposited via two well established routes, Laser or arc based cladding, and thermal spray. A new coating technique known as Laser-assisted Cold Spray (LCS), which aims to expand on the capabilities of the two process routes currently available, is under development at the University of Cambridge in the UK. LCS is a development of the Cold Spray process (CS) in which coatings are built up from powder particles which are entrained within a gas stream and accelerated through a de Laval nozzle, impacting the substrate at supersonic speeds that exceed a material dependent critical velocity.

1064nm倍频波长分离膜的制备与性能研究

通过对主膜系添加匹配层并借助计算机对膜系进行优化，设计出结构规整、性能优良的1064ilm倍频波长分离膜。用电子束蒸发及光电极值监控技术在K9玻璃基底上沉积薄膜，将样品置于空气中在260℃温度下进行3h热退火处理。然后用Lambda 900分光光度计测量了样品的光谱性能；用表面热透镜(STL)技术测量了样品的弱吸收值；用调Q脉冲激光装置测试了样品的抗激光损伤阈值(LIDT)。实验结果发现，样品的实验光谱性能与理论光谱性能有很好的一致性。退火前后其光谱性能几乎没有发生温漂，说明薄膜的温度稳定性好；同时退火使

线性共蒸法制备非均匀膜的误差特性模拟分析

对双源线性共蒸法制备的非均匀薄膜折射率分布与光学特性的关系作了探讨，并与均匀介质膜的光学特性作了对比；从折射率正变和负变两个方面．讨论了混合介质膜折射率不同变化规律对光学性能带来的影响；讨论了厚度误差和折射率极值误差对非均匀膜光学性能的影响。结果发现：折射率变化规律误差主要对非均匀膜的应用波段范围产生影响，而膜层厚度误差和折射率极值误差超过一定值时，将对薄膜光学特性产生重要影响。

高真空室中的水蒸气对HfO2薄膜性能的影响

本文研究了在镀膜过程中真空室内水蒸气的含量对HfO2薄膜物理性能的影响。用电子束蒸发和光电极值监控的方法在BK7基底上制备HfO2薄膜。利用残余气体分析仪在线监测了真空室内的残余气氛组成。分别用Lambda 900光谱仪、X射线衍射方法、表面热透镜技术和1064nm的激光器测试了薄膜的光学性能、微结构、吸收和激光损伤阈值。实验发现，附加冷阱装置有助于我们有效控制镀膜过程中的水汽含量，且在水蒸气含量较少的真空室内镀制的薄膜具有较高的折射率，较小的晶粒尺寸，较低的弱吸收值和较高的损伤阈值。

薄膜材料对TiO2基薄膜激光损伤阈值的影响

abstract {The optical property, structure, surface properties (roughness and defect density) and laser-induced damage threshold (LIDT) of TiO₂ films deposited by electronic beam (EB) evaporation of TiO₂ (rutile), TiO₂ (anatase) and TiO₂ + Ta₂O₅ composite materials are comparatively studied. All films show the polycrystalline anatase TiO₂ structure. The loose sintering state and phase transformation during evaporating TiO₂ anatase slice lead to the high surface defect density, roughness and extinction coefficient, and low LIDT of films. The TiO₂ + Ta₂O₅ composite films have the lowest extinction coefficient and the highest LIDT among all samples investigated. Guidance of selecting materials for high LIDT laser mirrors is given.}

Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector

HfO2 single layers, 800 run high-reflective (HR) coating, and 1064 ran HR coating were prepared by electron-beam evaporation. The laser-induced damage thresholds (LIDTs) and damage morphologies of these samples were investigated with single-pulse femtosecond and nanosecond lasers. It is found that the LIDT of the HfO2 single layer is higher than the HfO2-SiO2 HR coating in the femtosecond regime, while the situation is opposite in the nanosecond regime. Different damage mechanisms are applied to study this phenomenon. Damage morphologies of all samples due to different laser irradiations are displayed. (c) 2007 Optical Society of America.

