Effects of polarization field on formation of two-dimensional electron gas in (0001) and (11(2)over-bar0) plane AlGaN/GaN heterostructures

Photoluminescence (PL) and temperature-dependent Hall effect measurements were carried out in (0001) and (11 (2) over bar0) AlGaN/GaN heterostructures grown on sapphire substrates by metalorganic chemical vapor deposition. There are strong spontaneous and piezoelectric electric fields (SPF) along the growth orientation of the (0001) AlGaN/GaN heterostructures. At the same time there are no corresponding SPF along that of the (1120) AlGaN/GaN. A strong PL peak related to the recombination between two-dimensional electron gas (2DEG) and photoexcited holes was observed at 3.258 eV at room temperature in (0001) AlGaN/GaN heterointerfaces while no corresponding PL peak was observed in (11 (2) over bar0). The existence of a 2DEG was observed in (0001) AlGaN/GaN multi-layers with a mobility saturated at 6000 cm(2)/V s below 80 K, whereas a much lower mobility was measured in (11 (2) over bar0). These results indicated that the SPF was the main element to cause the high mobility and high sheet-electron-density 2DEG in AlGaN/GaN heterostructures. (C) 2004 Elsevier B.V. All rights reserved.

Strong room-temperature ferromagnetism in Cu-implanted nonpolar GaN films

This work was supported by the Natural Science Foundation of China (Grant No. 60876068) and The Project sponsored by SRF for ROCS (Grant No. 08Y1010000), SEM

Depolarization blueshift in intersubband transitions of triangular quantum wires

Major State Basic Research Project 973 program of China 2006CB604907;National Science Foundation of China 60776015 60976008;863 High Technology R&D Program of China 2007AA03Z402

Luminescence study of (11(2)over-bar0) GaN film grown by metalorganic chemical-vapor deposition

Investigations on photoluminescence properties of (11 (2) over bar0) GaN grown on (1 (1) over bar 02) Al2O3 substrate by metalorganic chemical-vapor deposition are reported. Several emission lines not reported before are observed at low temperature. The sharp peak at 3.359 eV is attributed to the exciton bound to the neutral acceptor. Another peak at 3.310 eV represents a free-to-bound, probably a free electron-to-acceptor, transition. The 3.241 and 3.170 eV lines are interpreted as phonon replica lines of the 3.310 eV line. The phonon energy is 70 meV, consistent with the energy of transverse optical E-1 phonon. The optical properties of the lines are analyzed. (C) 2003 American Institute of Physics.

The influence of substrate nucleation on HVPE-grown GaN thick films - art. no. 684105

Thick GaN films were grown on sapphire in a home-made vertical HVPE reactor. Effect of nucleation treatments on the properties of GaN films was investigated, including the nitridation of sapphire, low temperature GaN buffer and MOCVD-template. Various material characterization techniques, including AFM, SEM, XRD, CL and PL have been used to assess these GaN epitaxial films. It was found that the surface of sapphire after high temperature nitridation was flat and showed high density nucleation centers. In addition, smooth Ga-polarity surface of epitaxial layer can be obtained on the nitridation sapphire placed in air for several days due to polarity inversion. This may be caused by the atoms re-arrangement because of oxidation. The roughness of N-polarity film was caused by the huge inverted taper domains, which can penetrate up to the surface. The low temperature GaN buffer gown at 650 degrees C is favorable for subsequent epitaxial film, which had narrow FWHM of 307 arcsec. The epitaxial growth on MOCVD-template directly came into quasi-2D growth mode due to enough nucleation centers, and high quality GaN films were acquired with the values of the FWHM of 141 arcsec for (002) reflections. After etching in boiled KOH, that the total etch-pit density was only 5 x 106 cm(-2) illustrated high quality of the thick film on template. The photoluminescence spectrum of GaN film on the MOCVD-template showed the narrowest line-width of the band edge emission in comparison with other two growth modes.

A two-step backoff scheme for improving the performance of the IEEE 802.11 distributed coordination function

This paper describes the binary exponential backoff mechanism of 802.11 distributed coordination function (DCF), and introduces some methods of modifying the backoff scheme. Then a novel backoff scheme, called Two-step Backoff scheme, is presented and illustrated. The simulation process in OPNET environment has been described also. At last, the analysis and simulation results show that the Two-step backoff scheme can enhance the performance of the IEEE 802.11 DCF.

