991 resultados para multilayer dielectric film


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In this study, we report a novel approach for glucose-triggered anticancer drug delivery from the self-assembly of neutral poly(vinyln alcohol) (PVA) and chitosan. In the present study, we have fabricated multilayer thin film of PVA-borate and chitosan on colloidal particle (MF particle) and monitored the layer-by-layer growth using Zetapotential measurements. Formation of multilayer membrane on MF particle has been further characterized with transmission electron microscopy (TEM) and confocal laser scanning microscopy (CLSM). Subsequently,disintegration of multilayer thin film and microcapsules was observed in presence of glucose. We investigated the disassembly of PVA-borate and chitosan self-assembly under CLSM and atomic force microscopy. These results suggest that this multilayer thin film is very efficient for encapsulation and release of DOX molecules above certain concentration of glucose (25 mM). This glucose-sensitive self-assembly is relevant for the application of anticancer therapeutic drug delivery.

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This article provides a detailed computational analysis of the reaction of dense nanofilms and the heat transfer characteristics on a composite substrate. Although traditional energetic compounds based on organic materials have similar energy per unit weight, non-organic material in nanofilm configuration offers much higher energy density and higher flame speed. The reaction of a multilayer thin film of aluminum and copper oxide has been studied by varying the substrate material and thicknesses. The numerical analysis of the thermal transport of the reacting film deposited on the substrate combined a hybrid approach in which a traditional two-dimensional black box theory was used in conjunction with the sandwich model to estimate the appropriate heat flux on the substrate accounting for the heat loss to the surroundings. A procedure to estimate this heat flux using stoichiometric calculations is provided. This work highlights two important findings. One is that there is very little difference in the temperature profiles between a single substrate of silica and a composite substrate of silicon silica. Secondly, with increase in substrate thickness, the quenching effect is progressively diminished at a given speed. These findings show that the composite substrate is effective and that the average speed and quenching of flames depend on the thickness of the silica substrate, and can be controlled by a careful choice of the substrate configuration. (C) 2011 Elsevier Ltd. All rights reserved.

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We describe high-efficiency, high-dispersion reflection gratings fabricated in bulk fused Silica illuminated by incident lights in the C + L bands as (de)multiplexers for dense wavelength division multiplexing (DWDM) application. Based on the phenomenon of total internal reflection, gratings with optimized profile parameters exhibit diffraction efficiencies of more than 90% under TM- and TE-polarized incident lights for 101-nm spectral bandwidths (1520-1620 nm) and can reach an efficiency of greater than 97% for both polarizations at a wavelength of 1550 nm. Without loss of metal absorption, without coating of dielectric film layers, and independent of tooth shape, this new kind of grating should be of great interest for DWDM application. (C) 2005 Optical Society of America.

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The usual beam splitter of multilayer-coated film with a wideband spectrum is not easy to achieve. We describe the realization of a wideband transmission two-port beam splitter based on a binary fused-silica phase grating. To achieve high efficiency and equality in the diffracted 0th and -1st orders, the grating profile parameters are optimized using rigorous coupled-wave analysis at a wavelength of 1550 nm. Holographic recording and the inductively coupled plasma dry etching technique are used to fabricate the fused-silica beam splitter grating. The measured efficiency of (45% x 2) = 90% diffracted into the both orders can be obtained with the fabricated grating under Littrow mounting. The physical mechanism of such a wideband two-port beam splitter grating can be well explained by the modal method based on two-beam interference of the modes excited by the incident wave. With the high damage threshold, low coefficient of thermal expansion, and wideband high efficiency, the presented beam splitter etched in fused silica should be a useful optical element for a variety of practical applications. (C) 2008 Optical Society of America.

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应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底,利用全息干涉技术和离子束技术刻蚀而成。脉宽压缩光栅的衍射效率和抗激光损伤阈值一方面依赖于光栅结构的设计,另一方面很大程度上取决于作为基底的多层膜的设计。给出了以413.1nm作为写入波长,1053nm作为使用波长的多层介质光栅膜的设计.样品在ZZS-800F、型真空镀膜机上采用电子束蒸发方式沉积而成,并给出了膜系结构对光学性能影响因素的详细分析,结果表明膜系H3L(H2L)^9H0.5L2.03H满足光栅膜的指标。给出了样品光学特性测试,其使用波

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超短脉冲超高能量激光器作为研究光和物质相互作用以及惯性约束聚变的手段而得到了广泛的应用。综述了应用于啁啾脉冲放大(CPA)系统的脉冲压缩光栅(PCG)的发展概况;分析和评述了脉宽压缩光栅的设计原理和制作工艺,并给出了脉宽压缩光栅的发展展望。实践和理论证明采用多层膜介质衍射光栅是实现高性能脉宽压缩光栅的一种优良的设计方案。

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给出了以413nm作为写入波长,1053nm作为使用波长的多层介质光栅膜的设计,计算表明膜系H3L(H2L)·9H0.5L2.03H满足光栅膜的要求.最后给出了制备得到的样品光学特性测试,结果表明在使用渡长和曝光波长处满足设计要求,其抗激光损伤阈值在光正入射和51.2°入射时分别为14.14J/cm^2和9.32J/cm^2,膜系的应力表现为压应力.

