Strength and hydration products of reactive MgO-silica pastes

The reaction between MgO and microsilica has been studied by many researchers, who confirmed the formation of magnesium silicate hydrate. The blend was reported to have the potential as a novel material for construction and environment purposes. However, the characteristics of MgO vary significantly, e.g., reactivity and purity, which would have an effect on the hydration process of MgO-silica blend. This paper investigated the strength and hydration products of reactive MgO and silica blend at room temperature up to 90 days. The existence of magnesium silicate hydrate after 7 days' curing was confirmed with the help of infrared spectroscopy, thermogravimetric analysis and X-ray diffraction. The microstructural and elemental analysis of the resulting magnesium silicate hydrate was conducted using scanning electron microscopy and energy dispersive spectroscopy. In addition, the effect of characteristics of MgO on the hydration process was discussed. It was found that the synthesis of magnesium silicate hydrate was highly dependent on the reactivity of the precursors. MgO and silica with higher reactivity resulted in higher formation rate of magnesium silicate hydrate. In addition, the impurity in the MgO affects the pH value of the blends, which in turn determines the solubility of silica and the formation of magnesium silicate hydrate. © 2014 Elsevier Ltd. All rights reserved.

Strength correlations of cement-mixed soils using data mapping

Development of comparisons and correlations between the unconfined compressive strength (UCS) and the undrained triaxial compressive strength, qu, is essential for generalising performance and optimising the design of cement-stabilised soils. This paper introduces current work in collecting and collating data from a number of research projects involving both laboratory strength tests performed on identical cement-stabilised soil samples. The research project on cement-stabilised Singapore marine clays at the National University of Singapore has been used as an example to explain the work on comparing and correlating results from both tests by normalising data and constructing contour plots. The effect of variables on strength comparison and correlations was evaluated. The variation in strength correlations was found to be dependent on a number of factors including: soil properties, cement content, curing time and stress, total water/cement ratio, confining stress and strain rate. The results showed that at ~ 100 kPa confining stress, UCS and qu, had similar magnitudes. Correlations between strengths and other design variables are discussed and presented.

Direct detection of the relative strength of Rashba and Dresselhaus spin-orbit interaction: Utilizing the SU(2) symmetry

We propose a simple method to detect the relative strength of Rashba and Dresselhaus spin-orbit interactions in quantum wells (QWs) without relying on the directional-dependent physical quantities. This method utilizes the two different critical gate voltages that leading to the remarkable signals of SU(2) symmetry, which happens to reflect the intrinsic-structure-inversion asymmetry of the QW. We support our proposal by the numerical calculation of in-plane relaxation times based on the self-consistent eight-band Kane model. We find that the two different critical gate voltages leading to the maximum spin-relaxation times [one effect of the SU(2) symmetry] can simply determine the ratio of the coefficients of Rashba and Dresselhaus terms. Our proposal can also be generalized to extract the relative strengths of the spin-orbit interactions in quantum-wire and quantum-dot structures.

Domain wall resistance in perpendicular (Ga,Mn) As: Dependence on pinning

We have investigated the domain wall resistance for two types of domain walls in a (Ga,Mn)As Hall bar with perpendicular magnetization. A sizeable positive intrinsic DWR is inferred for domain walls that are pinned at an etching step, which is quite consistent with earlier observations. However, much lower intrinsic domain wall resistance is obtained when domain walls are formed by pinning lines in unetched material. This indicates that the spin transport across a domain wall is strongly influenced by the nature of the pinning.

Photoemission study of chemisorption and Fermi-level pinning at K/GaAs(100) interface with synchrotron radiation

The adsorption of K on the n-GaAs(I 0 0) surface was investigated by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation photoemission spectroscopy (SR-PES). The Ga3d and As3d core level was measured for clean and K adsorbed GaAs(I 0 0) surface. The adsorption of K induced chemical reaction between K and As, and the K-As reactant formed when the K coverage theta > I ML. The chemical reaction between K and Ga did not occur, but Ga atoms were exchanged by K atoms. From the data of band bending, the Schottky barrier is 0.70 eV. The Fermi-level pinning was not caused by defect levels. The probable reason is that the dangling bonds of surface Ga atoms were filled by the outer-shell electrons of K atoms, forming a half-filled surface state. The Fermi-level pinning was caused by this half-filled surface state. (c) 2004 Elsevier B.V. All rights reserved.

Effect of InAs quantum dots on the Fermi level pinning of undoped-n(+) type GaAs surface studied by contactless electroreflectance

Self-assembled InAs quantum dots (QDs) have been fabricated by depositing 1.6, 1.8, 2.0 and 2.5 monolayer (ML) InAs on surfaces of the undoped-n(+) (UN+) type GaAs structure. Room temperature contactless electroreflectance (CER) was employed to study the built-in electric field and the surface Fermi level pinning of these QD-covered UN+ GaAs samples. The CER results show that 1.6 ML InAs QDs on GaAs do not modify the Fermi level, whereas for samples with more than 1.6 ML InAs coverage, the surface Fermi level is moved to the valence band maximum of GaAs by about 70 meV (which is independent of the InAs deposition thickness) compared to bare GaAs. It is concluded that the modification of InAs coverage on the Fermi level on the GaAs surface is due to the QDs, rather than to the wetting layer. (C) 2003 American Institute of Physics.

Fermi-Level Pinning at Metal/High-k Interface Influenced by Electron State Density of Metal Gate

The Fermi-level pinning (FLP) at the metal/high-k interface and its dependence on the electron state density of the metal gate are investigated. It is found that the FLP is largely determined by the distortion of the vacuum level of the metal which is quantitatively ruled by the electron state density of the metal. The physical origin of the vacuum level distortion of the metal is attributed to an image charge of the interface charge in the metal. Such results indicate that the effective work function of the metal/high-k stack is also governed by the electron state density of the metal.