A power-saving scheme for IEEE 802.11 Ad hoc networks

In the Wireless Local Area Networks (WLANs), the terminals are often powered by battery, so the power-saving performance of the wireless network card is a very important issue. For IEEE 802.11 Ad hoc networks, a power-saving scheme is presented in Medium Access Control (MAC) layer to reduce the power consumption by allowing the nodes enter into the sleep mode, but the scheme is based on Time-Drive Scheme (TDS) whose power-saving efficiency becomes lower and lower with the network load increasing. This paper presented a novel energy-saving mechanism, called as Hybrid-Drive Scheme (HDS), which introduces into a Message.-Drive Scheme (MDS) and combines MDS with the conventional TDS. The MDS, could obtain high efficiency when the load is heavy; meanwhile the TDS has high efficiency when the network load is small. The analysis shows that the proposed HDS could obtain high energy-efficiency whether the network load is light or heavy and have higher energy-saving efficiency than conventional scheme in the IEEE 802.11 standard.

微过氧化酶-11电化学行为的研究

生物分子的电化学行为与生命过程直接相关,通过对生物大分子电子传递反应机理的研究,可获得有关生理过程的重要信息.该论文主要研究内容和结论如下:1.研究了用共价键合法、Nafion膜法、自组装法和吸附法制备的MP-11修饰电极,发现用吸附法来制备MP-11修饰电极有方法简单,稳定性较好的优点.2.首次利用电化学方法研究了赖氨酸和精氨酸与MP-11配位后对MP-11的电化学性能的影响.3.研究了MP-11对NO还原的电催化作用.4.首次用傅立叶变换表面增强拉曼光谱研究了粗糙银电极表面MP-11的结构和吸附方式.5.首次研究了细胞色素c在尼龙膜修饰金电极上的电化学行为.

24-二甲基戊二稀土化合物的合成

本文叙述了2.4-二甲基戊二烯基稀土金属有机化合物的合成并通过元素分析，红外光谱、核磁共振谱及质谱的鉴定。测定了Gd(2.4-GH_(11))_3的单晶结构，此外还合成了（2.4-GH_(11)K.TMEDA及K_2C_8H_8·3THF并也测定了它们的晶体结构。在所合成化合物的红外光谱中，没有属于C=C双键的吸收峰，表明分子中配位体以η~5形式的大π键体系与稀土金属离子结合，在Ln(2.4-GH_(11))_2Cl·TMF和Ln(2.4-GH_(11))Cl_2·GH_THF的红外光谱中，于1060波数附近出现一强而宽的吸收峰，即化合物中有四氢呋喃分子络合。化合物的室温NMR谱有四个吸收峰，2.4-二甲基戊二烯配位体可能为η~5平面∪或W构型。化合物的水解'H-NMR谱与质谱都证实水解产物为2.4－二甲基－1.3－戊二烯。它是－2.4二甲基戊二烯阴离子水解所得的唯一产物，它表明化合物中的配位体确为2.4－二甲基戊二烯阴离子。(2.4-GH_(11))_2Cl·TMDA配合物晶体结构是应用低温X－射线衍射技术用Nicolet R_3 M/E型四园衍射仪LT－1低温装置并利用重原子法测定的最小二乘法精修至收敛时的一致性因子R=0.055. Rw=0.057。晶体属单斜晶系P21/n空间群。晶胞参数a=11.322(4)A, b=9.242(3)A, c=15.956(5)A. β=106.70(3)分子中2.4－二甲基戊二烯阴离子呈平面∪构型。钾离子与四甲基乙二胺二啮体结合形成的络合阳离子和2.4-二甲基戊二烯阴离子相间排列形成无限链状结构分子。2.4－二甲基戊二烯阴离子的C－C键长明显分为中间与外端C－C键两组。外端组C－C键双性质较强键长较短。表明C3具有负电荷的共振杂化体贡献较大。分子中K－C键最短的是K-C(1.5)。而不是具有较多负电荷的C3－K键。这可能是由于几何因素造成的。K_2C_8H_8·3THF的晶体结构是采用与前者相同的方法测定的。它属三斜晶系，PT空间群，晶胞参数a=10.263(3)A, b=13.157(4)A, c=9.443A, α=87.51(2)°, β=114.93(2)°, γ=76.81(2)°. V=1111.6A, R=0.051. 晶体中负二价的环辛四烯阴离呈平面构型，具有中心对称性，两侧与两中心对称相关的钾离子连接，相邻的非等效的钾离子间通过两四氢呋喃分子的氧原子相连接，从而形成了无限链状结构的分子。环辛四烯反映了Huckel的4n+2芳香性规则。该结构的特别之处在于四氢呋喃分子的氧原子以桥键形式与两个钾离子同时连接。而这种形式的桥键在其它化合物中似还未发现。Go(2.4-GH_(11))_3的晶体结构亦是采用与前述相同的方法测定的。其晶体为三斜晶系，PT空间群，晶胞参数a=12.541A, b=12.853A, c=8.432A, α=91.44°, β=108.61°, γ=117.97°, V=112.54A~3. 结构测定表明，Gd(2.4-GH_(11))_3分子具有C_3h对称性。三个配位体阴离了的九个带负电荷的碳原子近似以三帽三角棱柱形式与钆离子配位。分子中2.4－二甲基戊二烯阴离子的C－C键长－亦分为而组。外端C－C键较中间C－C键强，键长较短，亦表明C3具有较多的负电荷。2.4－二甲基戊二烯阴离子本身近似呈平面∪构型。C2,C4偏离由C1 C3 C5三碳原子构成的平面0.067A。方向上远离中心钆离子。可能在此以离子性为主的化合物中，钆离子与不带电荷的C2 C4间的相互作用有些排斥性质。与Nd(2.4-GH_(11))_3不同的是，在Gd(2.4-GH_(11))_3分子中，Gd-(C(1,5）键最短，而不是Gd-C(3)键。这可能是由于钆离子的半径较小，化合物的空间位阻效应较大所致。