Effect of SiO2 protective layer on the femtosecond laser-induced damage of HfO2/SiO2 multilayer high-reflective coatings

Two kinds of HfO2/SiO2 800 nm high-reflective (HR) coatings, with and without SiO2 protective layer were deposited by electron beam evaporation. Laser-induced damage thresholds (LIDT) were measured for all samples with femtosecond laser pulses. The surface morphologies and the depth information of all samples were observed by Leica optical microscopy and WYKO surface profiler, respectively. It is found that SiO2 protective layer had no positive effect on improving the LIDT of HR coating. A simple model including the conduction band electron production via multiphoton ionization and impact ionization is used to explain this phenomenon. Theoretical calculations show that the damage occurs first in the SiO2 protective layer for HfO2/SiO2 HR coating with SiO2 protective layer. The relation of LIDT for two kinds of HfO2/SiO2 HR coatings in calculation agrees with the experiment result. (c) 2006 Elsevier B.V. All rights reserved.

Optimization of thin-film design for multi-layer dielectric grating

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)H-9 design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al2O3 between the initial design and an optimized HfO2 top layer. The optimized MLD coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8 degrees for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2 degrees for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation. (c) 2006 Elsevier B.V. All rights reserved.

Influence of substrate temperature on properties of MgF2 coatings

Thermal boat evaporation was employed to prepare MgF2 single-layer coatings upon both JGS1 and UBK7 substrates at different substrate temperatures. Microstructure, transmittance and residual stress of these coatings were measured by X-ray diffraction, spectrophotometer, and optical interferometer, respectively. Measurement of laser induced damage threshold (LIDT) of the samples was performed at 355 nm, 8 ns pulses. The results showed that high substrate temperature was beneficial to crystallization of the film. Above 244 degrees C, the refractive index increased gradually with the substrate temperature rising. Whereas, it was exceptional at 210 degrees C that the refractive index was higher than those deposited at 244 and 277 degrees C. The tensile residual stresses were exhibited in all MgF2 films, but not well correlated with the substrate temperature. In addition, the stresses were comparatively smaller upon JGS1 substrates. A tendency could be seen that the LIDTs reached the highest values at about 244 degrees C, and the films upon JGS1 had higher LIDTs than those upon UBK7 substrates at the same temperature. Meanwhile, the damage morphologies showed that the laser damage of the coating resulted from an absorbing center at the film-substrate interface. The features of the damages were displayed by an absorbing center dominated model. Furthermore, the reason of the difference in LIDT values was discussed in detail. (C) 2007 Elsevier B.V. All rights reserved.

利用等效层的消偏振宽带减反膜设计

分析了倾斜入射条件下导致光学薄膜产生偏振的原因, 针对不同偏振态的等效导纳与等效相位进行了分析, 并计算了对称膜层在45°入射条件下不同偏振态的等效折射率与等效相位厚度, 采用等效层方法设计了光学性能良好的600～900 nm波段消偏振宽带减反膜。最后利用电子束蒸发技术制备了薄膜样品, 样品的光谱性能完全能够满足使用要求。其中在600～900 nm波段范围内, 平均反射率均小于1.38%, 反射率的偏振度均低于0.89％。另外, 通过对其理论及实验光学性能、角度敏感性、膜层厚度误差敏感性等方面的分析结果可

三硼酸锂晶体上1064 nm, 532 nm, 355 nm三倍频增透膜的设计

采用矢量法设计了三硼酸锂晶体上1064 nm、532 nm和355 nm三倍频增透膜,结果表明1064 nm、532 nm和355 nm波长的剩余反射率分别为0.0017％、0.0002％和0.0013％。根据误差分析,薄膜制备时沉积速率精度控制在＋5.5％时,1064 nm、532 nm和355 nm波长的剩余反射率分别增加至0.20％、0.84％和1.89％。当材料折射率的变化控制在＋3％时,1064 nm处的剩余反射率增大为0.20％,532 nm和355 nm处分别达0.88％和0.24％。与薄膜

光学薄膜膜厚自动控制系统的研究

介绍了一种利用光电极值法同时控制规整膜系和非规整膜系的方法,利用VC＋＋编写程序实现对光学监控信号的采集、处理及停镀点的自动判断,实现了规整膜系和非规整膜系膜层厚度的自动控制.并利用该膜厚自动控制系统实验制备了规整膜系和非规整膜系多层膜,实验结果表明：利用该系统镀制的薄膜重复性良好,且光谱曲线和理论光谱曲线吻合较好.该系统解决了非规整膜系的监控问题,由计算机控制膜层的停镀点,排除了人的主观因素对薄膜的性能及其制备的重复性产生的影响,提高了薄膜镀制的重复性和成品率.