993 resultados para Capacitance meters.
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"19 January 1983."
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Controlled polishing procedures were used to produce both uniformly doped and p-n junction silicon samples with different interface state densities but identical oxide thicknesses. Using these samples, the effects of interface states on scanning capacitance microscopy (SCM) measurements could be singled out. SCM measurements on the junction samples were performed with and without illumination from the atomic force microscopy laser. Both the interface charges and the illumination were seen to affect the SCM signal near p-n junctions significantly. SCM p-n junction dopant profiling can be achieved by avoiding or correctly modeling these two factors in the experiment and in the simulation. (c) 2005 American Institute of Physics.
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Scanning capacitance microscopy (SCM) measurement is a proposed tool for dopant profile extraction for semiconductor material. The influence of interface traps on SCM dC/dV data is still unclear. In this paper we report on the simulation work used to study the nature of SCM dC/dV data in the presence of interface traps. A technique to correctly simulate dC/dV of SCM measurement is then presented based on our justification. We also analyze how charge of interface traps surrounding SCM probe would affect SCM dC/dV due the small SCM probe dimension.
A new MOSFET's metallurgical channel length extraction method based on gate-to-substrate capacitance
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The scope of this paper is to present the Pulse Width Modulation (PWM) based method for Active Power (AP) and Reactive Power (RP) measurements as can be applied in Power Meters. Necessarily, the main aim of the material presented is a twofold, first to present a realization methodology of the proposed algorithm, and second to verify the algorithm’s robustness and validity. The method takes advantage of the fact that frequencies present in a power line are of a specific fundamental frequency range (a range centred on the 50 Hz or 60 Hz) and that in case of the presence of harmonics the frequencies of those dominating in the power line spectrum can be specified on the basis of the fundamental. In contrast to a number of existing methods a time delay or shifting of the input signal is not required by the method presented and the time delay by n/2 of the Current signal with respect to the Voltage signal required by many of the existing measurement techniques, does not apply in the case of the PWM method as well.
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High-volume capacitance is required to buffer the power difference between the input and output ports in single-phase grid-connected photovoltaic inverters, which become an obstacle to high system efficiency and long device lifetime. Furthermore, total harmonic distortion becomes serious when the system runs into low power level. In this study, a comprehensive analysis is introduced for two-stage topology with the consideration of active power, DC-link (DCL) voltage, ripple and capacitance. This study proposed a comprehensive DCL voltage control strategy to minimise the DCL capacitance while maintaining a normal system operation. Furthermore, the proposed control strategy is flexible to be integrated with the pulse-skipping control that significantly improves the power quality at light power conditions. Since the proposed control strategy needs to vary DCL voltage, an active protection scheme is also introduced to prevent any voltage violation across the DCL. The proposed control strategy is evaluated by both simulation and experiments, whose results confirm the system effectiveness.
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This work looks at the effect on mid-gap interface state defect density estimates for In0.53Ga0.47As semiconductor capacitors when different AC voltage amplitudes are selected for a fixed voltage bias step size (100 mV) during room temperature only electrical characterization. Results are presented for Au/Ni/Al2O3/In0.53Ga0.47As/InP metal–oxide–semiconductor capacitors with (1) n-type and p-type semiconductors, (2) different Al2O3 thicknesses, (3) different In0.53Ga0.47As surface passivation concentrations of ammonium sulphide, and (4) different transfer times to the atomic layer deposition chamber after passivation treatment on the semiconductor surface—thereby demonstrating a cross-section of device characteristics. The authors set out to determine the importance of the AC voltage amplitude selection on the interface state defect density extractions and whether this selection has a combined effect with the oxide capacitance. These capacitors are prototypical of the type of gate oxide material stacks that could form equivalent metal–oxide–semiconductor field-effect transistors beyond the 32 nm technology node. The authors do not attempt to achieve the best scaled equivalent oxide thickness in this work, as our focus is on accurately extracting device properties that will allow the investigation and reduction of interface state defect densities at the high-k/III–V semiconductor interface. The operating voltage for future devices will be reduced, potentially leading to an associated reduction in the AC voltage amplitude, which will force a decrease in the signal-to-noise ratio of electrical responses and could therefore result in less accurate impedance measurements. A concern thus arises regarding the accuracy of the electrical property extractions using such impedance measurements for future devices, particularly in relation to the mid-gap interface state defect density estimated from the conductance method and from the combined high–low frequency capacitance–voltage method. The authors apply a fixed voltage step of 100 mV for all voltage sweep measurements at each AC frequency. Each of these measurements is repeated 15 times for the equidistant AC voltage amplitudes between 10 mV and 150 mV. This provides the desired AC voltage amplitude to step size ratios from 1:10 to 3:2. Our results indicate that, although the selection of the oxide capacitance is important both to the success and accuracy of the extraction method, the mid-gap interface state defect density extractions are not overly sensitive to the AC voltage amplitude employed regardless of what oxide capacitance is used in the extractions, particularly in the range from 50% below the voltage sweep step size to 50% above it. Therefore, the use of larger AC voltage amplitudes in this range to achieve a better signal-to-noise ratio during impedance measurements for future low operating voltage devices will not distort the extracted interface state defect density.
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Potential temperature measured with a SBE37 at 35.862ºN, 5.97ºW at 344 meters Depth. Data expand from September the 30th, 2004 to March the 2nd, 2016. Original measurement frequency was 30 minutes, the data presented here is a subsampling that extract the coldest temperature found each 12 hours. The time vector corresponds with the moment in which this minimun temperature is observed.