三氯化稀土的还原反应及产物的反应性能的研究

本文研究了NdCl_2·nTHF、SmCl_2·nTHF、YbCl_2·nTHF与环辛四烯在室温下的直接反应。发现NdCl_2·nTHF、SmCl_2·nTHF可以在室温下与C_8H_8直接反应，分别得到NdCl_3·nTHF、ClNdC_8H_8·2THF；SmCl_3·nTHF，ClSmC_8H_8·2THF。反应速度NdCl_2 > SmCl_2。YbCl_2·nTHF在室温下不与环辛四烯发生反应。产物LnCl_3·nTHF和ClLnC_8H_8·2THF (Ln = Nd, Sm)已得到水解色谱、质谱、元素分析、红外光谱等的证实。推测反应接下式进行：LnCl_2·nTHF + C_8H_8 → [THFCl_2LnC_8H_8LnCl_2THF] → LnCl_3·nTHF + ClLnC_8H_8·2THF我们近一步研究了NdCl_2·nTHF与K_2C_8H_8的交换反应。结果表明从这一体系中得不到二价钕的有机金属化合物，而是得到了KNd(C_8H_8)_2。首次研究了以2摩尔萘锂为还原剂还原无水三氯化钕的反应，得到了组成为NdClLin (n < 0.3)的还原产物。该产物不溶于四氢呋喃，对空气、水汽比NdCl_2更为敏感。推测钕主要以一价形式存在。还研究了萘钠与三氯化铽的还原反应。三氯化钕的还原产物不与LiCl 形成络合物，而三氯化铽的还原产物却与LiCl形成络全物而溶于THF。为了进一步了解三氯化钕还原产物的性质，研究了其与环辛四烯的反应，结果表明它们也可以在室温下直接反应，并且这一反应比NdCl_2与C_8H_8的反应快。从反应混合物中分出两种产物：ClNdC_8H_8·2THF和[LiNd(C_8H_8)_2·4THF]·2THF，并测定了这二种产物的晶体结构。ClNdC_8H_8·2THF的晶体结构表明它属于单斜晶系，P2_1/C空间群。晶胞参数为a = 11.819(3)A，b = 12.651(3)A，C = 13.478(3)A，β = 122.97(2)°。[LiNd(C_8H_8)_2·4THF的晶体结构表明它是单斜晶系，C_c空间群。晶胞参数：a = 17.858(7)A，b = 13.243(4)A，c = 18.085(6)A，β= 106.52(4)°。