1000 resultados para 366.7


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ErSi1.7 layers with high crystalline quality (chi(min) of Er is 1.5%) have been formed by 90 keV Er ion implantation to a dose of 1.6X10(17)/cm(2) at 450 degrees C using channeled implantation. The perpendicular and parallel elastic strain e(perpendicular to)=-0.94%+/-0.02% and e(parallel to)=1.24%+/-0.08% of the heteroepitaxial erbium silicide layers have been measured with symmetric and asymmetric x-ray reflections using a double-crystal x-ray diffractometer. The deduced tetragonal distortion e(T(XRD))=e(parallel to)-e(perpendicular to)=2.18%+/-0.10%, which is consistent with the value e(T(RBS))2.14+/-0.17% deduced from the Rutherford backscattering and channeling measurements. The quasipseudomorphic growth of the epilayer and the stiffness along a and c axes of the epilayer deduced from the x-ray diffraction are discussed.

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报道了基于应变补偿的InP基In0.53+xGa0.47-xAs/In0.52-yAl0.48+yAs分布反馈量子级联激光器.采用二级光栅作为反馈,激射工作波长为7.8μm,在1%占空比,5kHz频率的工作条件下,在93~173K的温度范围内,单模发射光谱边模抑制比均超过20dB,调谐系数dλ/dT=0.5125nm/K.在93K时,峰值功率为30mW,直到153K时,峰值光功率仍达到12mW.

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为了研究(111)衬底的特性以及实现等边三角形微腔激光器,利用金属有机化学气相淀积(MOCVD)研究了(111)A InP衬底上InGaAsP外延层的表面形貌和光学特性。考虑到(111)A InP衬底的悬挂键密度比较低,在生长过程中有意提高了V/III比。通过扫描电子显微镜(SEM)和光荧光(PL)谱分别研究了外延层的表面形貌和光学特性。实验发现,表面形貌和光学特性随V/III比和温度的变化非常大。最佳V/IlI比和温度分别为400和625℃。

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报道了由2N个1×N多模干涉马赫-曾德尔光开关组成的N×N光开关阵列结构,分析了这种结构的开关阵列优势和局限性。用场传输矩阵方法建立了1×N多模干涉光开关的光场传输方程。给出了光开关阵列从任一输入端输入、从任一输出端正输出时阵列开关的工作条件。在上述原理及理论基础上分析了4×4光开关阵列的结构和工作条件。

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提出了一种适用于波分复用系统的具有平顶陡边响应的新型谐振腔强型(RCE)光电探测器结构,模拟得到了量子效率从峰值下降0.5dB的线宽1.8 nm,10 dB的线宽5.6 nm,20 dB的线宽10.4 nm,量子效率峰值99.7%,几乎没有凹陷的响应曲线。

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A 1.3μm GaInNAs resonant cavity enhanced (RCE) photodetector (PD) has been grown by molecular beam epitaxy (MBE) monolithically on (100) GaAs substrate using a home-made ion-removed dc-plasma cell as nitrogen source. A transfer matrix method was used to optimize the device structure. The absorption region is composed of three GaInNAs quantum wells separated by GaAs layers. Devices were isolated by etching 130μm-diameter mesas and filling polyamide into grooves. The maximal quantum efficiency of the device is about 12% at 1.293μm. Full width at half maximum (FWHM) is 5.8nm and 3dB bandwidth is 304MHz. Dark current is 2 * 10~(-11) A at zero bias voltage. Further improvement of the performance of the RCE PD can be obtained by optimizing of the structure design and MBE growth conditions.

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报道了一种具有平顶陡边响应的谐振腔增强型(RCE)光电探测器。使用数值模拟的方法对这种新型谐振腔增强型(RCE)光电探测器与传统的RCE光电探测器的响应曲线和串扰特性进行了分析和对比,分析了在半导体材料生长时厚度偏差对平顶陡边响应的RCE光电探测器响应曲线的影响,还分析了入射光的入射角和偏振态对平顶陡边响应的RCE光电探测器响应曲线的影响。

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报道了正入射Si_(0.7)Ge_(0.3)/Si多量子阱结构光电探测器的制作和实验结果。测试了它的光电流谱和量子效率。探测器的响应波长扩展到了1.3μm以上波段。在1.3μm处量子效率为0.1%。量子效率峰值在0.95μm处达到20%。

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于2010-11-23批量导入

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于2010-11-23批量导入

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于2010-11-23批量导入

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于2010-11-23批量导入

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于2010-11-23批量导入

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用卢瑟福背散射沟道技术研究了1MeVSi~+在衬底加温和室温下以不同剂量注入Al_(0.3)Ga_(0.7)As/GaAs超晶格和GaAs后的晶格损伤。在衬底加温下, 观察到Al_(0.3)Ga_(0.7)As/GaAs超晶格和GaAs都存在一个动态退火速率与缺陷产生速率相平衡的剂量范围, 以及两种速率失去平衡的临界剂量。用热尖峰与碰撞模型解释了晶格损伤积累与注入剂量和衬底温度的关系。