29 resultados para niño de alto riesgo

em Chinese Academy of Sciences Institutional Repositories Grid Portal


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利用直流磁控反应溅射技术制备了氧气和氩气的分压比为5:100的NiOx薄膜。利用X射线衍射仪(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)和光谱仪研究了热处理对薄膜的微观结构和光学性质的影响, 并对沉积态薄膜的粉末进行了热分析。沉积态的NiOx薄膜在262 ℃时开始分解, 导致NiOx薄膜的透过率增加和反射率降低。X射线衍射和示差扫描量热曲线(DSC)分析表明, 在热处理过程中并无物相的变化, 光学性质的变化是由于NiOx薄膜热分解引起薄膜表面形貌发生变化而引起的。通过Kissinger公式计算出

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Ta/NiO/NiFe/Ta multilayers, utilizing Ta as buffer layer, were prepared by rf reactive and de magnetron sputtering. The exchange coupling field between NiO and NiFe reached a maximum value of 9.6x10(3) A/m at a NiO film thickness of 50 nm. The composition and chemical states at interface region of Ta/NiO/Ta were studied by using the X-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there is an "intermixing layer" at the Ta/NiO land NiO/Ta) interface due to a thermodynamically favorable reaction 2Ta + 5NiO = 5Ni + Ta2O5. This interface reaction has a great effect on exchange coupling. The thickness of Ni+NiO estimated by XPS depth. profiles is about 8-10 nm.

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在本工作中,制备了一系列催化剂样品,其中有K、Ni、Mo单组份催化剂,K-Ni、K-Mo、Ni-Mo双组份催化剂及不同活性组份含量的K-Ni-Mo三组份催化剂。针对水煤气变换反应,对上述催化剂进行反应活性考察,得出如下结果:①催化剂各活性组份的最佳含量大致是NiO(3%), MoO_3(13%), K_2CO_3(6%);②催化剂制备中的最佳焙烧温度在400 ℃左右;③催化剂使用前用H_2S/H_2的混和气进行预处理其效果最佳;④催化剂的催化活性与催化剂表面硫的含量有关,当催化剂表面处于严重缺硫状态时其活性下降;⑤反应的最佳汽:气 = 0.5-1.5;⑥加压有利于催化剂活性的提高,在加压情况下催化剂的活性随着反应温度的增加通过一极大值(在约200 ℃左右),不加压的反应催化剂活性随着反应温度的提高而增加。在催化剂的表征部分,利用XPS、XRD、紫外可见温反射光谱、SEM、ESR、比表面、TPR、酸度测定、TPD、TPS、TPS-TPR等实验对我们所制备的催化剂进行了研究。最后,我们用ESR和XRD实验技术研究了MoO_3、M_2CO_3 (M = Li、Na、K、Cs)-MoO_3加热过程中的固相反应,知道MoO_3在空气中焙烧时可以失去晶格氧,使晶体中的一些Mo~(6+)变成Mo~(5+)。在焙烧过程中,Li、Cs~+的加入将阻止MoO_3晶格氧向气相氧的转变,对Mo~(5+)的生成有抑制作用。加入一定量Na~+、K~+的MoO_3在焙烧过程中,其晶格氧被活化更易失去它们对Mo~(5+)的生成有促进作用,这种作用的大小是Na~+ > K~+。

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The Ni/Au contact was treated with oxalic acid after annealing in O_2 ambient, and its I-V characteristic showed the property of contact has been obviously improved. An Auger electron spectroscopy (AES) depth pro-file of the contact as-annealed showed that the top layer was highly resistive NiO, while an X-ray photo-electron spectroscopy (XPS) of oxalic acid treated samples indicated that the NiO has been removed effectively. A scanning electron microscope (SEM) was used to observe the surface morphology of the contacts, and it was found that the lacunaris surface right after annealing became quite smooth with lots of small Au exposed areas after oxalic acid treatment. When the test probe or the subsequently deposited Ti/Au was directly in contact with these small Au areas, they worked as low resistive current paths and thus decrease the specific contact resistance.

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利用磁控反应溅射方法以Ta作为缓冲层制备了Ta/NiO/NiFe/Ta薄膜,磁性分析表明,该结构薄膜的交换耦合场为9.6×10~3A/m,但量所需NiO的实际厚度增加了。采用X射线光电子能谱研究了Ta/NiO/Ta界面,并进行计算机谱图拟合分析。结果表明界面反应是影响层间耦合的一个重要因素。在Ta/NiO界面处发生了反应

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采用低热固相反应法合成掺杂Cu的Ni(OH)2,将其在300℃下热处理得到相应的NiO.电化学测试表明∶掺杂量为n(Ni)∶n(Cu)=100∶0.25时,NiO电极的比容量最高,为99-120 F/g,具有良好的充放电性能,而不掺杂的只有83-111 F/g,因此掺杂Cu有利于提高NiO的电化学性能.

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CoO-MoO_3,NiO-MoO_3,CoO-WO_3,NiO-WO_3/Al_2O_3等催化剂在工业上广泛应用于加氢和脱硫过程,对于这类催化剂的研究大多针对此反应.当这类催化剂添加碱金属盐后对水煤气变换反应有明显的促进作用,而对加氢脱硫则显示出负效果.对于水煤气变换反应,这类催化剂最大的特点是能耐高浓度的硫,并具有低温活性.本工作对不同温度处理的NiO-MoO_3-K_2CO_3/Al_2O_3催化剂进行了XRD,XPS,DRS的研究,试图了解焙烧温度对催化剂结构,活性组分存在状态和分布以及催化活性的影响.

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The oxidative dehydrogenation (ODH) of propane was investigated on Ni-V-O catalysts in a wide range of vanadium contents (5-40%). The addition of a small amount of vanadium significantly increased the catalytic activity of NiO for oxidative dehydrogenation of propane to propene. The formation of propene has a good correlation with the coexistence of NiO and Ni3V2O8. This result strongly suggests that a synergetic effect exists between them in NiXV1-XOY (X = 0.95 to 0.6). The best results were obtained with a high Ni/V ratio (e.g. X = 0.95 to 0.85). The active sites and selective oxygen species are discussed. The influence of the catalyst preparation technique and the redox properties of the catalyst were also examined.