Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector


Autoria(s): Yuan Lei; Zhao Yuanan; Shang Guangqiang; Wang Chengren; 贺洪波; 邵建达; 范正修
Data(s)

2007

Resumo

HfO2 single layers, 800 run high-reflective (HR) coating, and 1064 ran HR coating were prepared by electron-beam evaporation. The laser-induced damage thresholds (LIDTs) and damage morphologies of these samples were investigated with single-pulse femtosecond and nanosecond lasers. It is found that the LIDT of the HfO2 single layer is higher than the HfO2-SiO2 HR coating in the femtosecond regime, while the situation is opposite in the nanosecond regime. Different damage mechanisms are applied to study this phenomenon. Damage morphologies of all samples due to different laser irradiations are displayed. (c) 2007 Optical Society of America.

Identificador

http://ir.siom.ac.cn/handle/181231/4526

http://www.irgrid.ac.cn/handle/1471x/12840

Idioma(s)

英语

Fonte

Yuan Lei;Zhao Yuanan;Shang Guangqiang;Wang Chengren;贺洪波;邵建达;范正修.,J. Opt. Soc. Am. B-Opt. Phys.,2007,24(3):538-543

Palavras-Chave #光学薄膜 #Electron beams #Hafnium compounds #Laser beam effects #Morphology #Reflective coatings #Ultrashort pulses
Tipo

期刊论文