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基于啁啾脉冲放大技术的超短脉冲激光系统是提供超快、超强激光的重要途径,具有良好输出波形和高损伤阈值的多层介质膜脉冲宽度压缩光栅是获得高峰值功率脉冲激光的关键。基于傅里叶谱变换方法和严格模式理论,分析了多层介质膜光栅(MDG)在超短脉冲作用下的光学特性。结果表明,当MDG的反射带宽小于具有高斯分布的入射脉冲的频谱宽度时,-1级反射脉冲呈非对称高斯分布,其前沿出现振荡,并且-1级反射脉冲能量开始剧烈下降,讨论了MDG结构参数对其反射带宽的影响。分析了MDG与超短脉冲作用时的近场光分布,对提高其抗激光损伤特性具

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激光诱导薄膜损伤过程中,雪崩离化(AI)和多光子离化(MPI)的性质和作用到目前仍然存在争议。基于STUART等人的电子密度演化方程,运用数值模拟方法,研究了脉宽为τ∈[0.01,5]ps范围内单脉冲激光作用下熔融石英薄膜中电子密度演化过程;讨论了初始电子密度、激光脉冲宽度对阈值功率密度和阈值能量的影响;分析了初始电子密度、激光脉冲宽度对多光子离化及雪崩离化的影响。研究结果表明,在所研究的脉宽范围内,对于熔融石英光学薄膜、飞秒激光诱导损伤以雪崩离化为主导,多光子离化的影响随着脉宽的降低而增强,雪崩离化所需种子电子主要来源于多光子离化。

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The effects of plasma induced damage in different conditions of ICP and PECVD processes on LEDs were presented. For ICP mesa etch, in an effort to confirm the effects of dry etch damage on the optical properties of p-type GaN, a photoluminescence (PL) measurement was investigated with different rf chuck power. It was founded the PL intensity of the peak decreased with increasing DC bias and the intensity of sample etched at a higher DC bias of -400V is less by two orders of magnitude than that of the as-grown sample. Meanwhile, In the IN curve for the etched samples with different DC biases, the reverse leakage current of higher DC bias sample was obviously degraded than the lower one. In addition, plasma induced damage was also inevitable during the deposition of etch masks and surface passivation films by PECVD. The PL intensity of samples deposited with different powers sharply decreased when the power was excessive. The PL spectra of samples deposited under the fixed condition with the different processing time were measured, indicating the intensity of sample deposited with a lower power did not obviously vary after a long time deposition. A two-layer film was made in order to improve the compactness of sparse dielectric film deposited with a lower power.

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In this paper fabrication of high power light emitting diodes (LEDs) with combined transparent electrodes on both P-GaN and N-GaN have been demonstrated. Simulation and experimental results show that comparing with traditional metal N electrodes the efficacy of LEDs with transparent N electrode is increased by more than 10% and it is easier in process than the other techniques. Further more, combining the transparent electrodes with dielectric anti-reflection film, the extraction efficiency can be improved by 5%. At the same time, the transparent electrodes were protected by the dielectric film and the reliability of LEDs can be improved.

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The magnetic-type plasmon resonant of a metal-dielectric-metal nanocavity working at the wavelength of 1.55 mu m is explored, in which the upper layer is periodically patterned with metallic nanostrip arrays. In the dielectric film layer, the magnetic energy intensity is enhanced about 1700 times when irradiated with a p-polarized plane wave. We numerically studied the dispersion of the modes and the Q-value of this periodic cavity arrays. Q value is estimated about 18 and still has room for further improvement. It provides a new type of nanocavity that exhibits a strong magnetic response.

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Stable monolayer of the polyaniline(PAn) doped with dodecyl benzenesulfonic acid(DBSA) can form on the pure water surface. The multilayer ultrathin film can be successfully deposited by Langmuir-Blodgett(LB) technique onto CaF2 substrate. The limiting mean molecular area and collapse pressure observed are 0.066 nm(2) and 35 mN m(-1), respectively. The multilayer LB film and casting film were all characterized by TR and UV-Vis-NIR spectroscopies.

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A complete treatment of the charcterastic admittance-matrix representation of multilayer thin-film systems with absorbing media is presented. The algorithm from the systems analysis is implemented on an IBM microcomputer and some examples of filter design calculation are presented. Relevant source code in IBM Advanced Basic interpreter are also included.

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A Kalman filter algorithm has been applied to interpret the optical reflectance excursions during vacuum deposition of infrared coatings and multilayer thin-film filters. The application has been described in detail elsewhere and this paper now reports on-line experience for estimating deposition rate and thickness. The estimation proved sufficiently reliable to firstly 'navigate' regular manufacture (as controlled by a skilled operator) and to subsequently reproduce the skill without interpretation or intervention whilst maintaining exemplary product quality. Optical control by means of this Kalman filter application is therefore considered suitable as a basis for the automated manufacture of infrared coatings and multilayer thin-film filters.